References
-
Reynier I. Revilla, Xiao-Jun Li, Yan-Lian Yang, Chen Wang, Large electric field enhanced hardness effect in a
$SiO_2$ film, Sci. Rep. 4, 4523, 2014. - H. M. Kim and J. J. kim, "Heat treatment effects on the electrical properties of In2O3-ZnO films prepared by rf-magnetron sputtering method," J. Korean Vacuum Society, Vol. 14, pp. 238-244, 2005.
- Teresa Oh "Analysis of Electrical Characteristics of Oxide Semiconductor of ZnO, SnO2 and ZTO" Korean Journal of Materials Research, Vol. 25 pp 347-349, 2016.
- Young Deuk Ann, Jae Ho Yeon and Teresa Oh, "Comparison between the electrical properties and structures after atmosphere annealing and vaccum annealing of IGZO thin films," Industry Promotion Research, Vol. 1, pp. 1-6, 2016.
- D. H. Hwang, H. H. Ahn, K. N. Hui, K. S. Hui, and Y. G. Son, "Effect of oxygen partial pressure contents on the properties of Al-doped ZnO thin films prepared by radio frequency sputtering," J. Ceram. Proc. Res., Vol. 12, pp. 150-154, 2011.
- Kyoungjin Kim and Joong-Youn Park" Effects of Forced Self Driving Function in Silicon Wafer Polishing Head on the Planarization of Polished Wafer Surfaces " The Journal of the Korean Institute of Electrical and Electronic Material Engineers, March 2014. Vol. 13,pp13-17 No. 1.
- Dukyean Yoo, Hyoungju Kim, Junyeong Kim and Jungyol Jo" Current Variation in ZnO Thin-Film Transistor under Different Annealing Conditions " Journal of the Semiconductor & Display Technology, Vol. 13, pp.63-66, 2014.
- Chu, M.C., Meena, J.S., Liu, P.T., Shieh, H.D., You, H.C., Tu, Y.W., Chang, F.C., and Ko, F.H., "Oxygen Plasma Functioning of Charge Carrier Density in Zinc Oxide Thin-Film Transistors," Applied Physics Express, Vol. 6, 076501, 2013. https://doi.org/10.7567/APEX.6.076501
- Young Ho So, Jung Ho Song, Dong Myung Seo and Teresa Oh, "A study on the chemical properties of AZO with crystral structure and IGZO of amorphous structure due to the annealing temperature," Industry Promotion Research, Vol. 1, pp. 1-6, 2016.
- D. H. Hwang, H. H. Ahn, K. N. Hui, K. S. Hui, and Y. G. Son, "Effect of oxygen partial pressure contents on the properties of Al-doped ZnO thin films prepared by radio frequency sputtering," J. Ceram. Proc. Res., Vol. 12, pp. 150-154, 2011.
- Chu, M. C., Meena, J.S., Liu, P.T., Shieh, H.D., You, H.C., Tu, Y.W., Chang, F.C., and Ko, F.H., "Oxygen Plasma Functioning of Charge Carrier Density in Zinc Oxide Thin-Film Transistors," Applied Physics Express, Vol. 6, 076501, 2013. https://doi.org/10.7567/APEX.6.076501