• Title/Summary/Keyword: fullCMOS

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초 저 소비전력 및 저 전압 동작용 FULL CMOS SRAM CELL에 관한 연구

  • 이태정
    • The Magazine of the IEIE
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    • v.24 no.6
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    • pp.38-49
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    • 1997
  • 0.4mm Resign Rule의 Super Low Power Dissipation, Low Voltage. Operation-5- Full CMOS SRAM Cell을 개발하였다. Retrograde Well과 PSL(Poly Spacer LOCOS) Isolation 공정을 사용하여 1.76mm의 n+/p+ Isolation을 구현하였으며 Ti/TiN Local Interconnection을 사용하여 Polycide수준의 Rs와 작은 Contact저항을 확보하였다. p-well내의 Boron이 Field oxide에 침적되어 n+/n-well Isolation이 취약해짐을 Simulation을 통해 확인할 수 있었으며, 기생 Lateral NPN Bipolar Transistor의 Latch Up 특성이 취약해 지는 n+/n-wellslze는 0.57mm이고, 기생 Vertical PNP Bipolar Transistor는 p+/p-well size 0.52mm까지 안정적인 Current Gain을 유지함을 알 수 있었다. Ti/TiN Local Interconnection의 Rs를 Polycide 수준으로 낮추는 것은 TiN deco시 Power를 증가시키고 Pressure를 감소시킴으로써 실현할 수 있었다. Static Noise Margin분석을 통해 Vcc 0.6V에서도 Cell의 동작 Margin이 있음을 확인할 수 있었으며, Load Device의 큰 전류로 Soft Error를 개선할수 있었다. 본 공정으로 제조한 1M Full CMOS SRAM에서 Low Vcc margin 1.0V, Stand-by current 1mA이하(Vcc=3.7V, 85℃기준) 를 얻을 수 있었다.

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Full-Custom Design of a Serial Peripheral Interface Circuit for CMOS RFIC Testing (CMOS RF 집적회로 검증을 위한 직렬 주변 인터페이스 회로의 풀커스텀 설계)

  • Uhm, Jun-Whon;Lee, Un-Bong;Shin, Jae-Wook;Shin, Hyun-Chol
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.46 no.9
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    • pp.68-73
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    • 2009
  • This paper presents an easily modifiable structure of a serial peripheral interface (SPI) that is suitable for efficient testing of CMOS RF integrated circuits. The proposed SPI Is designed so that the address size and the accompanying software can be easily adjusted and modified according to the requirements and complexity of RF IC's under development. The hardware architecture and software algorithm to achieve the flexibility are described. The proposed SPI is fabricated in $0.13{\mu}m$ CMOS and successfully verified experimentally with a 2.7GHz fractional-N delta-sigma frequency synthesizer as a device under test.

Design of a TIQ Based CMOS A/D Converter for Real Time DSP (실시간 디지털 신호처리를 위한 TIQ A/D 변환기 설계)

  • Kim, Jong-Soo
    • Journal of the Institute of Convergence Signal Processing
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    • v.8 no.3
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    • pp.205-210
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    • 2007
  • This paper presents a CMOS TIQ flash A/D converter which operates very fast compared to other types of A/D converters due to its parallel architecture. The output resolution of designed A/D converter is 6-bit. In order to reduce the power consumption and chip area of conventional flash A/D converter, TIQ based flash A/D converter is proposed, which uses the advantage of the structure of CMOS transistors. The length and width of transistors of TIQ were determined with HSPICE simulation. To speed up the ultra-high speed flash A/D converter, the Fat Tree Encoder technique is used. The TIQ A/D converter was designed with full custom method. The chip's maximum power consumption was 38.45mW at 1.8V, and the operating speed of simulation was 2.7 GSPS.

