• Title/Summary/Keyword: Gate Simulation Model

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Maximum Power Dissipation Esitimation Model of CMOS digital Gates based on Characteristics of MOSFET (MOSFET 특성에 기초한 CMOS 디지털 게이트의 최대소모전력 예측모델)

  • Kim, Dong-Wook;Jung, Byung-Kweon
    • Journal of the Korean Institute of Telematics and Electronics C
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    • v.36C no.9
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    • pp.54-65
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    • 1999
  • As the integration ratio and operating speed increase, it has become an important problem to estimate the dissipated power during the design procedure to reduce th TTM(time to market). This paper proposed a prediction model for the maximum dissipated power of a CMOS logic gate. This model uses a calculating method. It was constructed by including the characteristics of MOSFETs, the operational characteristics of the gate, and the characteristics of the input signals. As the construction procedure, a maximum power estimation model for CMOS inverter was formed first, And then, a conversion model to convert a multiple input CMOS gate into a corresponding CMOS inverter was proposed. Finally, the power model for inverter was applied to the converted result so that the model could be applied to a general CMOS gate. We designed several CMOS gates in layout level with $0.6{\mu}m$ design rule to apply both to HSPICE simulation and to the proposed models. The comparison between the two results showed that the gate conversion model and the power estimation model had within 5% and 10% of the relative errors, respectively. Those values show that the proposed models have sufficient accuracies. Also in calculation time, the proposed models were more than 30 times faster than HSPICE simulation. Consequently, it can be said that the proposed model could be used efficiently to estimate the maximum dissipated power of a CMOS logic gate during the design procedure.

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Scaling theory to minimize the roll-off of threshold voltage for ultra fine MOSFET (미세 구조 MOSFET에서 문턱전압 변화를 최소화하기 위한 최적의 스켈링 이론)

  • 정학기;김재홍;고석웅
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.4
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    • pp.719-724
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    • 2003
  • In this paper, we have presented the simulation results about threshold voltage of nano scale lightly doped drain (LDD) MOSFET with halo doping profile. Device size is scaled down from 100nm to 40nm using generalized scaling. We have investigated the threshold voltage for constant field scaling and constant voltage scaling using the Van Dort Quantum Correction Model (QM) and direct tunneling current for each gate oxide thickness. We know that threshold voltage is decreasing in the constant field scaling and increasing in the constant voltage scaling when gate length is reducing, and direct tunneling current is increasing when gate oxide thickness is reducing. To minimize the roll off characteristics for threshold voltage of MOSFET with decreasing channel length, we know $\alpha$ value must be nearly 1 in the generalized scaling.

Parameter dependent conduction path for nano structure double gate MOSFET (나노구조 이중게이트 MOSFET에서 전도중심의 파라미터 의존성)

  • Jung, Hak-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.12 no.3
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    • pp.541-546
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    • 2008
  • In this paper, conduction phenomena have been considered for nano structure double gate MOSFET, using the analytical model. The Possion equation is used to analytical model. The conduction mechanisms to have an influence on current conduction are thermionic emission and tunneling current, and subthreshold swings of this paper are compared with those of two dimensional simulation to verify this model. The deviation of current path and the influence of current path on subthreshold swing have been considered according to the dimensional parameters of double gate MOSFET, i.e. gate length, gate oxide thickness, channel thickness. The optimum channel doping concentration is determined as the deviation of conduction path is considered according doping concentration.

Study on DC Characteristics of 4H-SiC Recessed-Gate MESFETs (Recessed-gate 4H-SiC MESFET의 DC특성에 관한 연구)

  • Park, Seung-Wook;Hwang, Ung-Jun;Shin, Moo-Whan
    • Korean Journal of Materials Research
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    • v.13 no.1
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    • pp.11-17
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    • 2003
  • DC characteristics of recessed gate 4H-SiC MESFET were investigated using the device/circuit simulation tool, PISCES. Results of theoretical calculation were compared with the experimental data for the extraction of modeling parameters which were implemented for the prediction of DC and gate leakage characteristics at high temperatures. The current-voltage analysis using a fixed mobility model revealed that the short channel effect is influenced by the defects in SiC. The incomplete ionization models are found out significant physical models for an accurate prediction of SiC device performance. Gate leakage is shown to increase with the device operation temperatures and to decrease with the Schottky barrier height of gate metal.

Analyses for RF parameters of Tunneling FETs (터널링 전계효과 트랜지스터의 고주파 파라미터 추출과 분석)

  • Kang, In-Man
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.49 no.4
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    • pp.1-6
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    • 2012
  • This paper presents the extraction and analysis of small-signal parameters of tunneling field-effect transistors (TFETs) by using TCAD device simulation. The channel lengths ($L_G$) of the simulated devices varies from 50 nm to 100 nm. The parameter extraction for TFETs have been performed by quasi-static small-signal model of conventional MOSFETs. The small-signal parameters of TFETs with different channel lengths were extracted according to gate bias voltage. The $L_G$-dependency of the effective gate resistance, transconductance, source-drain conductance, and gate capacitance are different with those of conventional MOSFET. The $f_T$ of TFETs is inverely proportional not to $L_G{^2}$ but to $L_G$.

