Titanium Chromium Nitrided (TiCrN) coatings were deposited on stainless steel 316 L and Si (100) wafer by inductively coupled plasma assisted D.C. magnetron sputtering at the various sputtering power on Cr target and $N_2/Ar$ gas ratio. Increasing the sputtering power of Cr target, XRD patterns were changed from TiCrN to nitride $Cr_2Ti$. The maximum hardness was $Hk_{3g}$ 3900 at $0.3\;N_2/Ar$ gas ratio. The thickness of the TiCrN films increased as the Cr target power increased, and it showed over $Hk_{5g}3100$ hardness at 100 W, 150 W. TiCrN films were deposited by the ICP assisted DC magnetron sputtering shown good wear resistance as the $N_2/Ar$ gas ratio was 0.1, 0.3.

The microstructure of copper films prepared by a sputtering apparatus, which was fabricated to enhance the shadowing effect, was investigated by scanning electron microscopy. Black copper films were deposited on copper wires at an Ar pressure of 10 Pa. The black films had an extremely porous structure composed of separated columns. This structure is quite similar to that of black titanium films prepared by cylindrical magnetron sputtering. These results suggest that the porous structure composed of separated columns is easily formed for metal films by enhancing the shadowing effect.

The effects of the high temperature gas nitriding (HTGN), tempering and subzero treatment of STD11 steel have been investigated. HTGN treatment was carried out at $1050^{\circ}C$, $1100^{\circ}C$ and $1150^{\circ}C$ for 1 hr. in an atmosphere of $1\;kg/cm^2$ nitrogen gas. Tempering and double-tempering were performed at $550^{\circ}C$ for 1 hr. The surface layer of HTGN-treated steel appeared the precipitates of $M_2N$, $M_7C_3$ and $M_{23}C_6$ in the matrix of austenite. However, the interior region exhibited martensite with the precipitation of carbides. The nitrogen content of the surface layer appeared ~1.35 wt.%, ~0.83 wt.% and ~0.56 wt.% at the HTGN treatment temperature of $1050^{\circ}C$, $1100^{\circ}C$ and $1150^{\circ}C$, respectively. The surface hardness of double-tempered and subzero-treated steel measured the maximum value of 828 Hv, 960 Hv, 750 HV after HTGN treatment at the $1050^{\circ}C$, $1100^{\circ}C$ and $1150^{\circ}C$, respectively. These hardness value increased above 230~420 Hv compared with the HTGN-treated steel due to the decrease in retained austenite and existence of fine precipitates.

In case of using Asymmetric Bipolar Pulsed DC (ABPD) power generator, thin film is efficiently deposited as ions are getting higher energy by suppressing target poisoning and electric arc. In this article, the mechanical properties of CNx thin films deposited on the STS 316L were compared with DC and ABPD power generators. The CNx thin films deposited with ABPD clearly improved wear resistance by higher ratio of sp3CN as compared with DC. Nb interlayer affected to increase the value of 10N of adhesion between CNx thin films and substrate. But, CNx thin films deposited with ABPD couldn't endure to wear load and decreased wear resistance as the films were too thinner than substrate. Nevertheless the higher substrate bias energy applied to perform the dense films, it wasn't shown benefits about the wear properties from DC sputtering. But, in case of using ABPD sputtering, the wear resistance was largely improved without changing morphology despite of thin films.

Gas nitriding and post oxidation were performed on stainless steels and SACM 645 steel. With increasing gas nitriding time, the increasing rate of nitrided layer was most rapid on SACM 645 steel and the nitriding depth of nitrided layer was most narrow on STS 304 steel among three steels. Corrosion resistance was increased with post oxidation on stainless steels and with increasing time the effect of corrosion resistance was decreased to compare with relatively short gas nitriding time. An improvement effect of corrosion resistance was consisted of predominantly on austenitic stainless steel by post oxidation after gas nitriding among three steels and it was relatively less influenced on martensitic stainless steel.

In this study, TiCrN films were deposited on STS 316 Land Si (100) wafer by inductively coupled plasma (ICP) assisted D.C. magnetron sputtering. The effect R.F. power for ICP discharge on the mechanical properties of TiCrN films was investigated. XRD, XPS and FE-SEM were used for the structure analysis. Also the Micro-Knoop hardness tester and profilometer were used for measuring hardness of coatings and film stress respectively. As increasing the R.F. power for ICP discharge, thickness of coating was decreased from 1633 nm to 1288 nm but hardness was increased about $Hk_{5g}$ 4200 at 400 W. All of the XRD patterns showed (111), (200) and (220) peaks of TiCrN films. Surface morphology was studied using the profilometer. FE-SEM was used to know morphology and cross-section of the films. Structure of the films was changed dense as increased ICP power.