• Title/Summary/Keyword: memory semiconductor

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Integration Process and Reliability for $SrBi_2$ $Ta_2O_9$-based Ferroelectric Memories

  • Yang, B.;Lee, S.S.;Kang, Y.M.;Noh, K.H.;Hong, S.K.;Oh, S.H.;Kang, E.Y.;Lee, S.W.;Kim, J.G.;Shu, C.W.;Seong, J.W.;Lee, C.G.;Kang, N.S.;Park, Y.J.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.3
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    • pp.141-157
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    • 2001
  • Highly reliable packaged 64kbit ferroelectric memories with $0.8{\;}\mu\textrm{m}$ CMOS ensuring ten-year retention and imprint at 125^{\circ}C$ have been successfully developed. These superior reliabilities have resulted from steady integration schemes free from the degradation, due to layer stress and attacks of process impurities. The resent results of research and development for ferroelectric memories at Hynix Semiconductor Inc. are summarized in this invited paper.

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MRAM Technology for High Density Memory Application

  • Kim, Chang-Shuk;Jang, In-Woo;Lee, Kye-Nam;Lee, Seaung-Suk;Park, Sung-Hyung;Park, Gun-Sook;Ban, Geun-Do;Park, Young-Jin
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.3
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    • pp.185-196
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    • 2002
  • MRAM(magnetic random access memory) is a promising candidate for a universal memory with non-volatile, fast operation speed and low power consumption. The simplest architecture of MRAM cell is a combination of MTJ(magnetic tunnel junction) as a data storage part and MOS transistor as a data selection part. This article will review the general development status of MRAM and discuss the issues. The key issues of MRAM technology as a future memory candidate are resistance control and low current operation for small enough device size. Switching issues are controllable with a choice of appropriate shape and fine patterning process. The control of fabrication is rather important to realize an actual memory device for MRAM technology.

FeRAM Technology for System on a Chip

  • Kang, Hee-Bok;Jeong, Dong-Yun;Lom, Jae-Hyoung;Oh, Sang-Hyun;Lee, Seaung-Suk;Hong, Suk-Kyoung;Kim, Sung-Sik;Park, Young-Jin;Chung, Jin-Young
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.2
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    • pp.111-124
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    • 2002
  • The ferroelectric RAM (FeRAM) has a great advantage for a system on a chip (SOC) and mobile product memory, since FeRAM not only supports non-volatility but also delivers a fast memory access similar to that of DRAM and SRAM. This work develops at three levels: 1) low voltage operation with boost voltage control of bitline and plateline, 2) reducing bitline capacitance with multiple divided sub cell array, and 3) increasing chip performance with write operation sharing both active and precharge time period. The key techniques are implemented on the proposed hierarchy bitline scheme with proposed hybrid-bitline and high voltage boost control. The test chip and simulation results show the performance of sub-1.5 voltage operation with single step pumping voltage and self-boost control in a cell array block of 1024 ($64{\;}{\times}{\;}16$) rows and 64 columns.

A Word Line Ramping Technique to Suppress the Program Disturbance of NAND Flash Memory

  • Lee, Jin-Wook;Lee, Yeong-Taek;Taehee Cho;Lee, Seungjae;Kim, Dong-Hwan;Wook-Ghee, Hahn;Lim, Young-Ho;Suh, Kang-Deog
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.2
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    • pp.125-131
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    • 2001
  • When the program voltage is applied to a word line, a part of the boosted channel charge in inhibited bit lines is lost due to the coupling between the string select line (SSL) and the adjacent word line. This phenomenon causes the program disturbance in the cells connected to the inhibited bit lines. This program disturbance becomes more serious, as the word line pitch is decreased. To reduce the word line coupling, the rising edge of the word-line voltage waveform was changed from a pulse step into a ramp waveform with a controlled slope. The word-line ramping circuit was composed of a timer, a decoder, a 8 b D/A converter, a comparator, and a high voltage switch pump (HVSP). The ramping voltage was generated by using a stepping waveform. The rising time and the stepping number of the word-line voltage for programming were set to $\mutextrm{m}-$ and 8, respectively,. The ramping circuit was used in a 512Mb NAND flash memory fabricated with a $0.15-\mutextrm{m}$ CMOS technology, reducing the SSL coupling voltage from 1.4V into a value below 0.4V.

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A Study on Solving the WSix Peeling Issue at MDDR DRAM (MDDR(Mobile Double Data Rate) DRAM의 WSix Peeling 불량 해결 연구)

  • Chae, Han-Yong;Lee, Sung-Young;Park, Tae-Hoon;Lee, Hyun-Sung;Lee, Kwang-Hee;Seo, Ju-Won;Choi, Kyue-Sang
    • Proceedings of the IEEK Conference
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    • 2008.06a
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    • pp.481-482
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    • 2008
  • In this paper, the advanced process has been presented to remove the WSix peeling that was made in sub 100nm DRAM SRCAT(Sphere-shaped-Recess-Ch annel-Array Transistor). The source of WSix peeling was proved to be the groove of gate poly film. We have completely solved the problems to adopt the gate-poly CMP (Chemical Mechanical Polishing) process.

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A Foresight Study on Strategy of Semiconductor Memory Industry by Performance Analysis of Semiconductor Industry (반도체 산업의 성과 분석을 통한 메모리 산업의 미래 전략 도출)

  • Chung, Euiyoung
    • Journal of Korea Society of Digital Industry and Information Management
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    • v.11 no.4
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    • pp.1-12
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    • 2015
  • This research analyzes the current state of the semiconductor industry delivering the prediction for the future development of the semiconductor industry along with some semiconductor memory's responsive strategies. In the 2014, top 10 semiconductor companies were targeted and studied its growth based on its profitability and growth indications in perspective during three years. The system semiconductor industry with the increase in Hyper-scale customers, proactive actions in the technology consortium, is polarizing caused by increased R&D expense to ensure process scaling limits and high performance, and some results have shown: PC and Mobile slowdown and growth recession phenomenon due to IoT's unclear direction. The leading company is to secure new growth engines through 'Acquiring'. While as the subordinated companies following this consecutive survival through the 'Acquired', the future of system semiconductor industry is to strengthen the market dominance and its techniques by concentrating on the reorganization of the market by few large companies. Accordingly, the semiconductor memory industry is expected to reach the limit of its expansion to domain of system semiconductor, and it is highly suggesting the need of the 'Memory Life Extension' growth strategy.

Performance Improvement of Asynchronous Mass Memory Module Using Error Correction Code (에러 보정 코드를 이용한 비동기용 대용량 메모리 모듈의 성능 향상)

  • Ahn, Jae Hyun;Yang, Oh;Yeon, Jun Sang
    • Journal of the Semiconductor & Display Technology
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    • v.19 no.3
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    • pp.112-117
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    • 2020
  • NAND flash memory is a non-volatile memory that retains stored data even without power supply. Internal memory used as a data storage device and solid-state drive (SSD) is used in portable devices such as smartphones and digital cameras. However, NAND flash memory carries the risk of electric shock, which can cause errors during read/write operations, so use error correction codes to ensure reliability. It efficiently recovers bad block information, which is a defect in NAND flash memory. BBT (Bad Block Table) is configured to manage data to increase stability, and as a result of experimenting with the error correction code algorithm, the bit error rate per page unit of 4Mbytes memory was on average 0ppm, and 100ppm without error correction code. Through the error correction code algorithm, data stability and reliability can be improved.