• 제목/요약/키워드: Guard Ring

검색결과 62건 처리시간 0.025초

CMOS공정에 의한 SSIMT의 제작 및 특성 (Fabrication and characteristics of SSIMT using a CMOS Process)

  • 송윤귀;임재환;정귀상;김남호;류지구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.168-171
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    • 2002
  • A SSIMT(Suppressed Sidewall Injection Magnetotransistor) sensor with high linearity is presented in this thesis. The prototype is fabricated by using the Hynix 0.6$\mu\textrm{m}$ P-substrate twin-well double poly three-metal CMOS Process. The fabricated SSIMT shows that variation of the collector current is extremely linear by varing the magnetic induction from -200mT to 200mT at I$\_$B/=500${\mu}$A, V$\_$CE/=2V and V$\_$SUB/=5V. The relative sensitivity is up to 120%/T. At B = 0, magnetic offset is about 79mT, there relative sensitivity is 30.5%/T. The nonlinearity of the fabricated SSIMT is measured about 1.4%.

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경계항복 억제를 위한 평판형 InP/InGaAs 애벌랜치 포토다이오드의 곡률 효과 분석 (Investigation of Curvature Effect on Planar InP/InGaAs Avalanche Photodiodes for Edge Breakdown Suppression)

  • 이봉용;정지훈;윤일구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.206-209
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    • 2002
  • With the progress of semiconductor processing technology, avalanohe photodiodes (APDs) based on InP/InGaAs are used for high-speed optical receiver modules. Planar-type APDs give higher reliability than mesa-type APDs. However, Planar-type APDs are struggled with a problem of intensed electric field at the junction curvature, which causes edge breakdown phenomena at the junction periphery. In this paper, we focused on studying the effects of junction curvature for APDs performances by different etching processes followed by single diffusion to from p-n junction. The performance of each process is characterized by observing electric field profiles and carrier generation rates. From the results, it can be understood to predict the optimum structure, which can minimize edge breakdown and improve the manufacturability.

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Effect of Channel Length in LDMOSFET on the Switching Characteristic of CMOS Inverter

  • Cui, Zhi-Yuan;Kim, Nam-Soo;Lee, Hyung-Gyoo;Kim, Kyoung-Won
    • Transactions on Electrical and Electronic Materials
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    • 제8권1호
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    • pp.21-25
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    • 2007
  • A two-dimensional TCAD MEDICI simulator was used to examine the voltage transfer characteristics, on-off switching properties and latch-up of a CMOS inverter as a function of the n-channel length and doping levels. The channel in a LDMOSFET encloses a junction-type source and is believed to be an important parameter for determining the circuit operation of a CMOS inverter. The digital logic levels of the output and input voltages were analyzed from the transfer curves and circuit operation. The high and low logic levels of the input voltage showed a strong dependency on the channel length, while the lateral substrate resistance from a latch-up path in the CMOS inverter was comparable to that of a typical CMOS inverter with a guard ring.

3전극형 전기용량 센서를 이용한 변압기 절연유의 열화감지특성 평가 (Analysis on the Diagnosis Characteristics of Electrical Insulating Oil for Power Transformer with 3-terminal Capacitive Sensor)

  • 김주한;서판석;김필환;김명환;박흥석;한상옥
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 추계학술대회 논문집 전기설비전문위원
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    • pp.89-92
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    • 2004
  • This paper described the capacitive sensor for the diagnosis of deterioration of electrical insulating oils applying guard-ring type the 3-terminal electrodes. To measure stable capacitance of the sensor and to determine the design factors of the sensor, we utilized computational analysis, FEM software. This capacitive sensor discern the extent of deterioration measuring relative permittivity of electrical insulating oils. The result of measuring numerous sample, mineral oils, as serviced year, we confirmed an increase in relative permittivity of oils. Moreover, we confirmed the superior characteristics of the sensor as a species, aged pattern of oils and operating temperature.

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CMOS 공정에 의한 Suppressed Sidewall Injection Magnetotransistor의 특성 (Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process)

  • 송윤귀;최영식;김남호;류지구
    • 한국전기전자재료학회논문지
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    • 제17권10호
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    • pp.1029-1033
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    • 2004
  • In this paper, we propose a new Suppressed Sidewall Injection Magnetotransistor(SSIMT) architecture, which allows to overcome the restriction of the standard CMOS technology and achieve high linearity. The proposed SSIMT is designed based on the Hynix 0.6 um standard CMOS technology. The fabricated SSIMT has been experimentally verified. The SSIMT shows that the change of collector current is extremely linear as a function of the magnetic induction at $I_{B}$ =500$\mu$A, $V_{CE}$ =2V and VSE =5 V. The relative sensitivity is up to 120 %/T. The magnetic conversion offset is about 79 mT with 30.5 %/T relative sensitivity. The nonlinearity of the fabricated SSIMT is measured about 1.4 %.%.

Spiral 인덕터 간 격리방법에 따른 Electromagnetic 커플링 효과 (EM Coupling Effect of sprint inductors by isolation methode in standard CMOS process)

  • 최문호;김한석;정성일;김영석
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.91-92
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    • 2005
  • The electromagnetic coupling effect in standard CMOS process is simulated and evaluated. EM coupling transfer characteristic between planar spiral inductors by isolation methode in standard CMOS have simulated and measured. Measurement results show that suppression of EM coupling effect by ground guardring. The evaluated structures are fabricated 1P5M(one poly, five metal) 0.25um standard CMOS process. These measurement results provide a isolation design guidelines in standard CMOS process for Rf coupling suppression.

