• Title/Summary/Keyword: Oxide Semiconductor

Search Result 1,419, Processing Time 0.024 seconds

Equipment Development for Inorganic-Compound Concentration Measurement in a Hydroponic Culture Solution (수경배양액 무기성분농도 측정장치 개발)

  • Heo, Jeong-Wook;Park, Kyeong-Hun;Hong, Seung-Gil;Lee, Jae-Su;Baek, Jeong-Hyun;Park, Jong-Taek;Lee, Seung-Kee
    • Korean Journal of Environmental Agriculture
    • /
    • v.39 no.4
    • /
    • pp.319-326
    • /
    • 2020
  • BACKGROUND: Measurement equipment was developed for inorganic nutrient concentration inside the hydroponic culture medium with several macro- and micro compositions, and applied for measuring the compositions of conventional medium. METHODS AND RESULTS: Before the equipment development, sonicator and heater were utilized to control temperature around of the module mixing with color reagents and target samples among the inorganic compositions. The measurement module and multi-sampler were also manufactured based on the COMS (Complementary Metal-Oxide Semiconductor) and installed inside the measurement equipment. Concentration of standard solution, value measured by the equipment, standard deviation or measured average value were used for estimating the accuracy and average recall of the equipment. Yamazaki solutions with EC of 0.5, 1.5, and 2.5 dS/m were offered to confirm the equipment accuracy and standard error. CONCLUSION: It was suggested that the developed equipment could be automatically applied for measurement with accuracy of over 96% and standard errors of less than 5% on 12 macro- and micro compositions such as a NO3-N, PO43- or Fe.

Characteristics of radiographic images acquired with CdTe, CCD and CMOS detectors in skull radiography

  • Queiroz, Polyane Mazucatto;Santaella, Gustavo Machado;Lopes, Sergio Lucio Pereira de Castro;Haiter-Neto, Francisco;Freitas, Deborah Queiroz
    • Imaging Science in Dentistry
    • /
    • v.50 no.4
    • /
    • pp.339-346
    • /
    • 2020
  • Purpose: The purpose of this study was to evaluate the image quality, diagnostic efficacy, and radiation dose associated with the use of a cadmium telluride (CdTe) detector, compared to charge-coupled device (CCD) and complementary metal oxide semiconductor(CMOS) detectors. Materials and Methods: Lateral cephalographs of a phantom (type 1) composed of synthetic polymer filled with water and another phantom (type 2) composed of human skull macerated with polymer coating were obtained with CdTe, CCD, and CMOS detectors. Dosimeters placed on the type 2 phantom were used to measure radiation. Noise levels from each image were also measured. McNamara cephalometric analysis was conducted, the dentoskeletal configurations were assessed, and a subjective evaluation of image quality was conducted. Parametric data were compared via 1-way analysis of variance with the Tukey post-hoc test, with a significance level of 5%. Subjective image quality and dentoskeletal configuration were described qualitatively. Results: A statistically significant difference was found among the images obtained with the 3 detectors(P<0.05), with the lowest noise level observed among the images obtained with the CdTe detector and a higher subjective preference demonstrated for those images. For the cephalometric analyses, no significant difference (P>0.05) was observed, and perfect agreement was seen with regard to the classifications obtained from the images acquired using the 3 detectors. The radiation dose associated with the CMOS detector was higher than the doses associated with the CCD (P<0.05) and CdTe detectors(P<0.05). Conclusion: Considering the evaluated parameters, the CdTe detector is recommended for use in clinical practice.

