• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.05a
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• pp.147-147
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• 2004

폴리메틸메타크릴레이트(polymethylmethacrylate, PMMA)는 아크릴레이트계 고분자이자 열가소성 플라스틱으로써 LCD용 도광판, 콘택트렌즈, 치과용 레진, DVD 디스크용 소재, 나노임프린트용 피가공재, 나노리소그래피 공정용 레지스트 등 많은 분야에서 활발히 사용되고 있다. PMMA 와 같은 점소성 점탄성 소재의 기계적 성질 측정 및 가공을 위해서는, 응력완화 (stress relaxation), 크립 (creep)등과 같은 시간의존적 변형거동에 대한 연구가 선행되어야 한다.(중략)

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2008.11a
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• pp.141-142
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• 2008

실리콘 기반 태양전지의 보호를 위한 목적으로 사용되는 유리 기판에 나노임프린트 기술을 적용하여, sub-micron급 모스아이 패턴을 형성하였다. 형성된 모스아이 패턴은 250nm의 주기와 약 100nm의 높이를 갖는 원뿔 모양의 배열로써, 투과도의 향상을 확인 할 수 있었다. 또한 그 효과를 높이기 위한 방법으로 양면에 패턴을 형성하였으며, 그 결과 예상과 같이 더 높은 효율의 반사 방지 및 투과 특성이 관찰되었다.

• Korean Journal of Optics and Photonics
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• v.17 no.4
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• pp.317-322
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• 2006

A polymeric arrayed waveguide grating (AWG) has been proposed and demonstrated by exploiting the nanoimprint method. A PDMS(polydimethylsiloxane) stamp with device patterns engraved was developed out of a master mold made of quartz glass. The device was fabricated by transferring the pattern in the PDMS stamp to a spin-coated polymer film without using any etching process. The device had 8 output channels, while the center wavelengths of each output channel were positioned from 1543.7 nm to 1548.3 nm with the spacing of 0.8 nm. The achieved average channel crosstalk and the 3-dB bandwidth were about 10 dB and 0.8 nm respectively.

• Journal of computational fluids engineering
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• v.21 no.2
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• pp.90-98
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• 2016

A numerical study is conducted on thermal performance of a large-area hot plate specially designed as a heating and cooling tool for thermal nanoimprint lithography process. The hot plate has a dimension of $240mm{\times}240mm{\times}20mm$, in which a series of cartridge heaters and cooling holes are installed. The material is stainless steel selected for enduring the high molding pressure. A numerical model based on the ANSYS Fluent is employed to predict the thermal behavior of the hot plate both in heating and cooling phases. The PID thermal control of the device is modeled by adding user defined functions. The results of numerical computation demonstrate that the use of cartridge heaters provides sufficient heat-up performance and the active liquid cooling in the cooling holes provides the required cool-down performance. However, a crucial technical issue is raised that the proposed design poses a large temperature non-uniformity in the steady heating phase and in the transient cooling phase. As a remedy, a new hot plate in which heat pipes are installed in the cooling holes is considered. The numerical results show that the installation of heat pipes could enhance the temperature uniformity both in the heating and cooling phases.

• Journal of the Korean Vacuum Society
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• v.14 no.1
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• pp.35-39
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• 2005

In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV-light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 - 100nm features of the EPS with 3m channels were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.

• Polymer(Korea)
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• v.38 no.3
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• pp.358-363
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• 2014

Adhesion forces between acrylate imprinting resin and a surface treated atomic force microscope (AFM) tip were investigated. Compared to the untreated silicon tip, 38% of the adhesion force is reduced for the hydrophobic tip treated with $CH_4$ plasma whereas 1.6 time increases is found for the hydrophilic tip with $O_2$ plasma treatment. Such a measurement of the adhesion force using AFM provides very quantitative results on adhesion comparing to the crosscut adhesion test which gives qualitative results. Since the adhesion area becomes larger as the imprinting pattern size gets smaller, the surface treatment issue becomes more important in the nano-imprinting process.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.35 no.9
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• pp.1015-1020
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• 2011

Nanoimprint lithography has been actively investigated. This method can replicate a nanopatterned master stamp onto a thin polymer film on a silicon substrate and so on. In this study, a square-shaped hollow piezoelectric actuator is presented, which is newly developed. This actuator is used for driving a nanoscale stamp in nanoimprint lithography instead of a conventional electric motor. The fabricated prototype actuator has 95 layers and side lengths of 23 mm and 18 mm for the outer and inner squares, respectively. By adopting a novel process instead of the conventional forming process for fabricating a one-layer actuator, the one-layer is composed of four rectangular segments produced by sawing a ceramic film with a thickness of 0.3 mm. The basic characteristics on displacement and generation force of the fabricated prototype actuator are experimentally investigated. Furthermore, the displacement characteristics obtained by using a PI controller are tested and discussed.

• Tribology and Lubricants
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• v.24 no.5
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• pp.255-263
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• 2008

Adhesion tests were conducted to investigate the adhesion characteristics between mold and thermoplastic polymer film. Coating of anti-sticking layer (ASL), a kind of polymer material, imprint pressure, and separation velocity were considered as the process conditions. A piece of fused silica without patterns on its surface was used as a mold and the thermoplastic polymer films were made on Si substrate by spin-coating the commercial polymer solution such as mr-I PMMA and mr-I 7020. The ASL was derived from (1H, 1H, 2H, 2H - perfluorooctyl) trichlorosilane($F_{13}$-OTS) and coated on the fused silica mold in vapor phase. The pull-off force was measured in various process conditions and the surfaces of the mold and the polymer film were observed after separation. It was found that the adhesion characteristics between the mold and the thermoplastic polymer film and the release performance of ASL were changed according to the process conditions. The ASL was effective to reduce the pull-off force and the damage of polymer film. In cases of the mold coated with ASL, the pull-off force did not depend on imprint pressure and separation velocity.

• Journal of the Microelectronics and Packaging Society
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• v.27 no.4
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• pp.113-117
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• 2020

In this paper, We investigated the effect of heat treatment process using photo-thermal effect in order to improve mechanical properties of nanostructure on polymer films made by nanoimprint process with hybrid resin. Nanostructures which have a low refractive characteristic were fabricated by UV nanoimprint and after that heat treatment was performed using IPL (intense pulsed light) under process condition of 550 V voltage, pulse width 5 ms, frequency 0.5 Hz. The transmittance and mechanical property of fabricated nanostructure films were evaluated to observe changes in the pattern transfer rate and mechanical properties of nanostructures. The transmittance of the nanostructure was measured at 97.6% at 550 nm wavelength. Nanoindentation was performed to identify improved anti-scatch properties. Result was compared by the heat source. In case of post treatment with IPL, hardness was 0.51 GPa and in the case of hotplate was 0.27 GPa, resulting the increase of hardness of 1.8 times. Elastic modulus of IPL treated sample was 5.9GPa and Hotplate treated one was 4GPa, showing the 1.4 time increase.

• Journal of Institute of Control, Robotics and Systems
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• v.10 no.7
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• pp.604-610
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of transferred nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a $5\times5\times0.09$ in. quartz stamp whose critical dimension is 377 nm was fabricated using the etching process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply the fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer. Experiments have shown that the multi-dispensing method can enable UV-NIL using a large-area stamp.