• Journal of the Korean Geotechnical Society
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• v.26 no.6
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• pp.5-19
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• 2010

The purpose of this study is to figure out the effect of pressurized grouting on the pullout resistance and the group effect of the compression ground anchor by performing pilot-scale chamber tests and field tests. The laboratory tests are carried out for 3-types of soils which are abundant in the Korean peninsular. Experimental results showed that the enlargement of anchor diameters estimated from the cavity expansion theory matches reasonable well with that obtained from experiments. Moreover, the required injection time as a function of the coefficient of permeability of each soil type was proposed. A series of in-situ anchor pullout tests were also performed to experimentally figure out the effect of pressurized grouting on the pullout resistance. Experimental results also showed that the effect of the pressurized grouting is more prominent in a softer ground with smaller SPT-N value in all of the following three aspects: increase in anchor diameter; pullout resistance; and surface roughness. The pressurized grouting effect in comparison with gravitational grouting was found to be almost nil if the SPT-N value is more than 50. Based on experimental results, a new equation to estimate the pullout resistance as a function of the SPT-N value was proposed. And based on in-situ group anchor pullout tests results, a new group effect equation was proposed which might be applicable to decomposed residual soils which are abundant in the Korean peninsular.

• Journal of Biomedical Engineering Research
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• v.44 no.6
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• pp.404-413
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• 2023

In this research, we studied the development of a SUS304 microneedle array based on microfabrication technology and the applicability of Parylene-C thin film, a medical polymer material. First of all, four materials commonly used in the field of medical engineering (SUS304, Ti, PMMA, and PEEK) were selected and a 5 ㎛ Parylene-C thin film was deposited. The applicability of Parylene-C coating to each material was confirmed through SEM analysis, contact angle measurement, surface roughness(Ra) measurement, and adhesion test according to ASTM standards for each specimen. Parylene-C thin film was deposited based on chemical vapor deposition (CVD), and a 5 ㎛ Parylene-C deposition process was established through trial and error. Through characteristic experiments to confirm the applicability of Parylene-C, SUS304 material, which is the easiest to apply Parylene-C coating without pretreatment was selected to develop a microneedle array based on CNC micromachining technology. The CNC micromachining process was divided into a total of 5 steps, and a microneedle array consisting of 19 needles with an inner diameter of 200 ㎛, an outer diameter of 400 ㎛, and a height of 1.4 mm was designed and manufactured. Finally, a 5 ㎛ Parylene-C coated microneedle array was developed, which presented future research directions in the field of microneedle-based drug delivery systems.

• Journal of the Korean Vacuum Society
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• v.18 no.2
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• pp.85-91
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• 2009

There has been a rapid progress for flexible polymer-based MEMS(Microelectromechanical Systems) technology. Polycarbonate (PC) and Poly Methyl Methacrylate (PMMA), so-called acrylic, have many advantages for optical, non-toxic and micro-device application. We studied dry etching of PC and PMMA as a function of % gas ratio in the $O_2/SF_6/CH_4$ temary plasma. A photoresist pattern was defined on the polymer samples with a mask using a conventional lithography. Plasma etching was done at 100 W RIE chuck power and 10 sccm total gas flow rate. The etch rates of PMMA were typically 2 times higher than those of PC in the whole experimental range. The result would be related to higher melting point of PC compared to that of PMMA. The highest etch rates of PMMA and PC were found in the $O_2/SF_6$ discharges among $O_2/SF_6$, $O_2/CH_4$ and $SF_6/CH_4$ and $O_2/SF_6/CH_4$ plasma composition (PC: ${\sim}350\;nm/min$ at 5 sccm $O_2/5$ sccm $SF_6$, PMMA: ${\sim}570\;nm/min$ at 2.5 sccm $O_2/7.5$ sccm $SF_6$). PC has smoother surface morphology than PMMA after etching in the $O_2/SF_6/CH_4$ discharges. The surface roughness of PC was in the range of 1.9$\sim$3.88 nm. However, that of PMMA was 17.3$\sim$26.1 nm.

