• 한국재료학회지
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• 제19권12호
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• pp.637-643
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• 2009

In this study, we analyzed the effect of silicon oxynitride matrix on the optical properties of Au nanoparticles dispersed on composite film and explored the effectiveness of the silicon in fine tuning the refractive index of the composite film for applications in optical waveguide devices. The atomic fraction of nitrogen in $SiO_xN_y$ films was controlled by varying the relative flow ratio of nitrogen gas in reactive sputtering and was evaluated optically using an effective medium theory with Bruggeman geometry consisting of a random mixture between $SiO_2$ and $Si_3N_4$. The Au nanoparticles were embedded in the $SiO_xN_y$ matrix by employing the alternating deposition technique and clearly showed an absorption peak due to the excitation of surface plasmon. With increasing nitrogen atomic fraction in the matrix, the surface plasmon resonance wavelength shifted to a longer wavelength (a red-shift) with an enhanced resonance absorption. These characteristics were interpreted using the Maxwell-Garnett effective medium theory. The formation of a guided mode in a slab waveguide consisting of 3 $\mu$m thick Au:$SiO_xN_y$ nanocomposite film was confirmed at the telecommunication wavelength of 1550 nm by prism coupler method and compared with the case of using $SiO_2$ matrix. The use of $SiO_xN_y$ matrix provides an effective way of controlling the mode confinement while maintaining or even enhancing the surface plasmon resonance properties.

• 한국재료학회지
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• 제18권4호
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• pp.204-210
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• 2008

$1.5\;{\mu}m$-thick copper films deposited on silicon wafers were successfully bonded at $415^{\circ}C$/25 kN for 40 minutes in a thermo-compression bonding method that did not involve a pre-cleaning or pre-annealing process. The original copper bonding interface disappeared and showed a homogeneous microstructure with few voids at the original bonding interface. Quantitative interfacial adhesion energies were greater than $10.4\;J/m^2$ as measured via a four-point bending test. Post-bonding annealing at a temperature that was less than $300^{\circ}C$ had only a slight effect on the bonding energy, whereas an oxygen environment significantly deteriorated the bonding energy over $400^{\circ}C$. This was most likely due to the fast growth of brittle interfacial oxides. Therefore, the annealing environment and temperature conditions greatly affect the interfacial bonding energy and reliability in Cu-Cu bonded wafer stacks.

• 한국진공학회지
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• 제20권2호
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• pp.93-99
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• 2011

금속 전극 위에 유기물 채널을 증착하여 만드는 바닥 전극 구조의 유기물 박막 트랜지스터에서 전극 표면이 거친 정도에 따라 전하 주입이 어떻게 달라지는지 조사했다. 금 전극을 실리콘 기판에 증착하고, 가열하여 금 전극 표면을 거칠게 만들었다. 그리고 펜터신과 상부 전극으로 사용할 금 전극을 차례대로 증착하여 금 전극/펜터신/금 전극 구조를 만들었다. 펜터신 증착 초기에는 거친 금 전극 위에서 펜터신 증착핵이 더 많이 보였지만, 막이 두꺼워지면 가열되지 않은 전극과 가열로 거칠어진 전극에서 펜터신 표면 모양에 차이가 거의 없었다. 온도를 바꾸면서 측정한 전류-전압 곡선은 바닥 전극의 표면이 거칠수록 바닥계면의 전위장벽이 높음을 보여주었다. 이 현상은 금속 표면이 거칠수록 일함수가 낮아지며 펜터신과 거친 전극 표면의 경계에 전하 트랩이 더 많기 때문으로 생각된다.

• 한국정보통신학회논문지
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• 제6권5호
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• pp.696-702
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• 2002

RF magnetron reactive sputtering 법으로 BST(Bal-xSrxTiO$_3$)(50/50) 박막을 제작하여, 박막의 결정화 특성 및 표면상태와 함께 박막의 두께에 따른 전기적 특성을 조사하였다. XRD와 AFM을 이용하여 BST 박막의 결정화 특성과 표면상태를 관찰한 결과, 80$0^{\circ}C$ 에서 2분간 후열처리한 박막은 완전한 perovskite 구조를 가지며 표면거칠기도 16.1$\AA$으로 양호한 값을 나타내었다. 박막의 두께가 80nm에서 240nm으로 증가함에 따라 10KHz에서 비유전률은 199에서 265로 증가하였고, 250㎸/cm의 전기장에서 누설 전류밀도는 $0.779 {\mu}m/{cm^2}에서 0.184 {\mu}A/{cm^2}$으로 감소하였다. 두께 240nm인 BST 박막의 경우, 5V에서의 전하축적 밀도와 누설전류밀도는 각각 50.5 $fC/{{\mu}m^2} 와 0.182 {\mu}A/{cm^2}$로, 이는 DRAM의 캐패시터 절연막 응용에 매우 유망한 물질임을 나타내는 결과이다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 제38회 하계학술대회
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• pp.1988-1989
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• 2007

