• Title/Summary/Keyword: CMOS Process

Search Result 1,650, Processing Time 0.036 seconds

Design of a CMOS D/A Converter for advanced wireless transceiver of high speed and high resolution (고속 고해상도의 무선통신 송 $\cdot$ 수신기용 CMOS D/A 변환기 설계)

  • Cho Hyun-Ho;Park Cheong-Yong;Yune Gun-Shik;Ha Sung-Min;Yoon Kwang-Sub
    • Proceedings of the IEEK Conference
    • /
    • 2004.06b
    • /
    • pp.549-552
    • /
    • 2004
  • The thesis describes the design of 12bit digital-to-analog converter (DAC) which shows the conversion rate of 500MHz and the power supply of 3.3V with 0.35${\mu}m$ CMOS 1-poly 4-metal process for advanced wireless transceiver of high speed and high resolution. The proposed DAC employes segmented structure which consists of 6bit MSB, 3bit mSB, 3bit LSB for area efficiency Also, using a optimized aspect ratio of process and new triple diagonal symmetric centroid sequence for high yield and high linearity. The proposed 12bit current mode DAC was employs new deglitch circuit for the decrement of the glitch energy. Simulation results show the conversion rate of 500MHz, and the power dissipation of 85mW at single 3.3V supply voltage. Both DNL and INL are found to be smaller than ${\pm}0.65LSB/{\pm}0.8LSB$.

  • PDF

Simulation of optimal ion implantation for symmetric threshold voltage determination of 1 ${\mu}m$ CMOS device (1 ${\mu}m$ CMOS 소자의 대칭적인 문턱전압 결정을 위한 최적 이온주입 시뮬레이션)

  • Seo, Yong-Jin;Choi, Hyun-Sik;Lee, Cheol-In;Kim, Tae-Hyung;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the KIEE Conference
    • /
    • 1991.11a
    • /
    • pp.286-289
    • /
    • 1991
  • We simulated ion implantation and annealing condition of 1 ${\mu}m$ CMOS device using process simulator, SUPREM-II. In this simulation, optimal condition of ion implantation for symmetric threshold voltage determination of PMOS and NMOS region, junction depth and sheet resistance of source/drain region, impurity profile of each region are investigated. Ion implantation dose for 3 ${\mu}m$ N-well junction depth and symmetric threshold voltage of $|0.6|{\pm}0.1$ V were $1.9E12Cm^{-2}$(for phosphorus), $1.7E122Cm^{-2}$(for boron) respectively. Also annealing condition for dopant activation are examined about $900^{\circ}C$, 30 minutes. After final process step, N-well junction, P+ S/D junction and N+ S/D junction depth are calculated 3.16 ${\mu}m$, 0.45 ${\mu}m$ and 0.25 ${\mu}m$ respectively.

  • PDF

Edge Adaptive Color Interpolation for Ultra-Small HD-Grade CMOS Video Sensor in Camera Phones

  • Jang, Won-Woo;Kim, Joo-Hyun;Yang, Hoon-Gee;Lee, Gi-Dong;Kang, Bong-Soon
    • Journal of information and communication convergence engineering
    • /
    • v.8 no.1
    • /
    • pp.51-58
    • /
    • 2010
  • This paper proposes an edge adaptive color interpolation for an ultra-small HD-grade complementary metal-oxide semiconductor (CMOS) video sensor in camera phones that can process 720-p/30-fps videos. Recently, proposed methods with great image quality perceptually reconstruct the green component and then estimate the red/blue component using the reconstructed green and neighbor red and blue pixels. However, these methods require the bulky memory line buffers in order to temporally store the reconstructed green components. The edge adaptive color interpolation method uses seven or nine patterns to calculate the six edge directions. At the same time, the threshold values are adaptively adjusted by the sum of the color values of the selected pixels. This method selects the suitable one among the patterns using two flowcharts proposed in this paper, and then interpolates the missing color values. For verification, we calculated the peak-signal-to-noise-ratio (PSNR) in the test images, which were processed by the proposed algorithm, and compared the calculated PSNR of the existing methods. The proposed color interpolation is also fabricated with the 0.18-${\mu}m$ CMOS flash memory process.

