• 대한전자공학회논문지SD
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• 제45권2호
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• pp.7-12
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• 2008

본 연구에서는 게이트 finger수가 증가될수록 드레인 전류의 증가율과 차단주파수가 감소되는 wide width effect를 관찰하였으며, 이 현상을 모델링하기 위하여 기존 BSIM3v3 RF 모델에 finger수에 무관한 외부 소스 저항을 새로 첨가한 개선된 SPICE MOSFET RF 모델을 개발하였다. 이러한 모델로 시뮬레이션된 Nf 종속 드레인 전류와 차단주파수는 기존 BSIM3v3 RF모델보다 $0.13{\mu}m$ multi-finger MOSFET의 측정데이터와 더 잘 일치하였으며, 이는 개선된 RF 모델의 정확도를 증명한다.

• 한국지반공학회:학술대회논문집
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• 한국지반공학회 2009년도 춘계 학술발표회
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• pp.720-728
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• 2009

This thesis is results of numerical analyses about test results of discharge capacity apparatus using penetration method. Applicability of numerical approach with FEM technique, using Cam-clay model, was confirmed by analyzing the results of standard consolidation test before analyzing test results of discharge capacity apparatus using penetration method. Thus, input parameters for the model was convinced to be appropriate. For numerical analyses about test results of discharge capacity apparatus using penetration method, identical initial and loading conditions during tests were applied to simulate test results correctly. Effects of ground disturbance resulted from installment of vertical drains on the behaviors of consolidation were also simulated. Applicability of numerical approach was investigated by comparing test results with numerical ones. As results of them, both of consolidation settlement were found to be in good agreements so that its applicability was confirmed. As results of numerical estimation, degree of consolidation with the condition of considering smear zone was found to be delayed, compared with results without smear zone. On the other hands, parametric numerical analyses of changing parameters related to smear zone such as permeability and size of smear zone and permeability of vertical drain were also carried out.

• 센서학회지
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• 제31권4호
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• pp.271-277
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• 2022

We analyzed the effects of the interface trap on the output characteristics of an inversion mode n-channel GaN Schottky barrier (SB)-MOSFET based on the N_it distribution using TCAD simulation. As interface trap number density (N_it) increased, the threshold voltage increased while the drain current density decreased. Under N_it=5.0×10¹⁰ cm^-2 condition, the threshold voltage was 3.2 V for V_DS=1 V, and the drain current density reduced to 2.4 mA/mm relative to the non-trap condition. Regardless of the N_it distribution type, there was an increase in the subthreshold swing (SS) following an increase in N_it. Under U-shaped N_it distribution, it was confirmed that the SS varied depending on the gate voltage. The interface fixed charge (Q_f) caused an shift in the threshold voltage and increased the off-state current collectively with the surface trap. In summary, GaN SB-MOSFET can be a building block for high power UV optoelectronic circuit provided the surface state is significantly reduced.

• Journal of Semiconductor Engineering
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• 제3권2호
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• pp.161-167
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• 2022

Electrical characteristics of LDMOS power device with LDD(Lightly Doped Drain) structure is studied with variation of the region of channel and LDD. The channel in LDMOSFET encloses a junction-type source and is believed to be an important parameter for determining the circuit operation of CMOS inverter. Two-dimensional TCAD MEDICI simulation is used to study hot-carrier effect, on-resistance Ron, breakdown voltage, and transient switching characteristic. The voltage-transfer characteristics and on-off switching properties are studied as a function of the channel length and doping levels. The digital logic levels of the output and input voltages are analyzed from the transfer curves and circuit operation. Study indicates that drain current significantly depends on the channel length rather than the LDD region, while the switching transient time is almost independent of the channel length. The high and low logic levels of the input voltage showed a strong dependency on the channel length, while the lateral substrate resistance from a latch-up path in the CMOS inverter was comparable to that of a typical CMOS inverter with a guard ring.

