A Study on the Mechanical Properties of CNx Thin Films Deposited by Asymmetric Bipolar Pulsed D.C. Sputtering

비대칭 펄스 DC 반응성 스퍼터링 법에 의한 CNx 박막의 기계적 특성에 관한 연구

  • Kim, J.H. (School of Material Science and Engineering, University of Ulsan) ;
  • Kim, D.W. (School of Material Science and Engineering, University of Ulsan) ;
  • Cha, B.C. (School of Material Science and Engineering, University of Ulsan) ;
  • Kim, S.K. (School of Material Science and Engineering, University of Ulsan) ;
  • Lee, B.S. (School of Material Science and Engineering, University of Ulsan) ;
  • Jeon, S.H. (R&D Center, ONE JUNG CAN MANUFACTURING CO,.Ltd) ;
  • Kim, D.I. (School of Material Science and Engineering, University of Ulsan) ;
  • You, Y.Z. (School of Material Science and Engineering, University of Ulsan)
  • 김준호 (울산대학교 첨단소재공학부) ;
  • 김대욱 (울산대학교 첨단소재공학부) ;
  • 차병철 (울산대학교 첨단소재공학부) ;
  • 김선광 (울산대학교 첨단소재공학부) ;
  • 이병석 (울산대학교 첨단소재공학부) ;
  • 전신희 (원정제관(주) 연구소) ;
  • 김대일 (울산대학교 첨단소재공학부) ;
  • 유용주 (울산대학교 첨단소재공학부)
  • Published : 2009.09.30

Abstract

In case of using Asymmetric Bipolar Pulsed DC (ABPD) power generator, thin film is efficiently deposited as ions are getting higher energy by suppressing target poisoning and electric arc. In this article, the mechanical properties of CNx thin films deposited on the STS 316L were compared with DC and ABPD power generators. The CNx thin films deposited with ABPD clearly improved wear resistance by higher ratio of sp3CN as compared with DC. Nb interlayer affected to increase the value of 10N of adhesion between CNx thin films and substrate. But, CNx thin films deposited with ABPD couldn't endure to wear load and decreased wear resistance as the films were too thinner than substrate. Nevertheless the higher substrate bias energy applied to perform the dense films, it wasn't shown benefits about the wear properties from DC sputtering. But, in case of using ABPD sputtering, the wear resistance was largely improved without changing morphology despite of thin films.

Keywords

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