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The Electrical Characteristics of SRAM Cell with Stacked Single Crystal Silicon TFT Cell (단결정 실리콘 TFT Cell의 적용에 따른 SRAM 셀의 전기적 특성)

  • Lee, Deok-Jin;Kang, Ey-Goo
    • Journal of the Korea Computer Industry Society
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    • v.6 no.5
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    • pp.757-766
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    • 2005
  • There have been great demands for higher density SRAM in all area of SRAM applications, such as mobile, network, cache, and embedded applications. Therefore, aggressive shrinkage of 6T Full CMOS SRAM had been continued as the technology advances, However, conventional 6T Full CMOS SRAM has a basic limitation in the cell size because it needs 6 transistors on a silicon substrate compared to 1 transistor in a DRAM cell. The typical cell area of 6T Full CMOS SRAM is $70{\sim}90F^{2}$, which is too large compared to $8{\sim}9F^{2}$ of DRAM cell. With 80nm design rule using 193nm ArF lithography, the maximum density is 72M bits at the most. Therefore, pseudo SRAM or 1T SRAM, whose memory cell is the same as DRAM cell, is being adopted for the solution of the high density SRAM applications more than 64M bits. However, the refresh time limits not only the maximum operation temperature but also nearly all critical electrical characteristics of the products such as stand_by current and random access time. In order to overcome both the size penalty of the conventional 6T Full CMOS SRAM cell and the poor characteristics of the TFT load cell, we have developed $S^{3}$ cell. The Load pMOS and the Pass nMOS on ILD have nearly single crystal silicon channel according to the TEM and electron diffraction pattern analysis. In this study, we present $S^{3}$ SRAM cell technology with 100nm design rule in further detail, including the process integration and the basic characteristics of stacked single crystal silicon TFT.

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Electrical Characteristics of SRAM Cell with Stacked Single Crystal Silicon TFT Cell (Stacked Single Crystal Silicon TFT Cell의 적용에 의한 SRAM 셀의 전기적인 특성에 관한 연구)

  • Kang, Ey-Goo;Kim, Jin-Ho;Yu, Jang-Woo;Kim, Chang-Hun;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.4
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    • pp.314-321
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    • 2006
  • There have been great demands for higher density SRAM in all area of SRAM applications, such as mobile, network, cache, and embedded applications. Therefore, aggressive shrinkage of 6 T Full CMOS SRAM had been continued as the technology advances. However, conventional 6 T Full CMOS SRAM has a basic limitation in the cell size because it needs 6 transistors on a silicon substrate compared to 1 transistor in a DRAM cell. The typical cell area of 6 T Full CMOS SRAM is $70{\sim}90\;F^2$, which is too large compared to $8{\sim}9\;F^2$ of DRAM cell. With 80 nm design rule using 193 nm ArF lithography, the maximum density is 72 Mbits at the most. Therefore, pseudo SRAM or 1 T SRAM, whose memory cell is the same as DRAM cell, is being adopted for the solution of the high density SRAM applications more than 64 M bits. However, the refresh time limits not only the maximum operation temperature but also nearly all critical electrical characteristics of the products such as stand_by current and random access time. In order to overcome both the size penalty of the conventional 6 T Full CMOS SRAM cell and the poor characteristics of the TFT load cell, we have developed S3 cell. The Load pMOS and the Pass nMOS on ILD have nearly single crystal silicon channel according to the TEM and electron diffraction pattern analysis. In this study, we present $S^3$ SRAM cell technology with 100 nm design rule in further detail, including the process integration and the basic characteristics of stacked single crystal silicon TFT.

Design of a $3.1{\sim}10.6GHz$ CMOS Power Amplifier for UWB Application (UWB 응용을 위한 $3.1{\sim}10.6GHz$ CMOS 전력증폭기 설계)

  • Park, J.K.;Shim, S.M.;Park, J.T.;Yu, C.G.
    • Proceedings of the KIEE Conference
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    • 2007.10a
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    • pp.193-194
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    • 2007
  • This paper presents the design of a power amplifier for full-band UWB application systems using a CMOS 0..18um technology. A wideband RLC filter and a multilevel RLC matching scheme are utilized to achieve the wideband input/output matching. Both the cascade and cascode stage are used to increase the gain and to achieve gain flatness. Simulation results show that the designed amplifier provides a power gain greater than 10 dB throughout the UWB full-band(3.1-10.6GHz) and an input P1dB of -1.2dBm at 6.9GHz. It consumes 35.8mW from a 1.8V supply.

