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The effect of wafer deformation on UV-nanoimprint lithography using an EPS(elementwise patterned stamp)  

Sim Young-suk (Dept. of intelligent precision machine, Korea Institute of Machinery & Materials)
Jeong Jun-ho (Dept. of intelligent precision machine, Korea Institute of Machinery & Materials)
Sohn Hyonkee (Dept. of advanced industrial technology, Korea Institute of Machinery & Materials)
Lee Eung-sug (Dept. of intelligent precision machine, Korea Institute of Machinery & Materials)
Fang Lingmei (Dept. of Mechanical Engineering, Mokpo National University)
Lee Sang-chan (Dept. of Mechanical Engineering, Mokpo National University)
Publication Information
Journal of the Korean Vacuum Society / v.14, no.1, 2005 , pp. 35-39 More about this Journal
Abstract
In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV-light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 - 100nm features of the EPS with 3m channels were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.
Keywords
Ultraviolet-Nanoimprint Lithography; UV-NIL; Elementwise Patterned Stamp(EPS);
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