• Title/Summary/Keyword: V.A.K.

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Pilot Scale Production of Poly (3-Hydroxybutyrate-co-3-hydroxy-valerate) by Fed-batch Culture of Recombinant Escherichia coli

  • Park, Jong-il;Lee, Sang-Yup;Kyungsup Shin;Lee, Woo-Gi;Park, Si-Jae;Chang, Ho-Nam;Chang, Yong-Keun
    • Biotechnology and Bioprocess Engineering:BBE
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    • v.7 no.6
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    • pp.371-374
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    • 2002
  • Production of poly(3-hydroxybutyrate-co-3-hydroxyvalerate)[P(3HB/V)], by fed-batch culture of recombinant Escherichia coli harboring a plasmid containing the Alcaligenes latus polyhy-droxyalkanoate (PHA) biosynthesis genes, was examined in two pilot-scale fermentors with air supply only, In a 30 L fermentor having a XLa value of 0.11 S­$^1$, the final P(3HB/V) concentration and the P(3HB/V) content obtained were 29.6 g/L and 70.1 wt%, respectively giving a productivity of 1.37 g P(3HB/V)/L-h. In a 300 L fermentor having a XLa of 0.03 S­$^1$, the P(3HB/V) concentration and the P(3HB/V) content were 20.4 g/L and 69 wt%, respectively giving a productivity of 1.06g P(3HB/V)/L-h. These results suggest that economical production of P(3HB/V) is possible by fed-batch culture of recombinant E. coli in a large-scale fermentor having low KLa value.

Analysis of Insulator Failures Altar Installation of Arcing Horns in 154kV Transmission Lines (154kV 송전선로 Arcing Horn 적용에 따른 애자련 사고분석)

  • Cho, S.B.;Lee, H.K.
    • Proceedings of the KIEE Conference
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    • 1998.07e
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    • pp.1743-1745
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    • 1998
  • Insulators of 154kV T/L have been frequently damaged by fault currents. Arcing horn is a very effective and economic method for protection of insulators from the flashover. We developed arcing horns for 154kV T/L in order to protect insulators from the arc[1]. This paper analyzes the status of insulator failures in 154kV T/L after installation of the arcing horns.

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Design of 2-Ch DC-DC Converter with Wide-Input Voltage Range of 2.9V~5.6 V for Wearable AMOLED Display (2.9V~5.6V의 넓은 입력 전압 범위를 가지는 웨어러블 AMOLED용 2-채널 DC-DC 변환기 설계)

  • Lee, Hui-Jin;Kim, Hak-Yun;Choi, Ho-Yong
    • Journal of IKEEE
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    • v.24 no.3
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    • pp.859-866
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    • 2020
  • This paper proposes a 2-ch DC-DC converter with a wide-input voltage range from 2.9V~5.6V for wearable AMOLED displays. For positive voltage VPOS, a boost converter is designed using an over-charged voltage permissible circuit (OPC) which generates a normal output voltage even if over-input voltage is applied, and a SPWM-PWM dual mode with 3-segmented power transistors to improve efficiency at light load. For negative voltage VNEG, a 0.5x regulated inverting charge pump is designed to increase power efficiency. The proposed DC-DC converter was designed using a 0.18-㎛ BCDMOS process. Simulation results show that the proposed DC-DC converter generates VPOS voltages of 4.6 V and VNEG voltage of -0.6V~-2.3V for input voltage of 2.9V to 5.6V. In addition, it has power efficiency of 49%~92%, output ripple voltage has less than 20 mV for load current range of 1 mA~70 mA.

Mapping of Work Function in Self-Assembled V2O5 Nanonet Structures

  • Park, Jeong Woo;Kim, Taekyeong
    • Journal of the Korean Chemical Society
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    • v.61 no.1
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    • pp.12-15
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    • 2017
  • We presented a mapping the work function of the vanadium pentoxide ($V_2O_5$) nanonet structures by scanning Kelvin probe microscopy (SKPM). In this measurement, the $V_2O_5$ nanonet was self-assembled via dropping the solution of $V_2O_5$ nanowires (NWs) onto the $SiO_2$ substrate and drying the solvent, resulting in the networks of $V_2O_5$ NWs. We found that the SKPM signal as a surface potential of $V_2O_5$ nanonet is attributed to the contact potential difference (CPD) between the work functions of the metal tip and the $V_2O_5$ nanonet. We generated the histograms of the CPD signals obtained from the SKPM mapping of the $V_2O_5$ nanonet as well as the highly ordered pyrolytic graphite (HOPG) which is used as a reference for the calibration of the SKPM tip. By using the histogram peaks of the CPD signals, we successfully estimated the work function of ~5.1 eV for the $V_2O_5$ nanonet structures. This work provides a possibility of a nanometer-scale imaging of the work function of the various nanostructures and helps to understand the electrical characteristics of the future electronic devices.

Improvement of Switching Speed of a 600-V Nonpunch-Through Insulated Gate Bipolar Transistor Using Fast Neutron Irradiation

  • Baek, Ha Ni;Sun, Gwang Min;Kim, Ji suck;Hoang, Sy Minh Tuan;Jin, Mi Eun;Ahn, Sung Ho
    • Nuclear Engineering and Technology
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    • v.49 no.1
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    • pp.209-215
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    • 2017
  • Fast neutron irradiation was used to improve the switching speed of a 600-V nonpunch-through insulated gate bipolar transistor. Fast neutron irradiation was carried out at 30-MeV energy in doses of $1{\times}10^8n/cm^2$, $1{\times}10^9n/cm^2$, $1{\times}10^{10}n/cm^2$, and $1{\times}10^{11}n/cm^2$. Electrical characteristics such as current-voltage, forward on-state voltage drop, and switching speed of the device were analyzed and compared with those prior to irradiation. The on-state voltage drop of the initial devices prior to irradiation was 2.08 V, which increased to 2.10 V, 2.20 V, 2.3 V, and 2.4 V, respectively, depending on the irradiation dose. This effect arises because of the lattice defects generated by the fast neutrons. In particular, the turnoff delay time was reduced to 92 nanoseconds, 45% of that prior to irradiation, which means there is a substantial improvement in the switching speed of the device.