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On-Chip Full CMOS Current and Voltage References for High-Speed Mixed-Mode Circuits (고속 혼성모드 집적회로를 위한 온-칩 CMOS 전류 및 전압 레퍼런스 회로)

  • Cho, Young-Jae;Bae, Hyun-Hee;Jee, Yong;Lee, Seung-Hoon
    • Journal of the Institute of Electronics Engineers of Korea SC
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    • v.40 no.3
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    • pp.135-144
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    • 2003
  • This work proposes on-chip full CMOS current and voltage references for high-speed mixed-mode circuits. The proposed current reference circuit uses a digital-domain calibration method instead of a conventional analog calibration to obtain accurate current values. The proposed voltage reference employs internal reference voltage drivers to minimize the high-frequency noise from the output stages of high-speed mixed-mode circuits. The reference voltage drivers adopt low power op amps and small- sized on-chip capacitors for low power consumption and small chip area. The proposed references are designed, laid out, and fabricated in a 0.18 um n-well CMOS process and the active chip area is 250 um x 200 um. The measured results show the reference circuits have the power supply variation of 2.59 %/V and the temperature coefficient of 48 ppm/$^{\circ}C$ E.

Design of a High Performance Multiplier Using Current-Mode CMOS Quaternary Logic Circuits (전류모드 CMOS 4치 논리회로를 이용한 고성능 곱셈기 설계)

  • Kim, Jong-Soo;Kim, Jeong-Beom
    • Journal of IKEEE
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    • v.9 no.1 s.16
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    • pp.1-6
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    • 2005
  • This paper proposes a high performance multiplier using CMOS multiple-valued logic circuits. The multiplier based on the Modified Baugh-Wooley algorithm is designed with current-mode CMOS quaternary logic circuits. The multiplier is functionally partitioned into the following major sections: partial product generator block(binary-quaternary logic conversion block), current-mode quaternary logic full-adder block, and quaternary-binary logic conversion block. The proposed multiplier has 4.5ns of propagation delay and 6.1mW of power consumption. This multiplier can easily adapted to the binary system by the encoder and the decoder. This circuit is designed with 0.35um standard CMOS process at 3.3V supply voltage and 5uA unit current. The validity and effectiveness are verified through the HSPICE simulation.

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A 900 MHz ZigBee CMOS RF Transceiver Using Switchless Matching Network (무스위치 정합 네트워크를 이용한 900 MHz ZigBee CMOS RF 송수신기)

  • Jang, Won Il;Eo, Yun Seong;Park, Hyung Chul
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.28 no.8
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    • pp.610-618
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    • 2017
  • This paper presents a 868/915 MHz CMOS RF transceiver for the ZigBee application. Using a switchless matching network, the off chip switch is removed to achieve the low cost RF transceiver, and by the elimination of the switch's insertion loss we can achieve the benefits for the RF receiver's noise figure and transmitter's power efficiency at the given output power. The receiver is composed of low-noise amplifier, mixer, and baseband analog(BBA) circuit. The transmitter is composed of BBA, mixer, and driver amplifier. And, the integer N type frequency synthesizer is designed. The proposed ZigBee RF full transceiver is implemented on the $0.18{\mu}m$ CMOS technology. Measurement results show that the maximum gain and the noise figure of the receiver are 97.6 dB and 6.8 dB, respectively. The receiver consumes 32 mA in the receiver mode and the transmitter 33 mA in the transmission mode.

Potentiostat circuits for amperometric sensor (전류법 기반 센서의 정전압 분극 장치 회로)

  • Lim, Shin-Il
    • Journal of Sensor Science and Technology
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    • v.18 no.1
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    • pp.95-101
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    • 2009
  • A simple and new CMOS potentiostat circuit for amperometric sensor is described. To maintain a constant potential between the reference and working electrodes, only one differential difference amplifier (DDA) is needed in proposed design, while conventional potentiosatat requires at least 2 operational amplifiers and 2 resistors, or more than 3 operational amplifiers and 4 resistors for low voltage CMOS integrated potentiostat. The DDA with rail-to-rail design not only enables the full range operation to supply voltage but also provides simple potentiostat system with small hardwares and low power consumption.