• 제목/요약/키워드: Latch up

검색결과 149건 처리시간 0.028초

래치업 억제를 위한 세그멘트 $N^{+}$ 버퍼층을 갖는 IGBT 구조 (An IGBT structure with segmented $N^{+}$ buffer layer for latch-up suppression)

  • Kim, Doo-Young;Lee, Byeong-Hoon;Park, Yearn-Ik
    • 대한전기학회논문지
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    • 제44권2호
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    • pp.222-227
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    • 1995
  • A new IGBT structure, which may suppress latch-up phenomena considerably, is proposed and verified by MEDICI simulation. The proposed structure employing the segmented $n^{+}$ buffer layer increases latch-up current capability due to suppression of the current flowing through the resistance of $p^{-}$ well, $R_{p}$, which is the main cause of latch-up phenomena without degradation of forward characteristics. The length of the $n^{+}$ buffer layer is investigated by considering the trade-off between the latch-up current capability and the forward voltage drop. The segmented $N^{+}$ buffer layer results in better latch-up immunity in comparison with the uniform buffer layer.

A New SOI LIGBT Structure with Improved Latch-Up Performance

  • Sung, Woong-Je;Lee, Yong-Il;Park, Woo-Beom;Sung, Man-Young
    • Transactions on Electrical and Electronic Materials
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    • 제2권4호
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    • pp.30-32
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    • 2001
  • In this paper, a new silicon-on-insulator (SOI) lateral insulated gate bipolar transistor (LIGBT) is proposed to improve the latch-up performance without current path underneath the n$^{+}$ cathode region. The improvement of latch-up performance is verified using the two- dimensional simulator MEDICI and the simulation results on the latch-up current density are 4468 A/cm2 for the proposed LIGBT and 1343 A/$\textrm{cm}^2$ for the conventional LIGBT. The proposed SOI LIGBT exhibits 3 times larger latch-up capability than the conventional SOI LIGBT.T.

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외부 전기서지에 의한 전자회로기판 Latch-up 현상 고찰 (A Study on PCB's Latch-up Phenomenon by External Electrical Surge)

  • 지영화;조성한;정창규
    • 전기학회논문지
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    • 제59권11호
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    • pp.2089-2092
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    • 2010
  • There are many cases that interrupt the production process because of malfunctions caused by electronic circuit boards which control equipment, but it is difficult to distinctly identify the causes in many cases. Especially, CMOS devices with the control logic circuit return automatically to normal state after their own faults. Therefore it is not easy to analyze the problems with electronic circuit boards. Recently, nuclear power plant experienced a failure due to the malfunction of electronic circuit boards and it was identified that the reason of the malfunction was because of latch-up phenomenon caused by external surge in electronic devices. This paper presents the causes and the phenomenon of latch-up by experiment and also a way using counter EMF diodes, noise filters and surge protective devices to prevent latch-up phenomenon from electronic circuit boards, finally confirms the effectiveness of the result by experiment.

LCD 구동 IC를 위한 Power-Up 순차 스위치를 가진 Latch-Up 방지 기술 (Latch-Up Prevention Method having Power-Up Sequential Switches for LCD Driver ICs)

  • 최병호;공배선;전영현
    • 대한전자공학회논문지SD
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    • 제45권6호
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    • pp.111-118
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    • 2008
  • 액정 구동 IC에서 발생하는 기생 p-n-p-n 회로의 래치업 문제를 개선하기 위해 power-up 순서상에 순차 스위치를 삽입하는 방법을 제안하였다. 제안된 순차 스위치는 2차-승압회로와 3차-승압회로 내에 삽입되며, power-up 순서상에서 해당 승압회로가 동작하기 전에 기생 p-n-p-n 회로의 분리된 에미터-베이스 단자를 순차적으로 연결하게 된다. 제안된 구조의 성능을 검증하기 위해 0.13-um CMOS 공정을 이용하여 테스트 IC를 설계 제작하였다 측정 결과, 기존의 경우 $50^{\circ}C$에서 액정 구동 전압이 VSS로 수렴하면서 과전류를 동반하며 래치업 모드로 진입하였으나, 제안 회로를 삽입한 경우는 고온($100^{\circ}C$)에서도 정상 전류 0.9mA와 정상 액정 구동 전압을 나타내어 래치업이 방지되고 있음을 확인하였다.

래치-업 면역과 높은 감내 특성을 가지는 LIGBT 기반 ESD 보호회로에 대한 연구 (Analysis of the LIGBT-based ESD Protection Circuit with Latch-up Immunity and High Robustness)

  • 곽재창
    • 한국전기전자재료학회논문지
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    • 제27권11호
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    • pp.686-689
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    • 2014
  • Electrostatic discharge has been considered as a major reliability problem in the semiconductor industry. ESD reliability is an important issue for these products. Therefore, each I/O (Input/Output) PAD must be designed with a protection circuitry that creates a low impedance discharge path for ESD current. This paper presents a novel Lateral Insulated Gate Bipolar (LIGBT)-based ESD protection circuit with latch-up immunity and high robustness. The proposed circuit is fabricated by using 0.18 um BCD (bipolar-CMOS-DMOS) process. Also, TLP (transmission line pulse) I-V characteristic of proposed circuit is measured. In the result, the proposed ESD protection circuit has latch-up immunity and high robustness. These characteristics permit the proposed circuit to apply to power clamp circuit. Consequently, the proposed LIGBT-based ESD protection circuit with a latch-up immune characteristic can be applied to analog integrated circuits.

