• 제목/요약/키워드: FET Device

검색결과 257건 처리시간 0.023초

이상적인 이중-게이트 벌크 FinFET의 전기적 특성고찰 (Study on Electrical Characteristics of Ideal Double-Gate Bulk FinFETs)

  • 최병길;한경록;박기흥;김영민;이종호
    • 대한전자공학회논문지SD
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    • 제43권11호
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    • pp.1-7
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    • 2006
  • 이상적인(ideal) 이중-게이트(double-gate) 벌크(bulk) FinFET의 3차원(3-D) 시뮬레이션을 수행하여 전기적 특성들을 분석하였다. 3차원 시뮬레이터를 이용하여, 게이트 길이($L_g$)와 높이($H_g$), 핀 바디(fin body)의 도핑농도($N_b$)를 변화시키면서 소스/드레인 접합 깊이($X_{jSDE}$)에 따른 문턱전압($V_{th}$), 문턱전압 변화량(${\Delta}V_{th}$), DIBL(drain induced barrier lowering), SS(subthreshold swing)의 특성들을 살펴보았다. 게이트 높이가 35 nm인 소자에서 소스/드레인 접합 깊이(25 nm, 35 nm, 45 nm) 변화에 따라, 각각의 문턱전압을 기준으로 게이트 높이가 $30nm{\sim}45nm$로 변화 될 때, 문턱전압변화량은 20 mV 이하로 그 변화량이 매우 적음을 알 수 있었다. 낮은 핀 바디 도핑농도($1{\times}10^{16}cm^{-3}{\sim}1{\times}10^{17}cm^{-3}$)에서, 소스/드레인 접합 깊이가 게이트전극보다 깊어질수록 DIBL과 SS는 급격히 나빠지는 것을 볼 수 있었고. 이러한 특성저하들은 $H_g$ 아래의 ${\sim}10nm$ 위치에 국소(local) 도핑을 함으로써 개선시킬 수 있었다. 또한 local 도핑으로 소스/드레인 접합 깊이가 얕아질수록 문턱전압이 떨어지는 것을 개선시킬 수 있었다.

A Design of 5.8 ㎓ Oscillator using the Novel Defected Ground Structure

  • Joung, Myoung-Sub;Park, Jun-Seok;Lim, Jae-Bong;Cho, Hong-Goo
    • Journal of electromagnetic engineering and science
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    • 제3권2호
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    • pp.118-125
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    • 2003
  • This paper presents a 5.8-㎓ oscillator that uses a novel defected ground structure(DGS), which is etched on the metallic ground plane. As the suggested defected ground structure is the structure for mounting an active device, it is the roles of a feedback loop inducing a negative resistance as well as a frequency-selective circuit. Applying the feedback loop between the drain and the gate of a FET device produces precise phase conversion in the feedback loop. The equivalent circuit parameters of the DGS are extracted by using a three-dimensional EM simulation ,md simple circuit analysis method. In order to demonstrate a new DGS oscillator, we designed the oscillator at 5.8-㎓. The experimental results show 4.17 ㏈m output power with over 22 % dc-to-RF power efficiency and - 85.8 ㏈c/Hz phase noise at 100 KHz offset from the fundamental carrier at 5.81 ㎓.

벌집구조의 나노채널을 이용한 다중 Fin-Gate GaN 기반 HEMTs의 제조 공정 (Fabrication of Multi-Fin-Gate GaN HEMTs Using Honeycomb Shaped Nano-Channel)

  • 김정진;임종원;강동민;배성범;차호영;양전욱;이형석
    • 한국전기전자재료학회논문지
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    • 제33권1호
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    • pp.16-20
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    • 2020
  • In this study, a patterning method using self-aligned nanostructures was introduced to fabricate GaN-based fin-gate HEMTs with normally-off operation, as opposed to high-cost, low-productivity e-beam lithography. The honeycomb-shaped fin-gate channel width is approximately 40~50 nm, which is manufactured with a fine width using a proposed method to obtain sufficient fringing field effect. As a result, the threshold voltage of the fabricated device is 0.6 V, and the maximum normalized drain current and transconductance of Gm are 136.4 mA/mm and 99.4 mS/mm, respectively. The fabricated devices exhibit a smaller sub-threshold swing and higher Gm peak compared to conventional planar devices, due to the fin structure of the honeycomb channel.

