• Title/Summary/Keyword: Logic eFuse

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Design of a Logic eFuse OTP Memory IP (Logic eFuse OTP 메모리 IP 설계)

  • Ren, Yongxu;Ha, Pan-bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.20 no.2
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    • pp.317-326
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    • 2016
  • In this paper, a logic eFuse (electrical Fuse) OTP (One-Time Programmable) memory IP (Intellectual Property) using only logic transistors to reduce the development cost and period of OTP memory IPs is designed. To secure the reliability of other IPs than the OTP memory IP, a higher voltage of 2,4V than VDD (=1.5V) is supplied to only eFuse links of eFuse OTP memory cells directly through an external pad FSOURCE coming from test equipment in testing wafers. Also, an eFuse OTP memory cell of which power is supplied through FSOURCE and hence the program power is increased in a two-dimensional memory array of 128 rows by 8 columns being also able to make the decoding logic implemented in small area. The layout size of the designed 1kb eFuse OTP memory IP with the Dongbu HiTek's 110nm CIS process is $295.595{\mu}m{\times}455.873{\mu}m$ ($=0.134mm^2$).

Design of an Asynchronous eFuse One-Time Programmable Memory IP of 1 Kilo Bits Based on a Logic Process (Logic 공정 기반의 비동기식 1Kb eFuse OTP 메모리 IP 설계)

  • Lee, Jae-Hyung;Kang, Min-Cheol;Jin, Liyan;Jang, Ji-Hye;Ha, Pan-Bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.13 no.7
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    • pp.1371-1378
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    • 2009
  • We propose a low-power eFuse one-time programmable (OTP) memory cell based on a logic process. The eFuse OTP memory cell uses separate transistors optimized at program and read mode, and reduces an operation current at read mode by reducing parasitic capacitances existing at both WL and BL. Asynchronous interface, separate I/O, BL SA circuit of digital sensing method are used for a low-power and small-area eFuse OTP memory IP. It is shown by a computer simulation that operation currents at a logic power supply voltage of VDD and at I/O interface power supply voltage of VIO are 349.5${\mu}$A and 3.3${\mu}$A, respectively. The layout size of the designed eFuse OTP memory IP with Dongbu HiTek's 0.18${\mu}$m generic process is 300 ${\times}$557${\mu}m^2$.

Design of a redundancy control circuit for 1T-SRAM repair using electrical fuse programming (전기적 퓨즈 프로그래밍을 이용한 1T-SRAM 리페어용 리던던시 제어 회로 설계)

  • Lee, Jae-Hyung;Jeon, Hwang-Gon;Kim, Kwang-Il;Kim, Ki-Jong;Yu, Yi-Ning;Ha, Pan-Bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.14 no.8
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    • pp.1877-1886
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    • 2010
  • In this paper, we design a redundancy control circuit for 1T-SRAM repair using electrical fuse programming. We propose a dual port eFuse cell to provide high program power to the eFuse and to reduce the read current of the cell by using an external program supply voltage when the supply power is low. The proposed dual port eFuse cell is designed to store its programmed datum into a D-latch automatically in the power-on read mode. The layout area of an address comparison circuit which compares a memory repair address with a memory access address is reduced approximately 19% by using dynamic pseudo NMOS logic instead of CMOS logic. Also, the layout size of the designed redundancy control circuit for 1T-SRAM repair using electrical fuse programming with Dongbu HiTek's $0.11{\mu}m$ mixed signal process is $249.02 {\times}225.04{\mu}m^{2}$.

Design of an 8-Bit eFuse One-Time Programmable Memory IP Using an External Voltage (외부프로그램 전압을 이용한 8비트 eFuse OTP IP 설계)

