• Title/Summary/Keyword: Channel Length

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The Change of Flow depending upon the Discharge and Approaching Angle at Channel Junctions (합류부의 유량 및 접근각도에 따른 흐름변화)

  • Choi, Gye-Woon;Park, Young-Suop;Han, Man-Shin
    • Journal of Korea Water Resources Association
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    • v.37 no.8
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    • pp.623-630
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    • 2004
  • In this paper, the hydraulic model tests are conducted for the hydraulic characteristics at channel junctions. The experiments are examined through the variation of approaching angle, discharge in the upstream main channel and the discharge ratio between the main channel and the tributary. The experiments are conducted in the channel model having the length of 450cm, the widths of 40cm and 32cm. Four water tanks and pumps are installed in the experimental channel. The length of stagnation zone is increased by Increasing of approaching angle and the discharge in the upstream channel. The length of stagnation increase with the discharge ratio between the main channel and the tributary. However, the variation of the stagnation zone near the channel junctions is little at the same approaching angles and the discharge ratioes between the main channel and tributary. However, the variation of the stagnation zone near the channel junctions is little at the same approaching angles and the discharge ratioes between the main channel and tributary. Accelerating zone of the velocity is occurred in the middle of the channel in the small approaching angle. However, the influence zone of the accelerating velocity is increased by increasing the approaching angle.

Analytical Modeling for Short-Channel MOSFET I-V Characteristice Using a Linearly-Graded Depletion Edge Approximation (공핍층 폭의 선형 변화를 가정한 단채널 MOSFET I-V 특성의 해석적 모형화)

  • 심재훈;임행삼;박봉임;여정하
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.4
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    • pp.77-85
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    • 1999
  • By assuming a linearly graded depletion edge approximation in the intrinsic MOS region and by taking into account the mobility variation dependent on both lateral and vertical fields, a physics-based analytical model for a short-channel(n-channel) MOSFET is suggested. Derived expressions for the threshold voltage and the drain current of typical MOSFET is structures could be used in a unified manner for all operating range. The threshold voltage was calculated by changing following variables : channel length, drain-source voltage, source-substrate voltage, p-substrate doping level, and oxide thickness. It is shown that the threshold voltage decreases almost exponentially as the channel length decreases. In addition, the short-channel threshold voltage roll-off, the channel length modulation and the electron mobility degradation can be derived within a satisfactory accuracy.

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Evanescent-Mode Analysis of Short-Channel Effects in MOSFETs (Evanescent-Mode를 이용한 MOSFET의 단채널 효과 분석)

  • 이지영;신형순
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.10
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    • pp.24-31
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    • 2003
  • Short channel effects (SCE) of bulk MOSFET with super-steep retrograded channels (SSR), fully-depleted SOI, and double-gate MOSFET have been analyzed using a evanescent-mode analysis. Analytical equations of the characteristics scaling-length (λ) for three structures have been derived and the accuracy of the calculated λ was verified by comparing to the device simulation result. It is found that the minimum channel length should be larger than 5λ and the depletion thickness of the SSR should be around 30 nm in order to be applicable to 70 nm CMOS technology. High-$textsc{k}$ dielectric shows a limitation in scaling due to the drain-field penetration through the dielectric unless the equivalent SiO2 thickness is very thin.

Comparative Analysis of Channel Length Dependence of NBTI and CHC Characteristics in PMOSFETs (PMOSFET의 채널 길이에 따른 NBTI 스트레스와 CHC 스트레스의 신뢰성 특성 비교 분석)

  • Yu, Jae-Nam;Kwon, Sung-Kyu;Shin, Jong-Kwan;Oh, Sun-Ho;Lee, Ho-Ryung;Jang, Sung-Yong;Song, Hyung-Sub;Lee, Ga-Won;Lee, Hi-Deok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.7
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    • pp.438-442
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    • 2014
  • Channel length dependence of NBTI (negative bias temperature instablilty) and CHC (channel hot carrier) characteristics in PMOSFET is studied. It has been considered that HC lifetime of PMOSFET is larger than NBTI lifetime. However, it is shown that CHC degradation is greater than NBTI degradation for PMOSFET with short channel length. 1/f noise and charge pumping measurement are used for analysis of these degradations.

Analysis of hydrogenation effects on Low temperature Poly-Si Thin Film Transistor (저온에서 제작된 다결정 실리콘 박막 트랜지스터의 수소화 효과에 대한 분석)

  • Choi, K.Y.;Kim, Y.S.;Lee, S.K.;Lee, M.C.;Han, M.K.
    • Proceedings of the KIEE Conference
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    • 1993.07b
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    • pp.1289-1291
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    • 1993
  • The hydrogenation effects on characteristics of polycrystalline silicon thin film transistors(poly-Si TFT's) of which the channel length varies from $2.5{\mu}m\;to\;20{\mu}m$ and poly-Si layer thickness is 50, 100, and 150 nm was investigated. After 1 hr hydrogenation annealing by PECVD, the threshold voltage shift decreased dependent on the channel length, but channel width may not alter the threshold voltage shift. In addition to channel length, the active poly-Si layer thickness may be an important parameter on hydrogenation effects, while gate poly-Si thickness may do not influence on the characteristics of TFT's. Considering our experimental results, we propose that channel length and active poly-Si layer thickness may be a key parameters of hydrogenation of poly-Si TFT's.