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1,2차 모델링을 이용한 Ar RF 플라즈마의 응답 특성 (The Properties of Ar RF Plasma Using 1- and 2-dimensional Model)

  • 박용섭;정해덕
    • 한국전기전자재료학회논문지
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    • 제14권8호
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    • pp.622-628
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    • 2001
  • We developed 1- and 2-dimensional fluid model for the analysis of a capacitively coupled Ar RF(Radio Frequency) glow discharge. This discharge is in pure Ar gas at the pressure 100[mTorr], frequency 13.56[MHz] and voltage amplitude 120[V}. This model is based on the equations of continuity and electron energy conservation coupled with Poison equation. 2-dimensional model is simulated on the condition of GEC(Gaseous Electronic Conference cell). The geometry of the discharge chamber and the electrodes used in the model is cylindrically simmetric; tow cylinders for the electrodes are surrounded by the grounded chamber. It is shown that 1-dimensional model is very useful on the understanding of RF glow discharge property and of the movement of charged particles. 2-dimensional model predicts off-axis maximum structure as in the experiments and has the results in qualitatively and quantitatively good agreement with the experiments. Effects of dc self-bias voltage, guard ring and reactor geometry is discussed.

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RFID tag 집적화를 위한 $0.18{\mu}m$ 표준 CMOS 공정을 이용한 쇼트키 다이오드의 제작 (Fabrication of Schottky diodes for RFID tag integration using Standard $0.18{\mu}m$ CMOS process)

  • 심동식;민영훈
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2006년도 하계종합학술대회
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    • pp.591-592
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    • 2006
  • Schottky diodes for Radio-frequency identification (RFID) tag integration on chip were designed and fabricated using Samsung electronics System LSI standard $0.18{\mu}m$ CMOS process. Schottky diodes were designed as interdigitated fingers array by CMOS layout design rule. 64 types of Schottky diode were designed and fabricated with the variation of finger width, length and numbers with a $0.6{\mu}m$ guard ring enclosing n-well. Titanium was used as Schottky contact metal to lower the Schottky barrier height. Barrier height of the fabricated Schottky diode was 0.57eV. DC current - voltage measurements showed that the fabricated Schottky diode had a good rectifying properties with a breakdown voltage of -9.15 V and a threshold voltage of 0.25 V.

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SAGCM APD 에서의 가드링 형태에 따른 I-V 특성 연구 (I-V Characteristics of SAGCM APD by Varing Guard-Ring Depth)

  • 현경숙;백영미
    • 한국광학회:학술대회논문집
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    • 한국광학회 2003년도 하계학술발표회
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    • pp.100-101
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    • 2003
  • 본 논문은 초고속 광통신용 검출기로 사용되고 있는 InP/InGaAs Avalanche Photodiode (APD)에 대한 연구로서 구조 변화에 따른 APD의 특성에 대해 연구하였다. 채택된 APB의 기본 구조는 Separated Absorption, Grading, Charge and Multiplication (SAGCM)구조로 u-InP 의 두께 3.5$\mu\textrm{m}$에~2.9$\mu\textrm{m}$ 만큼 Zn diffusion 하였으며, u-InGaAs 의 흡수층 두께는 0.8$\mu\textrm{m}$ 로 하였다. charge sheet 층의 도핑 농도는 ~ 3.5 $\times$ 10/sup 12//cm/sup 2/ 이고, 전극 구조는 back side illumination type이다. (중략)

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Edge Termination을 위해 Tilt-Implantation을 이용한 SiC Trench Schottky Diode에 대한 연구 (A Study of SiC Trench Schottky Diode with Tilt-Implantation for Edge Termination)

  • 송길용;김광수
    • 전기전자학회논문지
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    • 제18권2호
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    • pp.214-219
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    • 2014
  • 본 논문에서는 실리콘 카바이드(silicon carbide)를 기반으로 한 tilt-implanted trench Schottky diode(TITSD)를 제안한다. 4H-SiC 트랜치 쇼트키 다이오드(trench Schottky diode)에 형성되는 트랜치 측면에 경사 이온주입(tilt-implantation)을 하여 소자가 역저지 상태(reverse blocking mode)로 동작 시 trench insulator가 모든 퍼텐셜(potential)을 포함하는 구조를 제안하고, 그 특성을 시뮬레이션을 통해 확인하였다. TITSD는 트랜치의 측면(sidewall)에 nitrogen을 $1{\times}10^{19}cm^{-3}$ 으로 도밍(doping) 하여 항복전압(breakdown voltage) 특성도 경사 이온주입을 하지 않았을 때와 같게 유지하면서 trench oxide insulator가 모든 퍼텐셜을 포함하도록 함으로써 termination area를 감소시켰다. 트랜치 깊이(trench depth)를 $11{\mu}m$로 깊게 하고 최적화된 폭(width)을 선택함으로써 2750V의 항복전압을 얻었고, 동급의 항복전압을 가진 가드링(guard ring) 구조보다 termination area를 38.7% 줄일 수 있다. 이에 대한 전기적 특성은 synopsys사의 TCAD simulation을 사용하여 분석하였으며, 그 결과를 기존의 구조와 비교하였다.