Optimization of the Pt Nanoparticle Size and Calcination Temperature for Enhanced Sensing Performance of Pt-Decorated In2O3 Nanorods

  • Choi, Seung-Bok;Lee, Jae Kyung;Lee, Woo Seok;Ko, Tae Gyung;Lee, Chongmu
    • Journal of the Korean Physical Society
    • /
    • v.73 no.10
    • /
    • pp.1444-1451
    • /
    • 2018
  • The surface-to-volume ratio of one-dimensional (1D) semiconductor metal-oxide sensors is an important factor for achieving good gas sensing properties because it offers a wide response area. To exploit this effect, in this study, we determined the optimal calcination temperature to maximize the specific surface area and thereby the sensitivity of the sensor. The $In_2O_3$ nanorods were synthesized by using vapor-liquid-solid growth of $In_2O_3$ powders and were decorated with the Pt nanoparticles by using a sol-gel method. Subsequently, the Pt nanoparticle-decorated $In_2O_3$ nanorods were calcined at different temperatures to determine the optimal calcination temperature. The $NO_2$ gas sensing properties of five different samples (pristine uncalcined $In_2O_3$ nanorods, Pt-decorated uncalcined $In_2O_3$ nanorods, and Pt-decorated $In_2O_3$ nanorods calcined at 400, 600, and $800^{\circ}C$) were determined and compared. The Pt-decorated $In_2O_3$ nanorods calcined at $600^{\circ}C$ showed the highest surface-to-volume ratio and the strongest response to $NO_2$ gas. Moreover, these nanorods showed the shortest response/recovery times toward $NO_2$. These enhanced sensing properties are attributed to a combination of increased surface-to-volume ratio (achieved through the optimal calcination) and increased electrical/chemical sensitization (provided by the noble-metal decoration).

Study on the Structural Stability and Charge Trapping Properties of High-k HfO2 and HFO2/Al2O3/HfO2 Stacks (High-k HfO2와 HfO2/Al2O3/HfO2 적층막의 구조 안정성 및 전하 트랩핑 특성 연구)

  • Ahn, Young-Soo;Huh, Min-Young;Kang, Hae-Yoon;Sohn, Hyunchul
    • Korean Journal of Metals and Materials
    • /
    • v.48 no.3
    • /
    • pp.256-261
    • /
    • 2010
  • In this work, high-k dielectric stacks of $HfO_2$ and $HfO_2$/$Al_2O_3$/$HfO_2$ (HAH) were deposited on $SiO_2/Si$ substrates by atomic layer deposition as charge trapping layers in charge trapping devices. The structural stability and the charge trapping characteristics of such stacks were investigated using Metal-Alumina-Hafnia-Oxide-Silicon (MAHOS) structure. The surface roughness of $HfO_2$ was stable up to 11 nm with the insertion of 0.2 nm thick $Al_2O_3$. The effect of the thickness of the HAH stack and the thickness of intermediate $Al_2O_3$ on charge trapping characteristics were investigated for MAHOS structure under various gate bias pulse with duration of 100 ms. The threshold voltage shift after programming and erase showed that the memory window was increased with increasing bias on gate. However, the programming window was independent of the thickness of HAH charge trapping layers. When the thickness of $Al_2O_3$insertion increased from 0.2 nm to 1 nm, the erase window was decreased without change in the programming window.

Development and Evaluation of a Thimble-Like Head Bolus Shield for Hemi-Body Electron Beam Irradiation Technique

  • Shin, Wook-Geun;Lee, Sung Young;Jin, Hyeongmin;Kim, Jeongho;Kang, Seonghee;Kim, Jung-in;Jung, Seongmoon
    • Journal of Radiation Protection and Research
    • /
    • v.47 no.3
    • /
    • pp.152-157
    • /
    • 2022
  • Background: The hemi-body electron beam irradiation (HBIe-) technique has been proposed for the treatment of mycosis fungoides. It spares healthy skin using an electron shield. However, shielding electrons is complicated owing to electron scattering effects. In this study, we developed a thimble-like head bolus shield that surrounds the patient's entire head to prevent irradiation of the head during HBIe-. Materials and Methods: The feasibility of a thimble-like head bolus shield was evaluated using a simplified Geant4 Monte Carlo (MC) simulation. Subsequently, the head bolus was manufactured using a three-dimensional (3D) printed mold and Ecoflex 00-30 silicone. The fabricated head bolus was experimentally validated by measuring the dose to the Rando phantom using a metal-oxide-semiconductor field-effect transistor (MOSFET) detector with clinical configuration of HBIe-. Results and Discussion: The thimble-like head bolus reduced the electron fluence by 2% compared with that without a shield in the MC simulations. In addition, an improvement in fluence degradation outside the head shield was observed. In the experimental validation using the inhouse-developed bolus shield, this head bolus reduced the electron dose to approximately 2.5% of the prescribed dose. Conclusion: A thimble-like head bolus shield for the HBIe- technique was developed and validated in this study. This bolus effectively spares healthy skin without underdosage in the region of the target skin in HBIe-.

