Browse > Article
http://dx.doi.org/10.5302/J.ICROS.2004.10.7.604

UV nanoimprint lithography using a multi-dispensing method  

심영석 (한국기계연구원 나노메카니즘그룹)
손현기 (한국기계연구원 레이저응용시스템그)
신영재 (한국기계연구원 나노메카니즘그)
이응숙 (한국기계연구원 지능형정밀기계연구)
정준호 (한국기계연구원 나노메카니즘그룹)
Publication Information
Journal of Institute of Control, Robotics and Systems / v.10, no.7, 2004 , pp. 604-610 More about this Journal
Abstract
Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of transferred nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a $5\times5\times0.09$ in. quartz stamp whose critical dimension is 377 nm was fabricated using the etching process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply the fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer. Experiments have shown that the multi-dispensing method can enable UV-NIL using a large-area stamp.
Keywords
UV-nanoimprint lithography; nanostamp; nanofabrication; quartz stamp;
Citations & Related Records
연도 인용수 순위
  • Reference
1 S. Y. Chou, P. R. Krauss, and P. J. Renstrom, 'Nanoimprint lithography,' J. Vac. Sci. Technol. B vol. 14(6), pp. 4129-4133, 1996   DOI   ScienceOn
2 M. Colburn, S. Johnson, M. Stewart, S. Damlse, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S.V. Sreenivasan, J. Ekerdt, and C.G. Wilson, 'Step and flash imprint lithography: A new approach to high-resolution pattering,' Proc. SPIE, vol. 3676, pp. 379-389, 1999   DOI
3 M. Bender, M. Otto, B. Hadam, B. Spangenberg, and H. Kurz 'Multiple imprinting in UV-based nanoimprint lithography related material issues,' Microelectronics Eng., vol. 61-62, pp. 407-413, 2001   DOI   ScienceOn
4 J. Taniguchi, T. Kawasaki, Y. Tokano, Y. Kogo, I. Miyamoto, M. Komuro, H. Hiroshima, N. Sakai, and K. Tada, 'Measurement of adhesive force between mold and photocurable resin n imprint technology,' Jpn. J. Appl. Phys. vol. 41, pp. 4194-4197, 2002   DOI
5 J. Haisma, M. Verheijen, and K. Heuvel 'Mold-assisted nanolithography: A process for reliable pattern replication,' J. Vac. Sci. Technol. B, vol. 14(6), pp. 4124-4128, 1996   DOI   ScienceOn
6 H. Hiroshima, S. Inoue, N. Kasahara, J. Taniguchi, I. Miyamotl, and M. Komuro, 'Uniformity in patterns imprinted using photo-curable liquid polymer,' Jpn. J. Appl. Phys. vol. 41, pp. 4173-4177, 2002   DOI
7 S.V. Sreenivasan, 'Nanoimprint lithography using UV curable liquids,' in ASME international Conference on Integrated Nanosystems, Berkeley, CA, September 18-20. 2002
8 H. Otto, M. Bender, B. Hadam, F. Richter, B. Spangenberg, and H. Kurz, 'Step and reapeat UV-Nanoimprint Lithography: Material Issues,' in the First Conference on Nanoimprint and Nanoplrit Technology, San Francisco, CA, December 11-13, 2002
9 T. C. Bailey, D. J. Resnick, D. Mancini, K. J. Nordquist, W. J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J. H. Baker, B. J. Choi, S. Johnson, M. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, and C. G. willson, 'Template fabrication schemes for step and flash imprint lithography,' Microelectronics Eng., vol. 61-62, pp. 461-467, 2002   DOI   ScienceOn