0.15(B $a_{0.95}$ S $r_{0.05}$)O-0.15(S $m_{2(1-x}$/N $d_{2x}$) $O_{3}$-0.7Ti $O_{2}$(x=0-10[m/o]) ceramics were fabricated by mixed oxide method. Microwave dielectric properties were investigated with contents of N $d_{2}$ $O_{3}$. In the case of specimen with N $d_{2}$ $O_{3}$(6[m/o]), dielectric constant, quality factor and temperature coefficient of resonant frequency were 78.14, 2938(at 3[GHz]) and +14.19[ppm/.deg. C], respectively. By comparison its properties with undoped specimen, dielectric constant and quality factor were highly improved, but the temperature coefficient of resonant frequency was increased to positive value......

Structural and optical characteristics in Se thin film fabricated by EBE method had been studied. Se thin film was deposited with noncrystalline until substrate temperature of >$100^{\circ}C$ Color of its surface had red genealogy, and its optical energy band gap was about 2.45 eV. But Se film was grown with monoclinic at substrate temperature of over >$150^{\circ}C$ Also, color of its surface had gray genealogy, and its optical energy band gap was about 2.31 eV. Finally, after heat-treatment at >$150^{\circ}C$ for 15 min with substrate temperature of >$100^{\circ}C$ noncrystalline Se was proved to be hexagonal, and color of its surface had dark gray genealogy, and its optical energy band gap was about 2.06 eV. From the results, it was known that Se thin film for photoelectric device with the lowest optical energy band gap was accepted from hexagonal structure.

Maxwell-Displacement-Current(MDC) measuring technique has been applied to the study of monolayers of Dilauroylphosphatidylcholine (L-.alpha.-DLPC) and Dimyristoylphosphatidylcholine (L-.alpha.-DMPC). The displacement current was generated from monolayers on a water surface by monolayer compression. Displacement current was generated when the area per molecule was about 250.angs.$^{2}$, 280.angs.$^{2}$. Displacement current was generated in the gas state, gas/liquid state, and liquid state in the course of monolayer compression. The orientational change of molecules in monolayers was discussed on the basis of the MDCs obtained. Finally, we measured differential thermal analysis of sample.

Automobile Fuel Shortage Detecting Sensor, in this paper, was fabricated by using heat dissipation coefficient difference between gasoline and air condition the NTC thermistor of Mn-Ni Co system with the composition ratio of Mn$_{3}$O$_{4}$ : 9wt%, NiO : 28wt%, and CO$_{3}$O$_{4}$ : 61wt%. The condition of sensor operation is that, for turn-on characteristics, the time of arriving at 135mA must be less than 180 second when the DC voltage of 11V is applied in the air condition of -10.deg. C and that, for turn-off characteristics, the saturation current must be less than 60mA when the DC voltage of 15V is applied in the gasoline condition of 60.deg. C. It is known, from the experimental results, that the resistance range and B-constant for the Automobile Fuel Shortage Detecting Sensor with dimension of 5*3*0.9mm were 850-1150.ohm. and 1150-1250.deg. C, respectively and the resistance range and B-constant were agree with that of sensor operation condition. When Bi$_{2}$O$_{3}$ of 0-0.5wt% was added to Mn$_{3}$O$_{4}$ : 9wt%, NiO : 28wt%, and CO$_{3}$O$_{4}$ : 61wt% composition, the resistivity and B-value were 380-430(.ohm.-cm) and 1930 - 2030, respectively. Particularly, for Bi$_{3}$O$_{3}$ of 0.25-0.5wt%, the sintering density of over 90% and the operation characteristics necessary to Automobile Fuel Shortage Detecting Sensor were obtained. The difference of heat dissipation coefficient gasoline and air condition was 15 times.

The double insulating layer consisting of anodic oxide and ZnS was formed for HgCdTe metal insulator semiconductor(MIS) structure. ZnS was evaporated on the anodic oxide grown in H$_{2}$O$_{2}$ electrolyte. Recently, this insulating mechanism for HgCdTe MIS has been deeply studied for improving HgCdTe surface passivation. It was found through TEM observation that an interface layer is formed between ZnS and anodic oxide layers for the first time in the study of this area. EDS analysis of chemical compositions using by electron beam of 20.angs. in diameter and XPS depth composition profile indicated strongly that the new interface is composed of ZnO. Also TEM high resolution image showed that the structure of oxide layer has been changed from the amorphous state to the microsrystalline structure of 100.angs. in diameter after the evaporation of ZnS. The double insulating layer with the resistivity of 10$^{10}$ .ohm.cm was estimated to be proper insulating layer of HgCdTe MIS device. The optical reflectance of about 7% in the region of 5.mu.m showed anti-reflection effect of the insulating layer. The measured C-V curve showed the large shoft of flat band voltage due to the high density of fixed oxide charges about 1.2*10$^{12}$ /cm$^{2}$. The oxygen vacancies and possible cationic state of Zn in the anodic oxide layer are estimated to cause this high density of fixed oxide charges.

Fiber-textured diamond films have been deposited on scratched silicon(100) substrate by micro wave .plasma enhanced chemical vapor deposition at the condition of micro wave power : 950 W, pressure : 60 torr, H$_{2}$ gas flow rate : 50 sccm, CH$_{4}$ gas flow rate : 1.5 sccm, substrate temperature : about 900.deg. C and deposition time : 20 hours. The films were characterized by mean of scanning electron microscopy, Raman spectroscopy and X-ray analysis.

