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Investigation of the TiCrN Coating Deposited by Inductively Coupled Plasma Assisted DC Magnetron Sputtering.  

Cha, B.C. (School of Materials Science and Engineering, University of UIsan)
Kim, J.H. (School of Materials Science and Engineering, University of UIsan)
Lee, B.S. (School of Materials Science and Engineering, University of UIsan)
Kim, S.K. (School of Materials Science and Engineering, University of UIsan)
Kim, D.W. (School of Materials Science and Engineering, University of UIsan)
Kim, D. (School of Materials Science and Engineering, University of UIsan)
You, Y.Z. (School of Materials Science and Engineering, University of UIsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.22, no.5, 2009 , pp. 267-274 More about this Journal
Abstract
Titanium Chromium Nitrided (TiCrN) coatings were deposited on stainless steel 316 L and Si (100) wafer by inductively coupled plasma assisted D.C. magnetron sputtering at the various sputtering power on Cr target and $N_2/Ar$ gas ratio. Increasing the sputtering power of Cr target, XRD patterns were changed from TiCrN to nitride $Cr_2Ti$. The maximum hardness was $Hk_{3g}$ 3900 at $0.3\;N_2/Ar$ gas ratio. The thickness of the TiCrN films increased as the Cr target power increased, and it showed over $Hk_{5g}3100$ hardness at 100 W, 150 W. TiCrN films were deposited by the ICP assisted DC magnetron sputtering shown good wear resistance as the $N_2/Ar$ gas ratio was 0.1, 0.3.
Keywords
TiCrN; wear test; ICP; sputtering; nitride;
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