NEIGHBORHOOD CONDITION AND FRACTIONAL f-FACTORS IN GRAPHS

  • Liu, Hongxia;Liu, Guizhen
    • Journal of applied mathematics & informatics
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    • v.27 no.5_6
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    • pp.1157-1163
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    • 2009
  • Let G be a graph with vertex set V(G) and let f be a nonnegative integer-valued function defined on V(G). A spanning subgraph F of G is called a fractional f-factor if $d^h_G$(x)=f(x) for all x $\in$ for all x $\in$ V (G), where $d^h_G$ (x) = ${\Sigma}_{e{\in}E_x}$ h(e) is the fractional degree of x $\in$ V(F) with $E_x$ = {e : e = xy $\in$ E|G|}. In this paper it is proved that if ${\delta}(G){\geq}{\frac{b^2(k-1)}{a}},\;n>\frac{(a+b)(k(a+b)-2)}{a}$ and $|N_G(x_1){\cup}N_G(x_2){\cup}{\cdots}{\cup}N_G(x_k)|{\geq}\frac{bn}{a+b}$ for any independent subset ${x_1,x_2,...,x_k}$ of V(G), then G has a fractional f-factor. Where k $\geq$ 2 be a positive integer not larger than the independence number of G, a and b are integers such that 1 $\leq$ a $\leq$ f(x) $\leq$ b for every x $\in$ V(G). Furthermore, we show that the result is best possible in some sense.

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PERFECT IDEALS OF GRADE THREE DEFINED BY SKEW-SYMMETRIZABLE MATRICES

  • Cho, Yong-Sung;Kang, Oh-Jin;Ko, Hyoung-June
    • Bulletin of the Korean Mathematical Society
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    • v.49 no.4
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    • pp.715-736
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    • 2012
  • Brown provided a structure theorem for a class of perfect ideals of grade 3 with type ${\lambda}$ > 0. We introduced a skew-symmetrizable matrix to describe a structure theorem for complete intersections of grade 4 in a Noetherian local ring. We construct a class of perfect ideals I of grade 3 with type 2 defined by a certain skew-symmetrizable matrix. We present the Hilbert function of the standard $k$-algebras R/I, where R is the polynomial ring $R=k[v_0,v_1,{\ldots},v_m]$ over a field $k$ with indeterminates $v_i$ and deg $v_i=1$.

The Design and Fabrication of RESURF type SOI n-LDMOSFET (RESURF type의 SOI n-LDMOSFET 소자 설계 및 제작)

  • Kim, Jae-Seok;Kim, Beom-Ju;Koo, Jin-Gen;Koo, Yong-Seo;An, Chul
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.355-358
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    • 2004
  • In this work, N-LDMOSFET(Lateral Double diffused MOSFET) was designed and fabricated on SOI(Silicon-On-Insulator) substrate, for such applications as motor controllers and high voltage switches, fuel injection controller systems in automobile and SSR(Solid State Rexay)etc. The LDMOSFET was designed to overcome the floating body effects that appear in the conventional thick SOI MOS structure by adding p+ region in source region. Also, RESURF(Reduced SURface Field) structure was proposed in this work in order to reduce a large on-resistance of LDMOSFET when operated keeping high break down voltage. Breakdown voltage was 268v in off-state ($V_{GS}$=OV) at room temperature in $22{\mu}m$ drift length LDMOSFET. When 5V of $V_{GS}$ and 30V of $V_{DS}$ applied, the on resistance(Ron), the transcon ductance($G_m$) and the threshold voltage($V_T$) was 1.76k$\Omega$, 79.7uA/V and 1.85V respectively.

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765kV Substations Earthquake Monitoring System and Preliminary Data Analysis (765kV 변전소 지진계측시스템 구축과 관측자료 예비분석)

  • Park, Dong-Hee;Yun, Kwan-Hee;Seo, Yong-Pyo;Kim, Byung-Chel
    • Proceedings of the Earthquake Engineering Society of Korea Conference
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    • 2006.03a
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    • pp.56-63
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    • 2006
  • Facilities of 76skV Substation(S/S) play an important role in electric power supply grids. Various power facilities of 765kV S/S might be damaged enormously if a strong earthquake occurs. In an effort to mitigate possible earthquake disasters, KEPRI (Korea Electric Power Research Institute) set forth plans to verify seismic safety of the facilities of 765kV S/S. To accomplish the task, an earthquake monitoring systems is constructed at four 765kV S/S sites(Shin-AnSung, Shin-TaeBaek, Shin-SeoSan and Shin-GaPyung). Data from these earthquake monitoring stations are being transmitted via satellite communication. Currently, KEPRI is operating an earthquake monitoring system in freefield of Shin-SeoSan S/S (NSS) tentatively, Also, the data from NSS is preliminarily analyzed using the horizontal to vertical (H/V) spectrum ratio method. The method of H/V spectrum ratio has been used to infer site amplification without previous knowledge of near surface geology. The results of data analysis shorts good S/N ratio and amplification of 20-25 Hz by site effect. In the near future, the accumulated data is expected to provide a basis for assessing and predicting any damages to integrity of 765kV S/S facilities by earthquakes.

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