• Title/Summary/Keyword: Field effect mobility

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Investigation on Electrical Property of Amorphous Oxide SiZnSnO Semiconducting Thin Films (비정질 산화물 SiZnSnO 반도체 박막의 전기적 특성 분석)

  • Byun, Jae Min;Lee, Sang Yeol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.4
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    • pp.272-275
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    • 2019
  • We investigated the electrical characteristics of amorphous silicon-zinc-tin-oxide (a-SZTO) thin films deposited by RF-magnetron sputtering at room temperature depending on the deposition time. We fabricated a thin film transistor (TFT) with a bottom gate structure and various channel thicknesses. With increasing channel thickness, the threshold voltage shifted negatively from -0.44 V to -2.18 V, the on current ($I_{on}$) and field effect mobility (${\mu}_{FE}$) increased because of increasing carrier concentration. The a-SZTO film was fabricated and analyzed in terms of the contact resistance and channel resistance. In this study, the transmission line method (TLM) was adopted and investigated. With increasing channel thickness, the contact resistance and sheet resistance both decreased.

Modeling negative and positive temperature dependence of the gate leakage current in GaN high-electron mobility transistors

  • Mao, Ling-Feng
    • ETRI Journal
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    • v.44 no.3
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    • pp.504-511
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    • 2022
  • Monte Carlo simulations show that, as temperature increases, the average kinetic energy of channel electrons in a GaN transistor first decreases and then increases. According to the calculations, the relative energy change reaches 40%. This change leads to a reduced barrier height due to quantum coupling among the three-dimensional motions of channel electrons. Thus, an analysis and physical model of the gate leakage current that includes drift velocity is proposed. Numerical calculations show that the negative and positive temperature dependence of gate leakage currents decreases across the barrier as the field increases. They also demonstrate that source-drain voltage can have an effect of 1 to 2 orders of magnitude on the gate leakage current. The proposed model agrees well with the experimental results.

X-X: Single-Crystalline Si TFTs Fabricated with ${\mu}-Czochralski$ (grain-filter) process

  • Ishihara, R.;Dijk, B.D.van;Wilt, P.Ch. van der;Metselaar, J.W.;Beenakker, C.I.M.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.159-162
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    • 2002
  • This paper reviews an advanced excimer-laser crystallization technique enabling precise location-control of the individual grains. With the developed ${\mu}$-Czochralski (grain-filter) process, the large grains having a diameter of 6 ${\mu}m$ can be set precisely at predetermined positions. We will also discuss the performance of the single-crystalline Si TFTs that are formed within the location-controlled Si grains. The field-effect mobility for electrons is 430 $cm^2/Vs$ on average, which is well comparable to that of TFTs made with silicon-on-insulator wafers.

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aSi Pixel Circuits on Plastic Substrates for Flexible AMOLED displays

  • Striakhilev, D.;Servati, P.;Sakariya, K.;Tao, S.;Alexander, S.;Kumar, A.;Vigranenko, Y.;Nathan, A.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.746-748
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    • 2004
  • a-Si TFTs with field-effect mobility of 1.2 $cm^2$/V-s have been fabricated on plastic substrate. Pixel circuits on plastic for AMOLED were made with the same low-temperature fabrication process. The circuits compensate for $V_T$-shift, exhibit high output current, retain functionality and drive current level during long-time continuous operation.

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Dependence of Ferroelectric Film Formation Method on Electrical Characteristics in Solution-processed Ferroelectric Field Effect Transistor (강유전체 박막 형성방법에 따른 용액 공정 기반 강유전체 전계효과 트랜지스터의 전기적 특성 의존성)

  • Kim, Woo Young;Bae, Jin-Hyuk
    • Journal of the Institute of Electronics and Information Engineers
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    • v.50 no.7
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    • pp.102-108
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    • 2013
  • In manufacturing of solution-processed organic electronic devices, a spin coating method is frequently used, but which has a big problem. Solvent in a solution has a decisive effect such as physical and chemical damage for successive solution-based film deposition. Such a severe damage by solvent restricts for fabricating building blocks of multi-layered films from solutions. In this work, it will be shown that a proper combination of well-known solvents gives a chance to fabricate multi-layered film, also this new method was applied to make organic field effect transistor. Two types of bottom gate, bottom contact transistors were fabricated, one of which is fabricated by conventional single spin coating method, the other fabricated by double spin coating method. Compared with the electrical characteristics in a single spin coated transistor, the leakage current between source and gate electrode was decreased, ON state current was increased, and the extracted saturation mobility was multiplied more than 2.7 time for double spin coated transistors. It is suggested that the multiple coated gate dielectric structure is more desirable for high performance organic ferroelectric field effect transistors.

A Study on Indium Gallium Oxide Thin Film Transistors prepared by a Solution-based Deposition Method (저온 용액공정을 이용한 인듐갈륨 산화물(IGO) 박막트랜지스터 제조 및 특성 연구)

  • Bae, Eunjin;Lee, Jin Young;Han, Seung-Yeol;Chang, Chih-Hung;Ryu, Si Ok
    • Korean Chemical Engineering Research
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    • v.49 no.5
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    • pp.600-604
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    • 2011
  • Solution processed IGO thin films were prepared using a general chemical solution route by spin coating. The effect of the annealing temperature of IGO thin films based on the ratio of 2:1 of indium to gallium on crystallization was investigated with varying annealing temperature from $300^{\circ}C$ to $600^{\circ}C$. The electronic device characteristic of IGO thin film was investigated. The solution-processed IGO TFTs annealed at 300 and $600^{\circ}C$ in air for 1 h exhibited good electronic performances with field effect mobilities as high as 0.34 and 3.83 $cm^2/V{\cdot}s$, respectively. The on/off ratio of the IGO TFT in this work was $10^5$ with 98% transmittance.