The Optimal Design of Junctionless Transistors with Double-Gate Structure for reducing the Effect of Band-to-Band Tunneling

  • Wu, Meile;Jin, Xiaoshi;Kwon, Hyuck-In;Chuai, Rongyan;Liu, Xi;Lee, Jong-Ho
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제13권3호
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    • pp.245-251
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    • 2013
  • The effect of band-to-band tunneling (BTBT) leads to an obvious increase of the leakage current of junctionless (JL) transistors in the OFF state. In this paper, we propose an effective method to decline the influence of BTBT with the example of n-type double gate (DG) JL metal-oxide-semiconductor field-effect transistors (MOSFETs). The leakage current is restrained by changing the geometrical shape and the physical dimension of the gate of the device. The optimal design of the JL MOSFET is indicated for reducing the effect of BTBT through simulation and analysis.

IGBT 구조의 JFET영역 변화에 따른 온-상태 전압강하 특성 향상을 위한 연구 (Study on improvement of on-state voltage drop characteristics According to Variation of JFET region of IGBT structure)

  • 안병섭;강이구
    • 전기전자학회논문지
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    • 제22권2호
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    • pp.339-343
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    • 2018
  • 본 연구는 IGBT 구조에서 JFET 영역의 드라이브 인 확산거리 및 JFET영역의 윈도우의 크기에 따라서 항복전압과 온상태 전압강하 특성을 분석하였다. 시간은 동일하게 하면서 온도를 상승시켜 확산거리를 조정하였으며, 그 결과 항복전압은 감소되나, 온 상태 전압 강하 특성은 현저하게 좋아지는 것을 알 수 있었다. 따라서 드리프트 층의 비저항을 변화시켜 항복전압을 1440V로 고정하여 1.15V의 낮은 온 상태 전압 강하 값을 얻을 수 있었다. 따라서 본 연구결과를 토대로 Planar Gate IGBT에서는 JFET 영역의 공정 및 설계 파라미터를 효율적으로 조절한다면 같은 항복전압을 기준으로 상당히 낮은 온 상태 전압 강하 값을 확보할 수 있어, 소비전력의 측면에서 충분히 활용할 수 있을 것으로 판단된다.

수평 구조의 MOS-controlled Thyristor에서 채널에서의 길이 및 불순물 농도에 의한 스위칭 특성 (Switching Characteristics due to the Impurity Concentration and the Channel Length in Lateral MOS-controlled Thyristor)

  • 김남수;최지원;이기영;주병권;정태웅
    • 한국전기전자재료학회논문지
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    • 제18권1호
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    • pp.17-23
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    • 2005
  • The switching characteristics of MOS-Controlled Thyristor(MCT) is studied with variation of the channel length and impurity concentration in ON and OFF FET channel. The proposed MCT power device has the lateral structure and P-epitaxial layer in substrate. Two dimensional MEDICI simulator and PSPICE simulator are used to study the latch-up current and forward voltage-drop from the characteristics of I-V and the switching characteristics with variation of channel length and impurity concentration in P and N channel. The channel length and N impurity concentration of the proposed MCT power device show the strong affect on the transient characteristics of current and power. The N channel length affects only on the OFF characteristics of power and anode current, while the N doping concentration in P channel affects on the ON and OFF characteristics.

Hf0.5Zr0.5O2 강유전체 박막의 다양한 분극 스위칭 모델에 의한 동역학 분석 (Switching Dynamics Analysis by Various Models of Hf0.5Zr0.5O2 Ferroelectric Thin Films)

  • 안승언
    • 한국재료학회지
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    • 제30권2호
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    • pp.99-104
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    • 2020
  • Recent discoveries of ferroelectric properties in ultrathin doped hafnium oxide (HfO2) have led to the expectation that HfO2 could overcome the shortcomings of perovskite materials and be applied to electron devices such as Fe-Random access memory (RAM), ferroelectric tunnel junction (FTJ) and negative capacitance field effect transistor (NC-FET) device. As research on hafnium oxide ferroelectrics accelerates, several models to analyze the polarization switching characteristics of hafnium oxide ferroelectrics have been proposed from the domain or energy point of view. However, there is still a lack of in-depth consideration of models that can fully express the polarization switching properties of ferroelectrics. In this paper, a Zr-doped HfO2 thin film based metal-ferroelectric-metal (MFM) capacitor was implemented and the polarization switching dynamics, along with the ferroelectric characteristics, of the device were analyzed. In addition, a study was conducted to propose an applicable model of HfO2-based MFM capacitors by applying various ferroelectric switching characteristics models.

