• Proceedings of the Materials Research Society of Korea Conference
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• 1998.11a
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• pp.128-128
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• 1998

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.11
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• pp.1631-1636
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• 1989

A space charge model for semiconductor reduced gas sensors has been roposed and applied to gas sensing mechanism. SnO2-x and SnO2-x/Pt thin film were deposited by vacuum evaporating method. And Hall effect and gas sensitivity characteristics of these sensors were measured. From the space charge model and carrier concentration, the number of the adsorbed gas atom on the solid surface was calculated quantitatively. The gas sensing model was compared with CO gas sensitivities of the fabricated thin film gas sensors.

• Korean Journal of Materials Research
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• v.23 no.8
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• pp.435-440
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• 2013

Transparent and conducting thin films of Ta-doped $SnO_2$ were fabricated on a glass substrate by a pulse laser deposition(PLD) method. The structural, optical, and electrical properties of these films were investigated as a function of doping level, oxygen partial pressure, substrate temperature, and film thickness. XRD results revealed that all the deposited films were polycrystalline and the intensity of the (211) plane of $SnO_2$ decreased with an increase of Ta content. However, the orientation of the films changed from (211) to (110) with an increase in oxygen partial pressure (40 to 100 mTorr) and substrate temperature. The crystallinity of the films also increased with the substrate temperature. The electrical resistivity measurements showed that the resistivity of the films decreased with an increase in Ta doping, which exhibited the lowest resistivity (${\rho}{\sim}1.1{\times}10^{-3}{\Omega}{\cdot}cm$) for 10 wt% Ta-doped $SnO_2$ film, and then increased further. However, the resistivity continuously decreased with the oxygen partial pressure and substrate temperature. The optical bandgap of the 10 wt% Ta-doped $SnO_2$ film increased (3.67 to 3.78 eV) with an increase in film thickness from 100-700 nm, and the figure of merit revealed an increasing trend with the film thickness.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.99-99
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• 2014

Transparent oxide semiconductors (TOSs) are. currently attracting attention for application to transparent electrodes in optoelectronic devices and active channel layers in thin-film transistors. One of the key issues for the realization of next generation transparent electronic devices such as transparent complementary metal-oxide-semiconductor thin-film transistors (CMOS TFTs), transparent wall light, sensors, and transparent solar cell is to develop p-type TOSs. In this talks, I will introduce issues and status related to p-type TOSs such as LnCuOQ (Ln=lanthanide, Q=S, Se), $SrCu_2O_2$, $CuMO_2$ (M=Al, Ga, Cr, In), ZnO, $Cu_2O$ and SnO. The growth and properties of SnO and Cu-based oxides and their application to electronic devices will be discussed.

• Korean Journal of Materials Research
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• v.4 no.2
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• pp.159-165
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• 1994

Two kinds of humidity sensor are made, one by anodizing pure aluminum and the other by evaporation Sn02 on the anodized pure alumia film, and their electrical characteristics are investigated in various humidity atmosphere. The change of surface resistance with humidity of $AI_2O_3/AI$ and $SnO_2-AI_2O_3/Al$ sensors are found to be $1.40 \times 10^{-2}\Omega$/RH and $1.56 \times 10^{-2}\Omega$/RH, respectively. The hysteresis phenomena associated with the irreversibility of surface resistance-humidity is less in $SnO_2-AI_2O_3/Al$ sensor than in $AI_2O_3/AI$. It is concluded that $SnO_2-AI_2O_3/Al$ film can be used as humidity sensor in room temperature region because temperature dependence of surface resistance of the film is found to be as $0.56 \times 10^{-2} \Omega /^{\circ}C$ in O~ $20^{\circ}C$ range, where as $2.50 \times 10^{-2} \Omega /^{\circ}C$ in 40-$50^{\circ}C$.