Automatic Color Recognition System for Stockigt Sizing Test (I) - Bias of Stockigt sizing test based on observer's subjectiveness - (스테키히트 시험용 자동 발색 인지 시스템 개발을 위한 기초연구(I) - Stockigt 사이즈도 시험법에 영향을 주는 요인 분석 -)

  • 김재옥;김철환;박종열
    • Journal of Korea Technical Association of The Pulp and Paper Industry
    • /
    • v.36 no.1
    • /
    • pp.1-8
    • /
    • 2004
  • One of the most frequently used method for measurement of the degree of sizing (viz., hydrophobicity) is the Stockigt test. However, the Stockigt test was influenced by various factors such as dropping height, dropping amount, dropping speed and viewing angle. The resultant data of the sizing degree on the same specimen also varied according to different testers. Thus, the Stockigt test should be modified to be regarded as a highly reliable and reproducible standard method. For modifying the Stockigt test, it was required to quantify red coloration by reaction between 1% ferric chloride and 2% ammonium thiocyante during Stockigt testing. The cameras capturing the serial images during the red coloration process were the CMOS (Complementary Metal Oxide Semiconductor)-type and CCD (Charge Coupled Device)-type cameras. For measurement based on KS M 7025, the CCD-type camera must be used due to its high resolution, and on the other hand, for measurement based on Tappi Useful Method 429, the CMOS-type camera may be used owing to its low resolution. It was needed to covert the RGB values of a droplet image into HSV(Hue, Saturation, and Value) values because the human eyes are much closer to HSV than RGB. Among HSV values, the Hue value was accepted as the most reliable index consistent with the red coloration process by excluding the surrounding conditions such as light, tester's movement etc.

Electrical Characteristics of Power Switching Sensor IC fabricated in Bipolar-CMOS-DMOS Process (BCD 프로세스를 이용한 파워 스위칭 센서 IC의 제작과 특성 연구)

  • Kim, Sunjung
    • Journal of IKEEE
    • /
    • v.20 no.4
    • /
    • pp.428-431
    • /
    • 2016
  • Power semiconductor devices had been producted with bipolar only processes, but Bipolar-CMOS-DMOS(BCD) processes have been adapted recently to fabricate these devices since most foundry companies have provided BCD processes instead of Bipolar only processes. In this study, Regulator and OP Amp are used as most popular design IPs and BCD processes for the designing are converted from bipolar only processes. Power Switching Sensor(PSS) ICs are designed specifically and fabricated on a silicon chip. The operation results of the packaged chip show the good matching with test results of the simulation.

A 1.2 V 7-bit 1 GS/s CMOS Flash ADC with Cascaded Voting and Offset Calibration

  • Jang, Young-Chan;Bae, Jun-Hyun;Lee, Ho-Young;You, Yong-Sang;Kim, Jae-Whui;Sim, Jae-Yoon;Park, Hong-June
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.8 no.4
    • /
    • pp.318-325
    • /
    • 2008
  • A 1.2 V 7-bit 1 GS/s CMOS flash ADC with an interpolation factor of 4 is implemented by using a $0.13\;{\mu}m$ CMOS process. A digital calibration of DC reference voltage is proposed for the $1^{st}$ preamp array to compensate for the input offset voltage of differrential amplifiers without disturbing the high-speed signal path. A 3-stage cascaded voting process is used in the digital encoder block to eliminate the conescutive bubbles up to seven completely, if the $2^{nd}$ preamp output is assumed to have a single bubble at most. ENOB and the power consumption were measured to be 5.88 bits and 212 mW with a 195 MHz $400\;mV_{p-p}$ sine wave input.