Polyethylene is widely used as the insulator for power cable. To investigate the conduction mechanism for power cable insulation under ac high field, it is very important to acquire the dissipation current under actual running field. Recently, we have developed the unique system, which make possible to observe the nonlinear dissipation current waveform. In this system, to observe the nonlinear properties with high accuracy, capacitive current component is canceled by using inverse capacitive current signal instead of using the bridge circuit for canceling it. We have already reported that the dissipation currents of $40\;{\mu}m$ thick LDPE film at 10 kV/mm and over 140 Hz, it starts to show nonlinearity and odd number's harmonics were getting large. To investigate the conduction mechanis ms in this region, especially space charge effect, various kinds of estimation, such as time variations of instantaneous resistivity for one cycle, FFT spectra of dissipation current waveforms and so on, has been examined. As the results of these estimations, it was found that the dissipation current will depend on not only the instantaneous value of electric field but also the time differential of applied electric field due to taking a balance between applied field and internal field. Furthermore, two large peaks of dissipation current for each half cycle were observed under certain condition. In this paper, to clarify the reason why it shows two peaks for each half cycle, the film thickness dependences of dissipation current waveforms were observed by using the three different thickness LDPE films.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.118-118
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• 2010

현재 반도체 제조 공정 중 많은 비중을 차지하는 식각 및 증착 공정에는 대부분 플라즈마를 사용하고 있으며, 이러한 반도체 장비내의 공정 부분품들은 수율과 생산성을 향상시키기 위하여 내플라즈마 특성이 우수한 세라믹 또는 세라믹 코팅막으로 구성되어 있다. 더욱이 최근에는 미세공정을 위해 고밀도 플라즈마 공정이 요구되면서, 노출된 세라믹 층이 침식되어 파티클이 떨어져 나오거나 모재와 세라믹 막 사이의 박리현상과 같은 심각한 문제들이 발생되고 있다. 따라서 보다 우수한 내플라즈마 특성을 갖는 세라믹 코팅 기술 개발이 시급한 실정이다. 현재 내플라즈마성 세라믹 코팅막 제조를 위한 코팅기술로서는 주로 용사법이 이용되고 있으나 기공률이 높고 치밀하지 못한 등의 문제점으로 인하여 사용수명이 짧다는 한계에 봉착하였다. 이에 본 연구에서는 상온에서 치밀하고 고속으로 세라믹 후막 형성이 가능한 Aerosol Deposition (AD)법과 AD법의 단점인 edge, corner, hole에서 코팅이 잘 안 되는 점을 보완할 수 있는 Arc Plasma Anodizing (APA)법을 조합하여, 상용화된 Al 모재위에 APA법을 사용하여 $Al_2O_3$ 후막 중간층을 형성한 뒤 그 위에 AD법으로 치밀한 $Al_2O_3$ 후막 성막함으로써 내 플라즈마 향상을 위한 새로운 개념의 제조기술개발을 시도하였다. 이를 위해 우선 Al 모재 위에 APA를 사용하여 중간층인 $Al_2O_3$막을 제조하였으며, 중간층의 두께에 따른 특성을 확인한 결과, $Al_2O_3$중간층의 두께가 두꺼워질수록 표면조도가 증가함을 확인 할 수 있었다. AD법으로 $Al_2O_3$중간층 위에 치밀한 $Al_2O_3$막을 제조하는데 있어 중요인자를 확인하기 위해, AD법으로 중간층 위에 $Al_2O_3$막을 제조한 후 성막특성을 관찰하였다. 그 결과, 중간층의 표면조도가 $0.8-1\;{\mu}m$인 경우에는 수 ${\mu}m$의 두께로 성막 되었으나, 표면조도가 $1\;{\mu}m$ 이상인 $Al_2O_3$중간층 위에서는 성막 되지 않았다. 이를 통해 AD법으로 치밀하고 두꺼운 $Al_2O_3$ 후막을 $Al_2O_3$중간층 위에 성막하기 위해서는 표면조도가 중요인자임을 확인하였다.