• 한국농공학회논문집
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• 제66권3호
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• pp.15-23
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• 2024

Subsurface drainage improves crop productivity in poorly drained soils but may also substantially contribute impairment of surface water quality due to excess leaching losses of nutrients like Nitrate-Nitrogen (NO₃-N). This research presents preliminary findings from a 3-years tile depth and spacing study in Illinois state that includes three drain spacings implemented in 2 plots. We found that the plot with the narrower subsurface drainage (Case 1) exported more drainage water compared to the plot with the narrower subsurface drainage system (Case 2). The total drainage water from Case 1 plot showed 57% more compared to Case 2 plot. Whereas we observed that the plot with narrower drain spacing (Case 1) exported only 9% more NO₃-N leaching losses compared to the wider plot (Case 2). The average corn yield was observed higher in plot Case 1 compared to Case 2. Especially, we observed about 7% higher corn yield in plot Case 1 compared to Case 2 plot in the relatively dried year (2022). The preliminary findings for this study suggest that subsurface drainage systems can be optimized to reduce nutrient losses while improving the crop productivity.

• JSTS:Journal of Semiconductor Technology and Science
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• 제13권4호
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• pp.361-366
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• 2013

A full-range analytic drain current model for depletion-mode long-channel surrounding-gate nanowire field-effect transistor (SGNWFET) is proposed. The model is derived from the solution of the 1-D cylindrical Poisson equation which includes dopant and mobile charges, by using the Pao-Sah gradual channel approximation and the full-depletion approximation. The proposed model captures the phenomenon of the bulk conduction mechanism in all regions of device operation (subthreshold, linear, and saturation regions). It has been shown that the continuous model is in complete agreement with the numerical simulations.

• JSTS:Journal of Semiconductor Technology and Science
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• 제7권2호
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• pp.82-87
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• 2007

The electrical properties of metallic junction diodes and metallic source/drain (S/D) Schottky barrier metal-oxide-semiconductor field-effect transistor (SB-MOSFET) were simulated. By using the abrupt metallic junction at the S/D region, the short-channel effects in nano-scaled MOSFET devices can be effectively suppressed. Particularly, the effects of trap states at the metal-silicide/silicon interface of S/D junction were simulated by taking into account the tail distributions and the Gaussian distributions at the silicon band edge and at the silicon midgap, respectively. As a result of device simulation, the reduction of interfacial trap states with Gaussian distribution is more important than that of interfacial trap states with tail distribution for improving the metallic junction diodes and SB-MOSFET. It is that a forming gas annealing after silicide formation significantly improved the electrical properties of metallic junction devices.

• ETRI Journal
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• 제20권2호
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• pp.241-249
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• 1998

The structure and electrical characteristics of metal-ferroelectric-semiconductor FET(MFSFET) for a single transistor memory are presented. The MFSFET was comprised of polysilicon islands as source/drain electrodes and $BaMgF_4$ film as a gate dielectric. The polysilicon source and drain were built-up prior to the formation of the ferroelectric film to suppress a degradation of the film due to high thermal cycles. From the MFS capacitor, the remnant polarization and coercive field were measured to be about $0.6{\mu}C/cm^2$ and 100 kV/cm, respectively. The fabricated MFSFETs also showed good hysteretic I-V curves, while the current levels disperse probably due to film cracking or bad adhesion between the film and the Al electrode.

• Transactions on Electrical and Electronic Materials
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• 제16권4호
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• pp.187-189
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• 2015

A charge-trap flash (CTF) thin film transistor (TFT) memory is proposed at a low-temperature process (≤ 450℃). The memory cell consists of a sputtered oxide-nitride-oxide (ONO) gate dielectric and Schottky barrier (SB) source/drain (S/D) junctions using nickel silicide. These components enable the ultra-low-temperature process to be successfully achieved with the ONO gate stacks that have a substrate temperature of room temperature and S/D junctions that have an annealing temperature of 200℃. The silicidation process was optimized by measuring the electrical characteristics of the Ni-silicided Schottky diodes. As a result, the Ion/Ioff current ratio is about 1.4×10⁵ and the subthreshold swing and field effect mobility are 0.42 V/dec and 14 cm²/V·s at a drain voltage of −1 V, respectively.

• 반도체디스플레이기술학회지
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• 제19권3호
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• pp.82-87
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• 2020

The comprehensive and physics-based compact noise models for advanced CMOS devices were presented. The models incorporate important physical effects in nanoscale MOSFETs, such as the low frequency correlation effect between the drain and the gate, the trap-related phenomena, and QM (quantum mechanical) effects in the inversion layer. The drain current noise model was improved by including the tunneling assisted-thermally activated process, the realistic trap distribution, the parasitic resistance, and mobility degradation. The expression of correlation coefficient was analytically described, enabling the overall noise performance to be evaluated. With the consideration of QM effects, the comprehensive low frequency noise performance was simulated over the entire bias range.