Optimization of SnO2 Based H2 Gas Sensor Along with Thermal Treatment Effect (열처리 효과에 따른 SnO2 기반 수소가스 센서의 특성 최적화)

  • Jung, Dong Geon;Lee, Junyeop;Kwon, Jinbeom;Maeng, Bohee;Kim, Young Sam;Yang, Yi Jun;Jung, Daewoong
    • Journal of Sensor Science and Technology
    • /
    • v.31 no.5
    • /
    • pp.348-352
    • /
    • 2022
  • Hydrogen gas (H2) which is odorless, colorless is attracting attention as a renewable energy source in varions applications but its leakage can lead to disastrous disasters, such as inflammable, explosive, and narcotic disasters at high concentrations. Therefore, it is necessary to develop H2 gas sensor with high performance. In this paper, we confirmed that H2 gas detection ability of SnO2 based H2 gas sensor along with thermal treatment effect of SnO2. Proposed SnO2 based H2 gas sensor is fabricated by MEMS technologies such as photolithgraphy, sputtering and lift-off process, etc. Deposited SnO2 thin films are thermally treated in various thermal treatement temperature in range of 500-900 ℃ and their H2 gas detection ability is estimatied by measuring output current of H2 gas sensor. Based on experimental results, fabricated H2 gas sensor with SnO2 thin film which is thermally treated at 700 ℃ has a superior H2 gas detection ability, and it can be expected to utilize at the practical applications.

Study of Al Doping Effect on HfO2 Dielectric Thin Film Using PEALD (PEALD를 이용한 HfO2 유전박막의 Al 도핑 효과 연구)

  • Min Jung Oh;Ji Na Song;Seul Gi Kang;Bo Joong Kim;Chang-Bun Yoon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.36 no.2
    • /
    • pp.125-128
    • /
    • 2023
  • Recently, as the process of the MOS device becomes more detailed, and the degree of integration thereof increases, many problems such as leakage current due to an increase in electron tunneling due to the thickness of SiO2 used as a gate oxide have occurred. In order to overcome the limitation of SiO2, many studies have been conducted on HfO2 that has a thermodynamic stability with silicon during processing, has a higher dielectric constant than SiO2, and has an appropriate band gap. In this study, HfO2, which is attracting attention in various fields, was doped with Al and the change in properties according to its concentration was studied. Al-doped HfO2 thin film was deposited using Plasma Enhanced Atomic Layer Deposition (PEALD), and the structural and electrical characteristics of the fabricated MIM device were evaluated. The results of this study are expected to make an essential cornerstone in the future field of next-generation semiconductor device materials.

Photocatalytic Membrane for Contaminants Degradation: A Review (오염물질 분해를 위한 광촉매 분리막: 총설)

  • Kahkahni, Rabea;Patel, Rajkumar;Kim, Jong Hak
    • Membrane Journal
    • /
    • v.32 no.1
    • /
    • pp.33-42
    • /
    • 2022
  • Growing industrialization leads to severe water pollution. Organic effluents from pharmaceuticals and textile industries released in wastewater adversely affect the environment and human health. Presence of antibiotics used for antibacterial treatment in wastewater leads to the growth of drug resistance bacteria, which is very harmful for human being. Various small organic molecules are used for the preparation of organic dye molecules in the textile industries. These molecules hardly degrade, which is present in the wastewater effluents from printing and dyeing industries. In order to address these problems, photoactive catalyst is embedded in the membrane and wastewater are passed through it. Through this process, organic molecules are photodegraded and at the same time, the degraded compounds are separated by the membrane. Titanium dioxide (TiO2) is a semiconductor which behave as excellent photocatalyst. Photocatalytic ability is enhanced by the making its composite with other transition metal oxide and incorporated into polymeric membrane. In this review, the degradation of dye and drug molecules by photocatalytic membrane are discussed.