The multi-dielectric layer SiO$_{2}$/Si$_{3}$N$_{4}$/SiO$_{2}$(ONO) is used to improve electrical capacitance and to scale down the memory device. In this paper, improvement of the capacitance by reducing the bottom oxide thickness in the nitride deposition with load lock(L/L) vacuum system is studied. Bottom oxide thickness under the nitride layer is measured by ellipsometer both in L/L and non-L/L systems. Both results are in the range of 3-10.angs. and 10-15.angs., respectively, independent of the nitride and top oxide thickness. Effective thickness and cell capacitance for SONOS capacitor are in the range of 50-52.angs. and 35-37fF respectively in the case of nitride 70.angs. in L/L vacuum system. Compared with non-L/L system, the bottom oxide thickness in the case of L/L system decreases while cell capacitance increases about 4 fF. The results obtained in this study are also applicable to ONO scaling in the thin bottom oxide region of memory stacked capacitor.

Power transformer have many unsymmetrical structure and electric field is enhanced in that area. Those unsymmetrical area are not covered oftenly by solid insulating material which is used as a framework specially in gas transformer. By that result there is a possibility to decrease the total insulation class of the transformer. So in this study the electrical characteristic of $FC+SF_6$ mixture gas which is used as coolants for large power gas insulated transformer and its effects on electrical characteristics of structural material are investigated. Also breakdown characteristic with the tension of taping and curvature of the coil are studied which could be used as a design factor of large power transformer.

RF마그네트론 스파터링에 의한 $sSnO_2$ 박막을 증착한 결과 작동조건에 따라 표면에서 막손상이 발생하였는데, 이는 target에서 생성된 높은 에너지의 고속입자가 기판에서 직접 충돌로 일어나며, 마그네트론의 자계분포와도 관계된다. 또한 기판의 위치에 따라 박막의 전기적, 구조적 특성이 급격히 변하는데 본 논문은 중심자석의 세기와 RF power, 가스압력, 그리고 기판온도 등의 스파터링 작동조건을 변화시키면서 박막의 비손상을 검토하였고, 물성특성을 평가하였다. 실험결과로 부터 기판의 외축부에서 제작된 박막은 전반적으로 막손상이 없었고, 특히 target의 중심자석을 Cobalt로 설치하고 15 mTorr의 가스압력과 50 W의 RF power로 한 경우 가장 우수한 특성을 가진 박막을 얻을 수 있었다. 추가로 막손상을 방지하고자, 환원형의 masking glass를 target위에 설치하였는데, 고에너지 입자의 직접 충돌을 확실히 차단할 수 있었으며, 비저항율도 target의 부식부위 (erosion)에 대응하는 부분에서 100배 정도로 개선하였다.

In the present work, we have developed the simulator to optimize the process conditions of the AR(antireflection) and HR(high-reflection) coatings for the high power laser diode. The simulator can run on the PC. After making the simple optical model, we establish the Maxwell equations for the model by the operator conversion. By using the Mathematica, we derive a matrix for the multilayer system by applying the equations to the model and optimize the AR and HR coating process conditions by obtaining the reflection rate from the matrix. We also prove the validity of the simulator by comparing the simulation with the characteristics of the laser diode which is AR and HR coated according to the optimized conditions.

This paper deals with an inexpensive, simple and fast Langmuir probe sweeping circuit and its application. This sweeper completes a probe trace in a 1 ms order. Futhermore, the circuit drives a maximum probe voltage of $\pm$30V and has a maximum probe current capability of a few amperes. The plasma parameters are successfully determined using the fast Langmuir probe method.

본 고는 반도체 재료가 갖는 자기효과를 이용하여 자기센서의 종류 및 특성등에 대하여 서술하였다. 반도체 LSI의 응용분야가 확대됨에 따라서 반도체 센서를 이용한 극소형화, 고성능화, 저가격화, 다기능화등이 가능하게 되었다. 이러한 상황에서 반도체를 이용한 홀 소자나 자기저항 소자와 같은 자기센서 등을 주변회로와 일체화시킨 초소형 시스템에 대한 연구가 활발하다. 특히 화합물 반도체는 자기센서에 적합한 물리적인 특성을 갖고 있기 때문에, 자기센서로 효율을 나타내고 있다. 반도체의 미세가공기술의 발전과 LSI제조기술의 발전을 이용하여 센서의 집적화, 저가격화를 가능하게 하였으며, 다른 종류의 반도체 센서들을 자기센서와 함께 하나의 칩위에 장착할 수 있는 응용집적센서(Application-specific Integrated Sensor)가 더욱 중요한 역할을 할 것이다.

본 고에서는 유리 집적광센서의 제작에 적합한 유리재료들의 종류와 특성을 설명하였으며, 이들 유리의 종류에 맞도록 개발되어진 제작기술 중에서 이온교환(Ion exchange)방법과 silica-on-silicon(SOS)방법을 소개하였다. 그리고 이러한 공정기술을 이용하여 제작되어진 유리 집적광센서 중에서 물체의 거리를 측정하기 위한 마이클슨 간섭계(michelson interferometer)와 물질의 농도를 측정하기 위한 화학센서(chemical sensor)들을 소개하였다.