• Journal of the Mineralogical Society of Korea
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• v.17 no.1
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• pp.11-21
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• 2004

Crystallization of CaC $O_3$ from the solutions of various degrees of supersaturation was carried out by a spontaneous precipitation method. The solution was kept at $25^{\circ}C$ and pH 6.9∼8.8. The solution compositions were varied in two ways: (1) The total carbonate, [C $O_3$]$_{Τ}$, to total calcium. [Ca]$_{Τ}$, ratios vary as ; [C $O_3$]$_{Τ}$/[Ca]$_{Τ}$ >1. [C $O_3$]$_{Τ}$/[Ca]$_{Τ}$=1, and [C $O_3$]$_{Τ}$/[Ca]$_{Τ}$<1. (2) The total calcium concentration, [Ca]$_{Τ}$, held at 0.02 mo1/d $m^3$, 0.2 mo1/d $m^3$, and 0.4 mo1/d $m^3$. We found that the CaC $O_3$ phase crystallized from the solutions of [C $O_3$]$_{Τ}$/[Ca]$_{Τ}$ $\geq$ 1 was mostly calcite with less than 1% of vaterite, while the CaC $O_3$ crystals precipitated from low carbonate concentration toward calcium concentration, [C $O_3$]$_{Τ}$/[Ca]$_{Τ}$ < 1, were dominated by vaterite crystals. It appears that the polymorph of CaC $O_3$ precipitate was mainly controlled not by the calcium concentration but by the carbonate concentration during the spontaneous precipitation. Also, we found that the surface roughness of vaterite increased with decreasing carbonate concentration from 0.8 or 0.5 of [C $O_3$]$_{Τ}$/[Ca]$_{Τ}$ ratios and the surface area of vaterite increased from 5.64∼7.34 $\mu\textrm{m}$ to 8.39∼10.3 $\mu\textrm{m}$.

• The Journal of Korean Academy of Prosthodontics
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• v.47 no.1
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• pp.21-28
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• 2009

Purpose: The purpose of this study was to compare the wear characteristics of human enamel opposing 2 heat-pressed ceramics (e.max Press and Empress Esthetic), conventional feldspathic porcelain (Ceramco 3) and type III gold alloy. Material and methods: Intact cusps of extracted premolars were used for enamel specimens. Five disk samples were made for each of two heat-pressed ceramics groups, conventional feldspathic porcelain group and type III gold alloy group. Wear tests were conducted in distilled water using a pin-on-disk tribometer. The amount of enamel wear was determined by weighing the enamel specimens before and after wear tests, and the weight was converted to volumes by average density. The wear tracks were analyzed by scanning electron microscopy and surface profilometer to elucidate the wear characteristics. Results: 1. Ceramco 3 led to the greatest amount of enamel wear followed by Empress Esthetic, e.max Press and type III gold alloy. However, there was no significant difference between Ceramco 3 and Empress Esthetic (P>.05), and there were also no significant differences among Empress Esthetic, e.max Press and type III gold alloy (P>.05). 2. The average surface roughness of e.max Press after wear test was smallest followed by Empress Esthetic and Ceramco 3, but there was no significant difference between Empress Esthetic and Ceramco 3 (P>.05). 3. There were no significant differences among the depth of wear tracks of all the groups (P>.05). The group that showed the largest width of wear track was Ceramco 3 followed by Empress Esthetic, e.max Press and type III gold alloy. However, there was no significant difference between e.max Press and Empress Esthetic (P>.05), and there was also no significant difference between Empress Esthetic and Ceramco 3 (P>.05). Conclusion: Within the limits of this study, heat-pressed ceramics were not more abrasive than conventional feldspathic porcelain.