A Comparison on the Effect of Soil Improvement Methods for the Remediation of Heavy Metal Contaminated Farm Land Soil (중금속 오염 농경지 토양의 복원을 위한 토량개량법의 효과 비교)

  • Yun, Sung-Wook;Jin, Hae-Geun;Kang, Sin-Il;Choi, Seung-Jin;Lim, Young-Cheol;Yu, Chan
    • Journal of the Korean Geotechnical Society
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    • v.26 no.7
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    • pp.59-70
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    • 2010
  • A long-term field demonstration experiment on selected stabilization methods to reduce the heavy metal mobility in farmland soil contaminated by heavy metals was conducted. The field demonstration experiment was established on the contaminated farmland with wooden plates (thickness = 1 cm), of which the dimension were width = 200 cm, Length = 200 cm, height = 80 cm, filled with treated soil, which was mixed with lime stone and steel refining slag except on control plot. Soil samples in the plots were collected and analyzed during the experiment period (6 months) after the installation of the plots. The field demonstration experiment results showed that the application lime stone at the ratio of 5% was effective for immobilizing heavy metal components in contaminated farmland soil.

A Study on the Reduction of Current Kink Effect in NMOSFET SOI Device (NMOSFET SOI 소자의 Current Kink Effect 감소에 관한 연구)

  • Han, Myoung-Seok;Lee, Chung-Keun;Hong, Shin-Nam
    • Journal of the Korean Institute of Telematics and Electronics T
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    • v.35T no.2
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    • pp.6-12
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    • 1998
  • Thin film SOI(Silicon-on-insulator) device offer unique advantages such as reduction in short channel effects, improvement of subthreshold slope, higher mobility, latch-up free nature, and so on. But these devices exhibit floating-body effet such as current kink which inhibits the proper device operation. In this paper, the SOI NMOSFET with a T-type gate structure is proposed to solve the above problem. To simulate the proposed device with TSUPREM-4, the part of gate oxide was considered to be 30nm thicker than the normal gate oxide. The I-V characteristics were simulated with 2D MEDICI. Since part of gate oxide has different oxide thickness, the gate electric field strength is not same throughout the gate and hence the impact ionization current is reduced. The current kink effect will be reduced as the impact ionization current drop. The reduction of current kink effect for the proposed device structure were shown using MEDICI by the simulation of impact ionization current, I-V characteristics, and hole current distribution.

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Low-voltage Pentacene Field-Effect Transistors Based on P(S-r-BCB-r-MMA) Gate Dielectrics (P(S-r-BCB-r-MMA) 게이트 절연체를 이용한 저전압 구동용 펜타센 유기박막트랜지스터)

  • Koo, Song Hee;Russell, Thomas P.;Hawker, Craig J.;Ryu, Du Yeol;Lee, Hwa Sung;Cho, Jeong Ho
    • Applied Chemistry for Engineering
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    • v.22 no.5
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    • pp.551-554
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    • 2011
  • One of the key issues in the research of organic field-effect transistors (OFETs) is the low-voltage operation. To address this issue, we synthesized poly(styrene-r-benzocyclobutene-r-methyl methacrylate) (P(S-r-BCB-r-MMA)) as a thermally cross-linkable gate dielectrics. The P(S-r-BCB-r-MMA) showed high quality dielectric properties due to the negligible volume change during the cross-linking. The pentacene FETs based on the 34 nm-thick P(S-r-BCB-r-MMA) gate dielectrics operate below 5 V. The P(S-r-BCB-r-MMA) gate dielectrics yielded high device performance, i.e. a field-effect mobility of $0.25cm^2/Vs$, a threshold voltage of -2 V, an sub-threshold slope of 400 mV/decade, and an on/off current ratio of ${\sim}10^5$. The thermally cross-linkable P(S-r-BCB-r-MMA) will provide an attractive candidate for solution-processable gate dielectrics for low-voltage OFETs.

Tuning Electrical Performances of Organic Charge Modulated Field-Effect Transistors Using Semiconductor/Dielectric Interfacial Controls (유기반도체와 절연체 계면제어를 통한 유기전하변조 트랜지스터의 전기적 특성 향상 연구)

  • Park, Eunyoung;Oh, Seungtaek;Lee, Hwa Sung
    • Journal of Adhesion and Interface
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    • v.23 no.2
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    • pp.53-58
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    • 2022
  • Here, the surface characteristics of the dielectric were controlled by introducing the self-assembled monolayers (SAMs) as the intermediate layers on the surface of the AlOx dielectric, and the electrical performances of the organic charge modulated transistor (OCMFET) were significantly improved. The organic intermediate layer was applied to control the surface energy of the AlOx gate dielectric acting as a capacitor plate between the control gate (CG) and the floating gate (FG). By applying the intermediate layers on the gate dielectric surface, and the field-effect mobility (μOCMFET) of the OCMFET devices could be efficiently controlled. We used the four kinds of SAM materials, octadecylphosphonic acid (ODPA), butylphosphonic acid (BPA), (3-bromopropyl)phosphonic acid (BPPA), and (3-aminopropyl)phosphonic acid (APPA), and each μOCMFET was measured at 0.73, 0.41, 0.34, and 0.15 cm2V-1s-1, respectively. The results could be suggested that the characteristics of each organic SAM intermediate layer, such as the length of the alkyl chain and the type of functionalized end-group, can control the electrical performances of OCMFET devices and be supported to find the optimized fabrication conditions, as an efficient sensing platform device.