Tail Electron Hydrodynamic Model for Consisten Modeling of Impact Ionization and Injection into Gate Oxide by Hot Electrons (고온전자의 충돌 이온화 및 게이트 산화막 주입 모델링을 위한 Tail 전자 Hydrodynamic 모델)

  • 안재경;박영준;민홍식
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.3
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    • pp.100-109
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    • 1995
  • A new Hydrodynamic model for the high energy tail electrons(Tail Electron Hydrodynamic Model : TEHD) is developed using the moment method. The Monte Carlo method is applied to a $n^{+}-n^{-}-n^{+}$ device to calibrate the TEHD equations. the discretization method and numerical procedures are explained. New models for the impact ionization and injection into the gate oxide using the tail electron density are proposed. The simulated results of the impact ionization rate for a $n^{+}-n^{-}-n^{+}$ device and MOSFET devices, and the gate injection experiment are shown to give good agreement with the Monte Carlo simulation and the measurements.

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Numerical Simulation of Submerged Hydraulic Jump Using k-ω SST Turbulence Model (k-ω SST 난류모형을 이용한 수중도수의 수치모의)

  • Choi, Seongwook
    • KSCE Journal of Civil and Environmental Engineering Research
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    • v.44 no.3
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    • pp.329-336
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    • 2024
  • In the case of multi-function weirs installed in Korea, the free hydraulic jump or the submerged hydraulic jump is occurred depending on the height of the gate opening and the tailwater level when the sluice gate of the movable weir is partially opened. In this study, the submerged hydraulic jump for the flows under the sluice gate were simulated and the mean flow, turbulence statistics, and relative water depth are investigated using numerical simulation. For numerical simulation, the unsteady Reynolds-averaged Navier-Stokes equation, volume of fluid method, and k-ωSST turbulence model were used. The numerical model was validated using the results of other researchers' previously performed experiments, and it was investigated that the numerical model appropriately simulates the two-phase flow in the hydraulic jump. In addition, the distribution of mean flow, turbulence statistics, and the length of recirculation region was investigated.

Relationship of Threshold Voltage Roll-off and Gate Oxide Thickness in Asymmetric Junctionless Double Gate MOSFET (비대칭형 무접합 이중게이트 MOSFET에서 산화막 두께와 문턱전압이동 관계)

  • Jung, Hakkee
    • Journal of IKEEE
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    • v.24 no.1
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    • pp.194-199
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    • 2020
  • The threshold voltage roll-off for an asymmetric junctionless double gate MOSFET is analyzed according to the top and bottom gate oxide thicknesses. In the asymmetric structure, the top and bottom gate oxide thicknesses can be made differently, so that the top and bottom oxide thicknesses can be adjusted to reduce the leakage current that may occur in the top gate while keeping the threshold voltage roll-off constant. An analytical threshold voltage model is presented, and this model is in good agreement with the 2D simulation value. As a result, if the thickness of the bottom gate oxide film is decreased while maintaining a constant threshold voltage roll-off, the top gate oxide film thickness can be increased, and the leakage current that may occur in the top gate can be reduced. Especially, it is observed that the increase of the bottom gate oxide thickness does not affect the threshold voltage roll-off.

Design and Implementation of an FPGA-based Real-time Simulator for a Dual Three-Phase Induction Motor Drive

  • Gregor, Raul;Valenzano, Guido;Rodas, Jorge;Rodriguez-Pineiro, Jose;Gregor, Derlis
    • Journal of Power Electronics
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    • v.16 no.2
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    • pp.553-563
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    • 2016
  • This paper presents a digital hardware implementation of a real-time simulator for a multiphase drive using a field-programmable gate array (FPGA) device. The simulator was developed with a modular and hierarchical design using very high-speed integrated circuit hardware description language (VHDL). Hence, this simulator is flexible and portable. A state-space representation model suitable for FPGA implementations was proposed for a dual three-phase induction machine (DTPIM). The simulator also models a two-level 12-pulse insulated-gate bipolar transistor (IGBT)-based voltage-source converter (VSC), a pulse-width modulation scheme, and a measurement system. Real-time simulation outputs (stator currents and rotor speed) were validated under steady-state and transient conditions using as reference an experimental test bench based on a DTPIM with 15 kW-rated power. The accuracy of the proposed digital hardware implementation was evaluated according to the simulation and experimental results. Finally, statistical performance parameters were provided to analyze the efficiency of the proposed DTPIM hardware implementation method.

Anomalous Phenomena on Subthreshold Characteristics of SOI MOSFET Back Gate Voltage

  • Lee, Seung-Min;Lee, Mike-Myung-Ok
    • Proceedings of the IEEK Conference
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    • 1998.10a
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    • pp.553-556
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    • 1998
  • The 1-D numerical model and its extraction methodology are suggested and these simulation results for the S-swing as a function of back-gate voltage are well matched with the measured. S-swing characteristics are analyzed using PD-SOI devices with enough deeper regions up to substrates. The PD-SOI device doesn't have to be short channel to see the anomalous subthreshold phenomena based on the back gate bias. This results recommend to operate better SOI device performances by controlling the back gate voltages. So SOI performances will be much optimistic with proper control of the back-gate voltage for the already- proven- high- performance (APHP) SOI VLSIs.

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