Selective N+ 버퍼층을 갖는 latch up 억제를 위한 새로운 IGBT 구조 (A new IGBT structure for suppression of latch up with selective N+ buffer layer)

  • 김두영;이병훈;최연익;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 정기총회 및 추계학술대회 논문집 학회본부
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    • pp.240-242
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    • 1993
  • A novel structure, which can suppress latch-up phenomena, is proposed and verified by the PISCESIIB simulation. It is shown that this structure employing the selective N+ buffer layer increases latch-up current density due to suppression of the current flowing through the p-body. The width of the N+ buffer layer is optimized considering the trade-off between the latch-up current density and the forward voltage drop. The selective buffer layer results in an improved trade-off relationship compared with the uniform buffer layer.

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향상된 Latch-up 특성을 갖는 트렌치 게이트 SOI LIGBT (Trench-gate SOI LIGBT with improved latch-up capability)

  • 이병훈;김두영;유종만;한민구;최연익
    • 전자공학회논문지A
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    • 제32A권1호
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    • pp.103-110
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    • 1995
  • Trench-Gate SOI LIGBT with improved latch-up capability has been proposed and verified by MEDICI simulation. The new SOI LIGBT exhibits 6 time larger latch-up capability of the new device is almost preserved independent of lifetime. the large latch-up capability of the new SOI LIGBT may be realized due to the fact that the hole current in the new device would bypass through the shorted cathode contact without passing the p-well region under the n+ cathode. Forward voltage drop is increased by 25% when a epi thickness is 6$\mu$m. However, the increase of the forward voltage is negligible when the epi thickness is increased to 10$\mu$m. It is found that the swithcing time of the new device is almost equal to the conventional devices. Evaluated breakdown voltage of proposed SOILIGBT is 250 V and that of the conventional SOI LIGBT is 240 V, where the thickness of the vuried oxide and n- epi is 3$\mu$m and 6$\mu$m, respectively.

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과도방사선에 의한 CMOS 소자 Latch-up 모델 연구 (A Study of CMOS Device Latch-up Model with Transient Radiation)

  • 정상훈;이남호;이민수;조성익
    • 전기학회논문지
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    • 제61권3호
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    • pp.422-426
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    • 2012
  • Transient radiation is emitted during a nuclear explosion. Transient radiation causes a fatal error in the CMOS circuit as a Upset and Latch-up. In this paper, transient radiation NMOS, PMOS, INVERTER SPICE model was proposed on the basisi of transient radiation effects analysis using TCAD(Technology Computer Aided Design). Photocurrent generated from the MOSFET internal PN junction was expressed to the current source and Latch-up phenomenon in the INVERTER was expressed to parasitic thyristor for the transient radiation SPICE model. For example, the proposed transient radiation SPICE model was applied to CMOS NAND circuit. SPICE simulated characteristics were similar to the TCAD simulation results. Simulation time was reduced to 120 times compared to TCAD simulation.

CMOS의 Latch-Up 특성 개선을 위한 효과적인 Mask 설계 방법 (Effective mask design for the improvement of latch-up characteristics in CMOS)

  • 손종형;정정화
    • 한국통신학회논문지
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    • 제24권10A호
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    • pp.1603-1610
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    • 1999
  • 본 논문은 CMOS의 latch-up 특성을 개선하기 위한 효과적인 mask 설계 방법에 관한 것이다. Mask의 평면구조와 latch-up 파라메타와의 상관관계를 실물 제작에 의한 실험과 컴퓨터 시뮬레이션에 의해 도출하였으며, guard ring의 효과에 대해서도 비교 분석하였다. 실험 결과, 수평구조 바이폴라 트랜지스터의 전류증폭률($\beta$n)이 디자인룰에 반비례하였으며, 수직구조 바이폴라 트랜지스터의 전류증폭률($\beta$n)은 디지인룰과 무관하였다. 스위칭전압과 유지전류는 디자인룰에 비례하였다. Guard ring은 latch-up의 가능성을 줄이는 데 상당한 효과가 있었음이 확인되었으며, Guard ring이 없는 경우에 비하여 전류증폭률의 곱($\beta$n$\beta$n)이 약 31% 감소, 유지전류는 약 25%가 향상됨을 확인하였다.

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SRAM 소자의 Cell Latch-up 현상 분석 (Analysis of Cell Latch-up Effect in SRAM Device)

  • 이준하;이흥주
    • 한국산학기술학회:학술대회논문집
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    • 한국산학기술학회 2004년도 추계학술대회
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    • pp.203-205
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    • 2004
  • A soft error rate neutrons is a growing problem for terrestrial integrated circuits with technology scaling. In the acceleration test with high-density neutron beam, a latch-up prohibits accurate estimations of the soft error rate (SER). This paper presents results of analysis for the latch-up characteristics in the circumstance corresponding to the acceleration SER test for SRAM. Simulation results, using a two-dimensional device simulator, show that the deep p-well structure has better latch-up immunity compared to normal twin and triple well structures. In addition, it is more effective to minimize the distance to ground power compared with controlling a path to the $V_{DD}$ power.

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