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Analysis of Subthreshold Swing for Channel Length of Asymmetric Double Gate MOSFET (채널길이에 대한 비대칭 이중게이트 MOSFET의 문턱전압이하 스윙 분석)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.19 no.2
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    • pp.401-406
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    • 2015
  • The change of subthreshold swing for channel length of asymmetric double gate(DG) MOSFET has been analyzed. The subthreshold swing is the important factor to determine digital chracteristics of transistor and is degraded with reduction of channel. The subthreshold swing for channel length of the DGMOSFET developed to solve this problem is investigated for channel thickness, oxide thickness, top and bottom gate voltage and doping concentration. Especially the subthreshold swing for asymmetric DGMOSFET to be able to be fabricated with different top and bottom gate structure is investigated in detail for bottom gate voltage and bottom oxide thickness. To obtain the analytical subthreshold swing, the analytical potential distribution is derived from Possion's equation, and Gaussian distribution function is used as doping profile. As a result, subthreshold swing is sensitively changed according to top and bottom gate voltage, channel doping concentration and channel dimension.

Design of DGMOSFET for Optimum Subthreshold Characteristics using MicroTec

  • Jung, Hak-Kee;Han, Ji-Hyeong
    • Journal of information and communication convergence engineering
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    • v.8 no.4
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    • pp.449-452
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    • 2010
  • We have analyzed channel doping and dimensions(channel length, width and thickness) for the optimum subthreshold characteristics of DG(Double Gate) MOSFET based on the model of MicroTec 4.0. Since the DGMOSFET is the candidate device to shrink short channel effects, the determination of design rule for DGMOSFET is very important to develop sub-100nm devices for high speed and low power consumption. As device size scaled down, the controllability of dimensions and oxide thickness is very low. We have analyzed the short channel effects for the variation of channel dimensions, and found the design conditions of DGMOSFET having the optimum subthreshold characteristics for digital applications.

Effect of Channel Length Variation on Memory Window Characteristics of single-gated feedback field-effect transistors (채널 길이의 변화에 따른 단일 게이트 피드백 전계효과 트랜지스터의 메모리 윈도우 특성)

  • Cho, Jinsun;Kim, Minsuk;Woo, Sola;Kang, Hyungu;Kim, Sangsig
    • Journal of IKEEE
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    • v.21 no.3
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    • pp.284-287
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    • 2017
  • In this study, we examined the simulated electrical characteristics of single-gated feedback field effect transistors (FBFETs) and the influence of channel length variation of the memory window characteristics through the 3D device simulation. The simulations were carried out for various channel lengths from 50 nm to 100 nm. The FBFETs exhibited zero SS(< 1 mV/dec) and a current $I_{on}/I_{off}$ ratio${\sim}1.27{\times}10^{10}$. In addition, the memory windows were 0.31 V for 50 nm-channel-length devices while no memory windows were observed for 100 nm-channel-length devices.

Effect of Channel Length in LDMOSFET on the Switching Characteristic of CMOS Inverter

  • Cui, Zhi-Yuan;Kim, Nam-Soo;Lee, Hyung-Gyoo;Kim, Kyoung-Won
    • Transactions on Electrical and Electronic Materials
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    • v.8 no.1
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    • pp.21-25
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    • 2007
  • A two-dimensional TCAD MEDICI simulator was used to examine the voltage transfer characteristics, on-off switching properties and latch-up of a CMOS inverter as a function of the n-channel length and doping levels. The channel in a LDMOSFET encloses a junction-type source and is believed to be an important parameter for determining the circuit operation of a CMOS inverter. The digital logic levels of the output and input voltages were analyzed from the transfer curves and circuit operation. The high and low logic levels of the input voltage showed a strong dependency on the channel length, while the lateral substrate resistance from a latch-up path in the CMOS inverter was comparable to that of a typical CMOS inverter with a guard ring.

Design and Fabrication of a Microflow Rate Controller for Medical Injection (주사용 미세유량 조절기 설계와 제작)

  • Kim, Byoung-Jae;Lee, Sang-Bin;Shin, Bo-Sung;Sung, Hyung-Jin
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.28 no.2
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    • pp.154-159
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    • 2004
  • A new microflow rate controller for medical injection was developed and evaluated. The flow rate was controlled by changing the friction depth as well as the friction length of the micro-channel. A precise micro-fabrication of the micro-channel was requested for an accurate flow control. The friction depth was inversely proportional to the friction length, which gives a linear flow control to the channel length. The channel groove was fabricated with a plastic material. A rubber containing silicone oil was covered over the groove, which satisfies both lubrication and leakage prevention. The flow controller was validated by performing the numerical simulation and experiment. A good agreement was shown between computation and experiment.