Characteristics of Carbon-Doped Mo Thin Films for the Application in Organic Thin Film Transistor (유기박막트랜지스터 응용을 위한 탄소가 도핑된 몰리브덴 박막의 특성)

  • Dong Hyun Kim;Yong Seob Park
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.36 no.6
    • /
    • pp.588-593
    • /
    • 2023
  • The advantage of OTFT technology is that large-area circuits can be manufactured on flexible substrates using a low-cost solution process such as inkjet printing. Compared to silicon-based inorganic semiconductor processes, the process temperature is lower and the process time is shorter, so it can be widely applied to fields that do not require high electron mobility. Materials that have utility as electrode materials include carbon that can be solution-processed, transparent carbon thin films, and metallic nanoparticles, etc. are being studied. Recently, a technology has been developed to facilitate charge injection by coating the surface of the Al electrode with solution-processable titanium oxide (TiOx), which can greatly improve the performance of OTFT. In order to commercialize OTFT technology, an appropriate method is to use a complementary circuit with excellent reliability and stability. For this, insulators and channel semiconductors using organic materials must have stability in the air. In this study, carbon-doped Mo (MoC) thin films were fabricated with different graphite target power densities via unbalanced magnetron sputtering (UBM). The influence of graphite target power density on the structural, surface area, physical, and electrical properties of MoC films was investigated. MoC thin films deposited by the unbalanced magnetron sputtering method exhibited a smooth and uniform surface. However, as the graphite target power density increased, the rms surface roughness of the MoC film increased, and the hardness and elastic modulus of the MoC thin film increased. Additionally, as the graphite target power density increased, the resistivity value of the MoC film increased. In the performance of an organic thin film transistor using a MoC gate electrode, the carrier mobility, threshold voltage, and drain current on/off ratio (Ion/Ioff) showed 0.15 cm2/V·s, -5.6 V, and 7.5×104, respectively.

Impact of Remanent Polarization and Coercive Field on Threshold Voltage and Drain-Induced Barrier Lowering in NCFET (negative capacitance FET) (NCFET (negative capacitance FET)에서 잔류분극과 항전계가 문턱전압과 드레인 유도장벽 감소에 미치는 영향)

  • Hakkee Jung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.37 no.1
    • /
    • pp.48-55
    • /
    • 2024
  • The changes in threshold voltage and DIBL were investigated for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in NCFET (negative capacitance FET). The threshold voltage and DIBL (drain-induced barrier lowering) were observed for a junctionless double gate MOSFET using a gate oxide structure of MFMIS (metal-ferroelectric-metal-insulator-semiconductor). To obtain the threshold voltage, series-type potential distribution and second derivative method were used. As a result, it can be seen that the threshold voltage increases when Pr decreases and Ec increases, and the threshold voltage is also maintained constant when the Pr/Ec is constant. However, as the drain voltage increases, the threshold voltage changes significantly according to Pr/Ec, so the DIBL greatly changes for Pr/Ec. In other words, when Pr/Ec=15 pF/cm, DIBL showed a negative value regardless of the channel length under the conditions of ferroelectric thickness of 10 nm and SiO2 thickness of 1 nm. The DIBL value was in the negative or positive range for the channel length when the Pr/Ec is 25 pF/cm or more under the same conditions, so the condition of DIBL=0 could be obtained. As such, the optimal condition to reduce short channel effects can be obtained since the threshold voltage and DIBL can be adjusted according to the device dimension of NCFET and the Pr and Ec of ferroelectric.