• Title/Summary/Keyword: CMOS Technology

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Design of an Advanced CMOS Power Amplifier

  • Kim, Bumman;Park, Byungjoon;Jin, Sangsu
    • Journal of electromagnetic engineering and science
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    • v.15 no.2
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    • pp.63-75
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    • 2015
  • The CMOS power amplifier (PA) is a promising solution for highly-integrated transmitters in a single chip. However, the implementation of PAs using the CMOS process is a major challenge because of the inferior characteristics of CMOS devices. This paper focuses on improvements to the efficiency and linearity of CMOS PAs for modern wireless communication systems incorporating high peak-to-average ratio signals. Additionally, an envelope tracking supply modulator is applied to the CMOS PA for further performance improvement. The first approach is enhancing the efficiency by waveform engineering. In the second approach, linearization using adaptive bias circuit and harmonic control for wideband signals is performed. In the third approach, a CMOS PA with dynamic auxiliary circuits is employed in an optimized envelope tracking (ET) operation. Using the proposed techniques, a fully integrated CMOS ET PA achieves competitive performance, suitable for employment in a real system.

Primitive IPs Design Based on a Memristor-CMOS Circuit Technology (멤리스터-CMOS 회로구조 기반의 프리미티브 IP 설계)

  • Han, Ca-Ram;Lee, Sang-Jin;Eshraghian, Kamran;Cho, Kyoungrok
    • Journal of the Institute of Electronics and Information Engineers
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    • v.50 no.4
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    • pp.65-72
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    • 2013
  • This paper presents design methodology for Memristor-CMOS circuits and its application to primitive IPs design. We proposed a Memristor model and designed basic elements, Memristor AND/OR gates. The primitive IPs based on a Memristor-CMOS technology is proposed for a Memristive system design. The netlists of IPs are extracted from the layouts of Memristor-CMOS and is verified with SPICE-like Memristor model under $0.18{\mu}m$ CMOS technology. As a result, an example design Memristor-CMOS full adder has only 47.6 % of silicon area compare to the CMOS full-adder.

Thick Metal CMOS Technology on High Resistivity Substrate and Its Application to Monolithic L-band CMOS LNAs

  • Kim, Cheon-Soo;Park, Min;Kim, Chung-Hwan;Yu, Hyun-Kyu;Cho, Han-Jin
    • ETRI Journal
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    • v.21 no.4
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    • pp.1-8
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    • 1999
  • Thick metal 0.8${\mu}m$ CMOS technology on high resistivity substrate(RF CMOS technology) is demonstrated for the L-band RF IC applications, and we successfully implemented it to the monolithic 900 MHz and 1.9 GHz CMOS LNAs for the first time. To enhance the performance of the RF circuits, MOSFET layout was optimized for high frequency operation and inductor quality was improved by modifying the technology. The fabricated 1.9 GHz LNA shows a gain of 15.2 dB and a NF of 2.8 dB at DC consumption current of 15mA that is an excellent noise performance compared with the offchip matched 1.9 GHz CMOS LNAs. The 900 MHz LNA shows a high gain of 19 dB and NF of 3.2 dB despite of the performance degradation due to the integrating of a 26 nH inductor for input match. The proposed RF CMOS technology is a compatibel process for analog CMOS ICs, and the monolithic LNAs employing the technology show a good and uniform RF performance in a five inch wafer.

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A Study on the Characteristics of BiCMOS and CMOS Inverters (BiCMOS 및 CMOS로 구현된 Inverter에 대한 특성비교)

  • 정종척;이계훈;우영신;성만영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1993.11a
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    • pp.93-96
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    • 1993
  • BiCMOS technology, which combines CMOS and bipolar technology, offers the possibility of achieving both very high density and high performance. In this paper, the characteristics of BiCMOS and CMOS circuits, especilly the delay time is studied. BiCMOS inverter, which has high drive ability because of bipolar transistor, drives high load capacitance and has low-power characteristics because the current flows only during switching transient just like the CMOS gate. BiCMOS inverter has the less dependence on load capacitance than CMOS inverter. SPICE that has been used for electronic circuit analysis is chosen to simulate these circuits and the characteristics is discussed.

