Study on the Structural Stability and Charge Trapping Properties of High-k HfO2 and HFO2/Al2O3/HfO2 Stacks |
Ahn, Young-Soo
(Research & Development Division, Hynix Semiconductor)
Huh, Min-Young (Department of Materials Science and Engineering, Yonsei University) Kang, Hae-Yoon (Department of Materials Science and Engineering, Yonsei University) Sohn, Hyunchul (Department of Materials Science and Engineering, Yonsei University) |
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