• Journal of the Korean Vacuum Society
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• v.21 no.6
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• pp.333-341
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• 2012

Indium Tin Oxide (ITO) thin films were prepared by RF magnetron sputtering with different flow rates of $O_2$ gas from 0 to 12 sccm. Electrical and optical properties of these films were characterized and analyzed. ITO deposited on soda lime glass and RF power was 2 kW, frequency was 13.56 MHz, and working pressure was $1.0{\times}10^{-3}$ Torr, Ar gas was fixed at 1,000 sccm. The transmittance was measured at 300~1,100 nm ranges by using Photovoltaic analysis system. Electrical properties were measured by Hall measurement system. ITO thin films surface were measured by Scanning electron microscope. Atomic force microscope surface roughness scan for ITO thin films. ITO thin films secondary electron emission coefficient(${\gamma}$) was measured by ${\gamma}$-Focused ion beam. The resistivity is about $2.4{\times}10^{-4}{\Omega}{\cdot}cm$ and the weighted average transmittance is about 84.93% at 3 sccm oxygen flow rate. Also, we investigated Work-function of ITO thin films by using Auger neutralization mechanism according to secondary electron emission coefficient(${\gamma}$) values. We confirmed secondary electron emission peak at 3 sccm oxygen flow rate.

• Ecology and Resilient Infrastructure
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• v.7 no.4
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• pp.227-237
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• 2020

Microclimatic data were measured, and the human thermal sensation was analyzed at 10 local climate zones based on the major land cover classification to investigate the thermal environment of urban areas during summer nighttime. From the results, the green infrastructure areas (GNIAs) showed an average air temperature of 1.6℃ and up to 2.4℃ lower air temperature than the gray infrastructure areas (GYIAs), and the GNIAs showed an average relative humidity of 9.0% and up to 15.0% higher relative humidity. The wind speed of the GNIAs and GYIAs had minimal difference and showed no significance at all locations, except for the forest location, which had the lowest wind speed owing to the influence of trees. The local winds and the surface roughness, which was determined based on the heights of buildings and trees, appeared to be the main factors that influenced wind speed. At the mean radiant temperature, the forest location showed the maximum value, owing to the influence of trees. Except at the forest location, the GNIAs showed an average decrease of 5.5℃ compared to GYIAs. The main factor that influenced the mean radiant temperature was the sky view factor. In the analysis of the human thermal sensation, the GNIAs showed a "neutral" thermal perception level that was neither hot nor cold, and the GYIAs showed a "slightly warm" level, which was a level higher than those of the GNIAs. The GNIAs showed a 3.2℃ decrease compared to the GYIAs, except at the highest forest location, which indicated a half-level improvement in the human thermal environment.

• Journal of the Korean Vacuum Society
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• v.17 no.1
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• pp.16-22
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• 2008

We studied plasma etching of polycarbonate in $O_2/SF_6$, $O_2/N_2$ and $O_2/CH_4$. A capacitively coupled plasma system was employed for the research. For patterning, we used a photolithography method with UV exposure after coating a photoresist on the polycarbonate. Main variables in the experiment were the mixing ratio of $O_2$ and other gases, and RF chuck power. Especially, we used only a mechanical pump for in order to operate the system. The chamber pressure was fixed at 100 mTorr. All of surface profilometry, atomic force microscopy and scanning electron microscopy were used for characterization of the etched polycarbonate samples. According to the results, $O_2/SF_6$ plasmas gave the higher etch rate of the polycarbonate than pure $O_2$ and $SF_6$ plasmas. For example, with maintaining 100W RF chuck power and 100 mTorr chamber pressure, 20 sccm $O_2$ plasma provided about $0.4{\mu}m$/min of polycarbonate etch rate and 20 sccm $SF_6$ produced only $0.2{\mu}m$/min. However, the mixed plasma of 60 % $O_2$ and 40 % $SF_6$ gas flow rate generated about $0.56{\mu}m$ with even low -DC bias induced compared to that of $O_2$. More addition of $SF_6$ to the mixture reduced etch of polycarbonate. The surface roughness of etched polycarbonate was roughed about 3 times worse measured by atomic force microscopy. However examination with scanning electron microscopy indicated that the surface was comparable to that of photoresist. Increase of RF chuck power raised -DC bias on the chuck and etch rate of polycarbonate almost linearly. The etch selectivity of polycarbonate to photoresist was about 1:1. The meaning of these results was that the simple capacitively coupled plasma system can be used to make a microstructure on polymer with $O_2/SF_6$ plasmas. This result can be applied to plasma processing of other polymers.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.2
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• pp.96-113
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• 1996