Vision Chip for Edge and Motion Detection with a Function of Output Offset Cancellation (출력옵셋의 제거기능을 가지는 윤곽 및 움직임 검출용 시각칩)

  • Park, Jong-Ho;Kim, Jung-Hwan;Suh, Sung-Ho;Shin, Jang-Kyoo;Lee, Min-Ho
    • Journal of Sensor Science and Technology
    • /
    • v.13 no.3
    • /
    • pp.188-194
    • /
    • 2004
  • With a remarkable advance in CMOS (complimentary metal-oxide-semiconductor) process technology, a variety of vision sensors with signal processing circuits for complicated functions are actively being developed. Especially, as the principles of signal processing in human retina have been revealed, a series of vision chips imitating human retina have been reported. Human retina is able to detect the edge and motion of an object effectively. The edge detection among the several functions of the retina is accomplished by the cells called photoreceptor, horizontal cell and bipolar cell. We designed a CMOS vision chip by modeling cells of the retina as hardwares involved in edge and motion detection. The designed vision chip was fabricated using $0.6{\mu}m$ CMOS process and the characteristics were measured. Having reliable output characteristics, this chip can be used at the input stage for many applications, like targe tracking system, fingerprint recognition system, human-friendly robot system and etc.

Phase-Locked Loop with a loop filter consisting of a capacitor and a charge pump functioned as resistor (저항 역할을 하는 전하펌프와 하나의 커패시터로 구성된 루프 필터를 가진 위상고정루프)

  • Park, Jong-Youn;Choi, Hyek-Hwan
    • Journal of the Korea Institute of Information and Communication Engineering
    • /
    • v.16 no.11
    • /
    • pp.2495-2502
    • /
    • 2012
  • This paper presents a new structure of phase looked loop (PLL) for replacing a process sensitive resistor in loop filter with an additional charge pump (CP). The additional charge pump works as a resistor in a loop filter. The output of two charge pumps changes same direction according to process variation. The simulation results according to process conditions(SS/TT/FF) demonstrate that the proposed PLL works properly with process variations. It has been designed with a 1.8V $0.18{\mu}m$ CMOS process and proved by simulation with HSPICE.

A Study on the 0.5$\mu\textrm{m}$ Dual Gate High Voltage Process for Multi Operation Applications (Multi Operation을 위한 0.5$\mu\textrm{m}$Dual Gate 고전압 공정에 관한 연구)

  • 송한정;김진수;곽계달
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2000.11a
    • /
    • pp.463-466
    • /
    • 2000
  • According to the development of the semiconductor micro device technology, IC chip trends the high integrated, low power tendency. Nowadays, it can be showed the tendency of single chip in system level. But in the system level, IC operates by multi power supply voltages. So, semiconductor process is necessary for these multi power operation. Therefore, in this paper, dual gate high voltage device that operate by multi power supply of 5V and 20V fabricated in the 0.5${\mu}{\textrm}{m}$ CMOS process technology and its electrical characteristics were analyzed. The result showed that the characteristics of the 5V device almost met with the SPICE simulation, the SPICE parameters are the same as the single 5V device process. And the characteristics of 20V device showed that gate length 3um device was available without degradation. Its current was 520uA/um, 350uA/um for NMOS, PMOS and the breakdown voltages were 25V, 28V.

  • PDF

A Parallel Coupled QVCO and Differential Injection-Locked Frequency Divider in 0.13 μm CMOS

  • Park, Bong-Hyuk;Lee, Kwang-Chun
    • Journal of electromagnetic engineering and science
    • /
    • v.10 no.1
    • /
    • pp.35-38
    • /
    • 2010
  • A fully integrated parallel-coupled 6-GHz quadrature voltage-controlled oscillator (QVCO) has been designed. The symmetrical parallel-coupled quadrature VCO is implemented using 0.13-${\mu}m$ CMOS process. The measured phase noise is -101.05 dBc/Hz at an offset frequency of 1 MHz. The tuning range of 710 MHz is achieved with a control voltage ranging from 0.3 to 1.4 V. The average output phase error is about $1.26^{\circ}$ including cables and connectors. The QVCO dissipates 10 mA including buffer from the 1.5 V supply voltage. The output characteristic of the differential injection-locked frequency divider (DILFD), which has similar topology to the QVCO, is presented.