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http://dx.doi.org/10.12656/jksht.2012.25.5.239

Effect of Post Deposition Annealing Temperature on the Hydrogen Gas Sensitivity of SnO2 Thin Films  

You, Y.Z. (School of Materials Science and Engineering, University of Ulsan)
Kim, S.K. (School of Materials Science and Engineering, University of Ulsan)
Lee, Y.J. (School of Materials Science and Engineering, University of Ulsan)
Heo, S.B. (School of Materials Science and Engineering, University of Ulsan)
Lee, H.M. (School of Materials Science and Engineering, University of Ulsan)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.25, no.5, 2012 , pp. 239-243 More about this Journal
Abstract
$SnO_2$ thin films were prepared on the Si substrate by radio frequency (RF) magnetron sputtering and then post deposition vacuum annealed to investigate the effect of annealing temperature on the structural properties and hydrogen gas sensitivity of the films. The films that annealed at $300^{\circ}C$ show the higher sensitivity than the other films annealed at $150^{\circ}C$. From atomic force microscope observation, it is supposed that post deposition annealing promotes the rough surface and also, increase gas sensitivity of $SnO_2$ films for hydrogen gas. These results suggest that the vacuum annealed $SnO_2$ thin films at optimized temperatures are promising for practical high-performance hydrogen gas sensors.
Keywords
$SnO_2$; Thin film; Annealing; Roughness; Hydrogen sensor;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
연도 인용수 순위
1 A. A. Dakhel : Solar Energy, 86 (2012) 126.   DOI   ScienceOn
2 S. Wang, Z. Wang, X. Liu and L. Zhang : Sensors and Actuators B: Chemical, 131 (2008) 318.   DOI   ScienceOn
3 T. Seiyama, A. Kato and N. Nagatani : Anal. Chem, 34 (1962) 1502.   DOI
4 N. Taguchi : Japanese Patent Application No. 45-38200 (1962).
5 J. Yu and G. M. Choi : Sensors and Actuators B: Chemical, 75 (2001) 56.   DOI
6 X. Liu, J. Zhang, X. Guo, S. Wu and S. Wang : Sensors and Actuators B: Chemical, 152 (2011) 162.   DOI
7 A Salehi : Thin Solid Films, 416 (2002) 260.   DOI
8 R. Korotkov, R. Gupta, P. Ricou, R. Smith and G. Silverman : Thin Solid Films, 516 (2008) 4720.   DOI
9 S. Park and J. D. Mackenzie : Thin Solid Films, 258 (1995) 268.   DOI
10 S.Heo, H. Lee, C. Jung and D. Kim : J. Kor. Soc. Heat treat, 24 (2011)31.
11 N. G. Patel, P. D. Patel and V. S. Vaishnav : Sens. Actuators B, 96 (2003) 180.   DOI
12 H. Lee, S. Heo, Y. Kong and D. Kim : J. Korean Vacuum Soc, 20 (2011) 195.   DOI
13 B. D. Cullity : Elements of X-ray diffractions, Addition-Wesley, Reading, MA, (1978) 102-121.