It has been found that the misfit dislocations in heavily boron-doped layers originate from wafer edges. Moreover, the propagation of the misfit dislocation into a heavily boron-doped region can be suppressed by placing a surrounding undoped region. Using a surrounding undoped region the disloction-free heavily boron-deoped silicon membranes have been fabricated. The measured surface roughness, fracture strength, and residual tensile stress of the membrane are 20.angs. peak-to-peak, 1.39${\times}$10$^{10}$ and 2.7${\times}$10$^{9}$dyn/cm$^{2}$, while those of the conventional heavily boron-doped silicon membrane with high density of misfit dislocations are 500 peak-to-peak, 8.27${\times}$10$^{9}$ and 9.3${\times}$10$^{8}$dyn/cm$^{2}$ respectively. The differences between these two membranes are due to the misfit dislocations. Young's modulus has been extracted as 1.45${\times}$10$^{12}$dyn/cm$^{2}$ for both membranes. Also, the effective lattice constant of heavily boron-doped silicon, the in-plane lattice constant of the conventional membrane, and the density of misfit dislocation contained in the conventional membrane have been extracted as density of misfit dislocation contained in the conventional membrane have been extracted as density of misfit dislocation contained in the conventional membrane have been extracted as 5.424.angs. 5.426.angs. and 2.3${\times}$10$^{4}$/cm for the average boron concentration of 1.3${\times}$10$^{20}$/cm$^{-23}$ cm$^{3}$/atom. Without any buffer layers, a disloction-free lightly boron-doped epitaxial layer with good crsytalline quality has been directly grown on the dislocation-free heavily boron-doped silicon layer. X-ray diffraction analysis revealed that the epitaxial silicon has good crystallinity, similar to that grown on lightly doped silicon substrate. The leakage current of the n+/p gated diode fabricated in the epitaxial silicon has been measured to be 0.6nA/cm$^{2}$ at the reverse bias of 5V.

• Journal of the Korean Society of Food Science and Nutrition
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• v.37 no.9
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• pp.1136-1141
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• 2008

This study was to investigate antiwrinkle effect of mugwort (Artemisia vulgaris) methanol extract in hairless mouse skin induced by UVB-irradiation. Hairless mouse were topically treated with the basic lotion alone (control), ascorbic acid (AA-0.5%, AA-1.0%, AA-2.0%, and AA-5.0%) and mugwort extract (ME-0.5%, ME-1.0%, ME-2.0%, and ME-5.0%) dissolved in a basic lotion. After topical treatment of 30 minutes, the animals were irradiated with increasing doses of UVB radiation ($60{\sim}100\;mJ/cm^2$) for 4 weeks. In our experimental condition, skin thickness of hairless mouse was significantly decreased ($12.5{\sim}21.4%$) in all ME groups compared with control group. Ra value, that is surface roughness parameter induced by skin wrinkling, was significantly decreased ($23.7{\sim}31.1%$) in ME-1.0%, 2.0% and 5.0% group compared with control group. Furthermore, Rq, Rz and Rt value were significantly decreased to $11.2{\sim}21.2%$, $19.8%{\sim}24.5%$, and $14.2%{\sim}22.7%$, respectively. Wrinkle formation of ascorbic acid treatment group as reference group was inhibited, but its effect was less than ME treatment. Matrix metalloproteinase-1 activity was significantly inhibited ($19.7{\sim}22.6%$) compared with control group and collagen content was significantly increased (about 10%) when compared with control group. These results indicate that ME could protect skin aging and wrinkle formation in hairless mouse from photo-irradiation.