• 한국재료학회지
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• 제16권10호
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• pp.606-613
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• 2006

This study was purposed to evaluate the influence of anodically oxidized film on titanium (Ti) onto MG-63 osteoblast-like cell attachment and activity. Only scratch lines created by polishing were seen in ASR and ANO-1 groups. About $1.5{\mu}m$-thick homogeneous oxide film which has pores of about $0.5{\mu}m$ diameter were formed in ANO-12. The crystalline structure of the oxide films formed by anodization in phosphoric acid electrolyte was $TiP_2O_7$. The total protein amounts of ANO-1 and ANO-12 groups showed higher values of maximum protein amount than that of AS-R group. At 3 days of incubation, total protein amount showed higher value in ANO-2 when comparing to that of AS-R (p<0.05). Based on the results of ALPase activity test, the degree of MG-63 cell differentiation for initial mineralization matrix formation was similar. For all the test groups after 1 day of incubation, MG-63 cells grew healthily in mono-layer with dendritic extensions. After incubation for 3 days, the specimen surfaces were covered more densely by cells, and numerous micro filaments were extruding to the extracellular matrix.

• 한국재료학회지
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• 제22권7호
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• pp.358-361
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• 2012

Co and Ni as catalysts in $SnO_2$ sensors to improve the sensitivity for $CH_4$ gas and $CH_3CH_2CH_3$ gas were coated by a solution reduction method. $SnO_2$ thick films were prepared by a screen-printing method onto $Al_2O_3$ substrates with an electrode. The sensing characteristics were investigated by measuring the electrical resistance of each sensor in a chamber. The structural properties of $SnO_2$ with a rutile structure investigated by XRD showed a (110) dominant $SnO_2$ peak. The particle size of the $SnO_2$:Ni powders with Ni at 6 wt% was about 0.1 ${\mu}m$. The $SnO_2$ particles were found to contain many pores according to a SEM analysis. The sensitivity of $SnO_2$-based sensors was measured for 5 ppm of $CH_4$ gas and $CH_3CH_2CH_3$ gas at room temperature by comparing the resistance in air to that in the target gases. The results showed that the best sensitivity of $SnO_2$:Ni and $SnO_2$:Co sensors for $CH_4$ gas and $CH_3CH_2CH_3$ gas at room temperature was observed in $SnO_2$:Ni sensors coated with 6 wt% Ni. The $SnO_2$:Ni gas sensors showed good selectivity to $CH_4$ gas. The response time and recovery time of the $SnO_2$:Ni gas sensors for the $CH_4$ and $CH_3CH_2CH_3$ gases were 20 seconds and 9 seconds, respectively.

• 한국산학기술학회논문지
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• 제9권3호
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• pp.615-620
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• 2008

저저항 배선층으로 쓰일 수 있는 선폭 $0.5{\mu}m$, 70nm 높이의 폴리실리콘 패턴에 $10nm-Ni_{1-x}Co_x$(x=0.2, 0.6, and 0.7)의 금속 박막을 열증착법으로 성막하고 쾌속 열처리 (RTA) 온도를 $700^{\circ}C$와 $1000^{\circ}C$로 달리하여 실리사이드화 공정을 실시하여 상부에 니켈코발트 실리사이드를 형성시켰다 이때의 미세구조를 확인하고 FIB (focused ion beam)를 활용하여 저에너지 조건 (30kV-10 pA-2 sec)에서 배선층을 국부적으로 조사하여 실리사이드 층의 선택적 제거 가능성을 확인하였다. 실험 범위내의 실리사이드화 온도 범위와 NiCo 상대 조성 범위에서 주어진 FIB 조건으로 선택적으로 저저항 실리사이드 층의 제거가 가능하였으나, 상대적으로 Co 함유량이 많은 실리사이드는 배선층 내부에서 기포가 발생하였으며, 이러한 기포로 인해 실리사이드 층만의 국부적 제거는 불가능하였다.

• 한국표면공학회지
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• 제47권5호
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• pp.263-268
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• 2014

Nanocrystalline diamond(NCD) coated SiC balls were applied in a ball-on-disk tribometer. After seeding in an ultrasonic bath containing nanometer diamond powders, $2.2{\mu}m$ thick NCD films were deposited on sintered 3 mm diameter SiC balls at $600^{\circ}C$ in a 2.45 GHz microwave plasma CVD system. Bare $ZrO_2$ and SiC balls were prepared for comparison as test balls. Tribology tests were performed in air with pairs of three different balls and mirror polished steel(SKH51) disk. The wear tracks on balls and disks were examined by optical microscope and alpha step profiler. Under the load of 3 N, the friction coefficients of steel against $ZrO_2$, SiC and NCD-coated balls were between 0.4 and 0.8. After a few thousands sliding laps, the friction coefficient of NCD-coated balls dropped from 0.45 to below 0.1 and maintained thereafter. Under a higher load of 10 N or 20 N with a long sliding distance of 2 km, $ZrO_2$ and SiC balls exhibited the similar friction coefficients as above. The friction coefficient of NCD-coated balls was less than 0.1 from the beginning and increased to above 0.1 steadily or with some fluctuations as sliding distance increased. NCD coating layers were found worn out after long duration and/or high load sliding test, which resulted in the friction coefficient higher than 0.1.