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The Study and characteristics of integrated CMOS sensor's packaging (집적화된 CMOS 센서의 팩키징 연구 및 특성 평가)

  • Roh, Ji-Hyoung;Kwon, Hyeok-Bin;Shin, Kyu-Sik;Cho, Nam-Kyu;Moon, Byung-Moo;Lee, Dae-Sung
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1551_1552
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    • 2009
  • In this paper, we presented the packaging technologies of CMOS ISFET(Ion Sensitive Field Effect Transistor) pH sensor using post-CMOS process and MCP(Multi Chip Packaging). We have proposed and developed two types of packaging technology. one is one chip, which sensing layer is deposited on the gate metal of standard CMOS ISFET, the other is two chip type, which sensing layer is separated from CMOS ISFET and connected by bonding wire. These proposed packaging technologies would make it easy to fabricate CMOS ISFET pH sensor and to make variety types of pH sensor.

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Characteristics of CMOS ISFET pH sensor as packaging type (Packaging 형태에 따른 CMOS ISFET pH 센서의 특성평가)

  • Shin, Kyu-Sik;Roh, Ji-Hyoung;Cho, Nam-Kyu;Lee, Dae-Sung
    • Proceedings of the IEEK Conference
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    • 2008.06a
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    • pp.517-518
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    • 2008
  • Highly integrated ISFETs require the monolithic implementation of ISFETs, CMOS electronics, and additional sensors on the same chip This paper presents novel packaging type of CMOS ISFET pH sensor using standard CMOS FET chip and extended sensing membrane which is separated from CMOS FET. This proposed packaging type will make it easy to fabricate CMOS ISFET pH sensors

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RF CMOS Power Amplifiers for Mobile Terminals

  • Son, Ki-Yong;Koo, Bon-Hoon;Lee, Yu-Mi;Lee, Hong-Tak; Hong, Song-Cheol
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.9 no.4
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    • pp.257-265
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    • 2009
  • Recent progress in development of CMOS power amplifiers for mobile terminals is reviewed, focusing first on switching mode power amplifiers, which are used for transmitters with constant envelope modulation and polar transmitters. Then, various transmission line transformers are evaluated. Finally, linear power amplifiers, and linearization techniques, are discussed. Although CMOS devices are less linear than other devices, additional functions can be easily integrated with CMOS power amplifiersin the same IC. Therefore, CMOS power amplifiers are expected to have potential applications after various linearity and efficiency enhancement techniques are used.

A CMOS Temperature Control Circuit for Crystal-on-Chip Oscillator

  • Park, Cheol-Young
    • Proceedings of the Korea Society of Information Technology Applications Conference
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    • 2005.11a
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    • pp.103-106
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    • 2005
  • This paper reports design and fabrication of CMOS temperature sensor circuit using MOSIS 0.25um CMOS technology. The proposed circuit has a temperature coefficient of $13mV/^{\circ}C$ for a wide operating temperature range with a good linearity. This circuit may be applicable to the design of one-chip IC where quartz crystal resonator is directly mounted on CMOS oscillator chips.

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3- Transistor Cell OTP ROM Array Using Standard CMOS Gate-Oxide Antifuse

  • Kim, Jin-Bong;Lee, Kwy-Ro
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.3 no.4
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    • pp.205-210
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    • 2003
  • A 3-Transistor cell CMOS OTP ROM array using standard CMOS antifuse (AF) based on permanent breakdown of MOSFET gate oxide is proposed, fabricated and characterized. The proposed 3-T OTP cell for ROM array is composed of an nMOS AF, a high voltage (HV) blocking nMOS, and cell access transistor, all compatible with standard CMOS technology. The experimental results show that the proposed structure can be a viable technology option as a high density OTP ROM array for modern digital as well as analog circuits.

Development of Si(110) CMOS process for monolithic integration with GaN power semiconductor (질화갈륨 전력반도체와 Si CMOS 소자의 단일기판 집적화를 위한 Si(110) CMOS 공정개발)

  • Kim, Hyung-tak
    • Journal of IKEEE
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    • v.23 no.1
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    • pp.326-329
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    • 2019
  • Gallium nitride(GaN) has been a superior candidate for the next generation power electronics. As GaN-on-Si substrate technology is mature, there has been new demand for monolithic integration of GaN technology with Si CMOS devices. In this work, (110)Si CMOS process was developed and the fabricated devices were evaluated in order to confirm the feasibility of utilizing domestic foundry facility for monolithic integration of Si CMOS and GaN power devices.