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A Study on the Mechanical Properties of CNx Thin Films Deposited by Asymmetric Bipolar Pulsed D.C. Sputtering  

Kim, J.H. (School of Material Science and Engineering, University of Ulsan)
Kim, D.W. (School of Material Science and Engineering, University of Ulsan)
Cha, B.C. (School of Material Science and Engineering, University of Ulsan)
Kim, S.K. (School of Material Science and Engineering, University of Ulsan)
Lee, B.S. (School of Material Science and Engineering, University of Ulsan)
Jeon, S.H. (R&D Center, ONE JUNG CAN MANUFACTURING CO,.Ltd)
Kim, D.I. (School of Material Science and Engineering, University of Ulsan)
You, Y.Z. (School of Material Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.22, no.5, 2009 , pp. 290-297 More about this Journal
Abstract
In case of using Asymmetric Bipolar Pulsed DC (ABPD) power generator, thin film is efficiently deposited as ions are getting higher energy by suppressing target poisoning and electric arc. In this article, the mechanical properties of CNx thin films deposited on the STS 316L were compared with DC and ABPD power generators. The CNx thin films deposited with ABPD clearly improved wear resistance by higher ratio of sp3CN as compared with DC. Nb interlayer affected to increase the value of 10N of adhesion between CNx thin films and substrate. But, CNx thin films deposited with ABPD couldn't endure to wear load and decreased wear resistance as the films were too thinner than substrate. Nevertheless the higher substrate bias energy applied to perform the dense films, it wasn't shown benefits about the wear properties from DC sputtering. But, in case of using ABPD sputtering, the wear resistance was largely improved without changing morphology despite of thin films.
Keywords
CNx; Carbon Nitride; Asymmetric Bipolar Pulsed D.C; Sputtering;
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