• Korean Journal of Materials Research
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• v.27 no.4
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• pp.216-220
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• 2017

The effect of electron beam (EB) irradiation on the electrical properties of Zn-Sn-O (ZTO) thin films fabricated using a sol-gel process was investigated. As the EB dose increased, the saturation mobility of ZTO thin film transistors (TFTs) was found to slightly decrease, and the subthreshold swing and on/off ratio degenerated. X-ray photoelectron spectroscopy analysis of the O 1s core level showed that the relative area of oxygen vacancies ($V_O$) increased from 10.35 to 12.56 % as the EB dose increased from 0 to $7.5{\times}10^{16}electrons/cm^2$. Also, spectroscopic ellipsometry analysis showed that the optical band gap varied from 3.53 to 3.96 eV with increasing EB dose. From the results of the electrical property and XPS analyses of the ZTO TFTs, it was found that the electrical characteristic of the ZTO thin films changed from semiconductor to conductor with increasing EB dose. It is thought that the electrical property change is due to the formation of defect sites like oxygen vacancies.

• Industry Promotion Research
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• v.3 no.1
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• pp.1-5
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• 2018

$SnO_2$ films were annealed in a vaccum atmosphere conditions to research the temperature dependency of current-voltage characteristics in according to the bonding structures. The $SnO_2$ film annealed in a vacuum became an amorphous structure but films annealed in an atmosphere condition had a crystal structure. The defects or depletion layer were formed by the electron-hole combination after annealing processes, and the electrical properties were changed depending on the crystal structure, binding energy and the variation of carriers. $SnO_2$ became more crystal-structural with increasing the annealing temperature, and the current increased at $SnO_2$ film annealed at $150^{\circ}C$ with Schottky current.

• Journal of the Korean Society for Heat Treatment
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• v.25 no.5
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• pp.239-243
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• 2012

$SnO_2$ thin films were prepared on the Si substrate by radio frequency (RF) magnetron sputtering and then post deposition vacuum annealed to investigate the effect of annealing temperature on the structural properties and hydrogen gas sensitivity of the films. The films that annealed at $300^{\circ}C$ show the higher sensitivity than the other films annealed at $150^{\circ}C$. From atomic force microscope observation, it is supposed that post deposition annealing promotes the rough surface and also, increase gas sensitivity of $SnO_2$ films for hydrogen gas. These results suggest that the vacuum annealed $SnO_2$ thin films at optimized temperatures are promising for practical high-performance hydrogen gas sensors.

• Korean Journal of Materials Research
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• v.30 no.3
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• pp.117-122
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• 2020

The effects of fast neutron irradiation on the electrical and optical properties of Li (3 at%) doped ZnSnO (ZTO) thin films fabricated using a sol-gel process are investigated. From the results of Li-ZTO TFT characteristics according to change of neutron irradiation time, the saturation mobility is found to increase and threshold voltage values shift to a negative direction from 1,000 s neutron irradiation time. X-ray photoelectron spectroscopy analysis of the O 1s core level shows that the relative area of oxygen vacancies is almost unchanged with different irradiation times. From the results of band alignment, it is confirmed that, due to the increase of electron carrier concentration, the Fermi level (E_F) of the sample irradiated for 1,000 s is located at the position closest to the conduction band minimum. The increase in electron concentration is considered by looking at the shallow band edge state under the conduction band edge formed by fast neutron irradiation of more than 1,000 s.

• Journal of Sensor Science and Technology
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• v.3 no.2
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• pp.65-73
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• 1994

TO:F($SnO_{2}:F$) thin films were prepared by RF magnetron sputtering system. The dependence of their structural, electrical, and optical properties on deposition conditions such as substrate temperature, working pressure and power was studied. The optimum conditions of TO:F thin film are $SnF_{2}$ content of 15wt.% in target, RF power of 150W, substrate temperature of $150^{\circ}C$ and working pressure of 2mmTr. The resistivity and transmittance at 550nm in visible spectrum of the TO:F film deposited at optimum condition are $9{\times}10^{-4}{\Omega}{\cdot}cm$ and above 85%, respectively. For the films deposited from the target without $SnF_{2}$ and with 15wt.% $SnF_{2}$, the optical bandgaps calculated from the transmittance curves are 3.84 and 3.9eV, respectively. X-ray diffraction patterns showed that TO and TO:F films had tetragonal rutile structure with (101), (200) direction.