  • Cho, Gyu-Sam;Jin, Mei-Ying;Kang, Min-Cheol;Jang, Ji-Hye;Ha, Pan-Bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.14 no.1
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    • pp.183-190
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    • 2010
  • We propose an eFuse one-time programmable (OTP) memory cell based on a logic process, which is programmable by an external program voltage. For the conventional eFuse OTP memory cell, a program datum is provided with the SL (Source Line) connected to the anode of the eFuse going through a voltage drop of the SL driving circuit. In contrast, the gate of the NMOS program transistor is provided with a program datum and the anode of the eFuse with an external program voltage (FSOURCE) of 3.8V without any voltage drop for the newly proposed eFuse cell. The FSOURCE voltage of the proposed cell keeps either 0V or the floating state at read mode. We propose a clamp circuit for being biased to 0V when the voltage of FSOURCE is in the floating state. In addition, we propose a VPP switching circuit switching between the logic VDD (=1.8V) and the FSOURCE voltage. The layout size of the designed eFuse OTP memory IP with Dongbu HiTek's $0.15{\mu}m$ generic process is $359.92{\times}90.98{\mu}m^2$.

Design of High-Reliability eFuse OTP Memory for PMICs (PMIC용 고신뢰성 eFuse OTP 메모리 설계)

  • Yang, Huiling;Choi, In-Wha;Jang, Ji-Hye;Jin, Liyan;Ha, Pan-Bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.16 no.7
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    • pp.1455-1462
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    • 2012
  • In this paper, a BCD process based high-reliability 24-bit dual-port eFuse OTP Memory for PMICs is designed. We propose a comparison circuit at program-verify-read mode to test that the program datum is correct by using a dynamic pseudo NMOS logic circuit. The comparison result of the program datum with its read datum is outputted to PFb (pass fail bar) pin. Thus, the normal operation of the designed OTP memory can be verified easily by checking the PFb pin. Also we propose a sensing margin test circuit with a variable pull-up load out of consideration for resistance variations of programmed eFuse at program-verify-read mode. We design a 24-bit eFuse OTP memory which uses Magnachip's $0.35{\mu}m$ BCD process, and the layout size is $289.9{\mu}m{\times}163.65{\mu}m$ ($=0.0475mm^2$).

Design of low-power OTP memory IP and its measurement (저전력 OTP Memory IP 설계 및 측정)

  • Kim, Jung-Ho;Jang, Ji-Hye;Jin, Liyan;Ha, Pan-Bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.14 no.11
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    • pp.2541-2547
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    • 2010
  • In this paper, we propose a design technique which replaces logic transistors of 1.2V with medium-voltage transistors of 3.3V having small off-leakage current in repetitive block circuits where speed is not an issue, to implement a low-power eFuse OTP memory IP in the stand-by state. In addition, we use dual-port eFuse cells reducing operational current dissipation by reducing capacitances parasitic to RWL (Read word-line) and BL (Bit-line) in the read mode. Furthermore, we propose an equivalent circuit for simulating program power injected to an eFuse from a program voltage. The layout size of the designed 512-bit eFuse OTP memory IP with a 90nm CMOS image sensor process is $342{\mu}m{\times}236{\mu}m$. It is confirmed by measurement experiments on 42 samples with a program voltage of 5V that we get a good result having 97.6 percent of program yield. Also, the minimal operational supply voltage is measured well to be 0.9V.

Design of eFuse OTP IP for Illumination Sensors Using Single Devices (Single Device를 사용한 조도센서용 eFuse OTP IP 설계)

  • Souad, Echikh;Jin, Hongzhou;Kim, DoHoon;Kwon, SoonWoo;Ha, PanBong;Kim, YoungHee
    • Journal of IKEEE
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    • v.26 no.3
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    • pp.422-429
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    • 2022
  • A light sensor chip requires a small capacity eFuse (electrical fuse) OTP (One-Time Programmable) memory IP (Intellectual Property) to trim analog circuits or set initial values of digital registers. In this paper, 128-bit eFuse OTP IP is designed using only 3.3V MV (Medium Voltage) devices without using 1.8V LV (Low-Voltage) logic devices. The eFuse OTP IP designed with 3.3V single MOS devices can reduce a total process cost of three masks which are the gate oxide mask of a 1.8V LV device and the LDD implant masks of NMOS and PMOS. And since the 1.8V voltage regulator circuit is not required, the size of the illuminance sensor chip can be reduced. In addition, in order to reduce the number of package pins of the illumination sensor chip, the VPGM voltage, which is a program voltage, is applied through the VPGM pad during wafer test, and the VDD voltage is applied through the PMOS power switching circuit after packaging, so that the number of package pins can be reduced.