CST 승화법을 이용한 p-type 4H-SiC(0001) 에픽텍셜층 성장과 이를 이용한 MESFET 소자의 전기적 특성 (Epitaxial Layer Growth of p-type 4H-SiC(0001) by the CST Method and Electrical Properties of MESFET Devices with Epitaxially Grown Layers)

  • 이기섭;박치권;이원재;신병철
    • 한국전기전자재료학회논문지
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    • 제20권12호
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    • pp.1056-1061
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    • 2007
  • A sublimation epitaxial method, referred to as the Closed Space Technique (CST) was adopted to produce thick SiC epitaxial layers for power device applications. In this study, we aimed to systematically investigate surface morphologies and electrical properties of SiC epitaxial layers grown with varying a SiC/Al ratio in a SiC source powder during the sublimation growth using the CST method. The surface morphology was dramatically changed with varying the SiC/Al ratio. When the SiC/Al ratio of 90/1 was used, the step bunching was not observed in this magnification and the ratio of SiC/Al is an optimized range to grow of p-type SiC epitaxial layer. It was confirmed that the acceptor concentration of epitaxial layer was continuously decreased with increasing the SiC/Al ratio. 4H-SiC MESFETs haying a micron-gate length were fabricated using a lithography process and their current-voltage performances were characterized. It was confirmed that the increase of the negative voltage applied on the gate reduced the drain current, showing normal operation of FET device.

ZnO 나노선과 CdTe 나노입자를 이용한 NFGM 소자의 전기적 특성 (Electrical characteristics of ZnO nanowire - CdTe nanoparticle nano floating gate memory device)

  • 윤창준;염동혁;강정민;정동영;김미현;고의관;구상모;김상식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.136-137
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    • 2007
  • In this study, a single ZnO nanowire - CdTe nanoparticle nano floating gate memory (NFGM) device is successfully fabricated and characterized their memory effects by comparison of electrical characteristics of ZnO nanowire-based field effect transistor (FET) devices with CdTe nanoparticles embedded in the $Al_2O_3$ gate materials and without the CdTe nanoparticles.

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Highly Efficient Multi-Functional Material for Organic Light-Emitting Diodes; Hole Transporting Material, Blue and White Light Emitter

  • Kim, Myoung-Ki;Kwon, Jong-Chul;Hong, Jung-Pyo;Lee, Seong-Hoon;Hong, Jong-In
    • Bulletin of the Korean Chemical Society
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    • 제32권spc8호
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    • pp.2899-2905
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    • 2011
  • We have demonstrated that TPyPA can be used as an efficient multi-functional material for OLEDs; hole transporting material (HTL), blue and white-light emitter. The device based on TPyPA as the HTL exhibited an external quantum efficiency of 1.7% and a luminance efficiency of 4.2 cd/A; these values are 40% higher than the external quantum efficiency and luminance efficiency of the NPD-based reference device. The device based on TPyPA as a blue-light emitter exhibited an external quantum efficiency of 4.2% and a luminance efficiency of 5.3 $cdA^{-1}$ with CIE coordinates at (0.16, 0.14), the device based on TPyPA as a white-light emitter exhibited an external quantum efficiency of 3.2% and a luminance efficiency of 7.7 $cdA^{-1}$ with CIE coordinates at (0.33, 0.39). Also, TPyPA-based organic solar cell (OSC) exhibited a maximum power conversion efficiency of 0.35%. TPyPA-based organic thin-film transistors (OTFTs) exhibited highly efficient field-effect mobility (${\mu}_{FET}$) of $1.7{\times}10^{-4}cm^2V^{-1}s^{-1}$, a threshold voltage ($V_{th}$) of -15.9 V, and an on/off current ratio of $8.6{\times}10^3$.