• 전기전자학회논문지
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• 제8권1호
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• pp.136-144
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• 2004

2차원 소자 시뮬레이터를 이용한 AC 해석 결과를 토대로 ESD 보호용 소자의 AC 등가회로 모델링을 시도한다. NMOS 보호용 트랜지스터의 AC 등가회로는 다소 복잡한 형태로 모델링되며, 이를 간단히 RC 직렬회로로 모델링할 경우 주파수 영역에 따라 오차가 크게 발생할 수 있음을 설명한다. 또한 싸이리스터형 pnpn 보호용 소자의 등가회로는 간단히 RC 직렬회로로 모델링될 수 있음을 보인다. 추출한 등가회로를 이용한 회로 시뮬레이션에 근거하여, 주요 RF 회로의 하나인 LNA에 ESD 보호용 소자를 장착할 경우 보호용 소자의 기생성분이 LNA의 특성에 미치는 영향에 대해 조사해 본다. NMOS 보호용 트랜지스터를 단순히 커패시터 하나만으로 모델링할 경우 회로특성의 예측에 큰 오류가 발생할 수 있음을 설명한다. 또한 제시한 pnpn 보호용 소자를 사용할 경우 보호용 소자의 장착에 의한 LNA 회로의 특성 열화가 크게 감소될 수 있음을 확인한다.

• 전기전자학회논문지
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• 제22권1호
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• pp.80-86
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• 2018

본 논문에서는 기존 ESD 보호회로인 SCR, LVTSCR 보다 향상된 전기적 특성을 갖는 새로운 PNP 바이폴라 삽입형 ESD 보호회로를 제안한다. 제안된 회로는 기존 SCR에 대비하여 약 9V낮은 8.59V의 트리거 전압을 가지고, 기생 PNP가 하나 더 동작하면서 높은 감내특성을 갖는다. 또한 제안된 ESD 보호회로의 실제 설계 적용을 위해 변수 L을 늘리면서 기생 PNP의 베이스 길이를 늘려 홀딩전압을 증가시켰다. 제안된 소자의 전기적 특성 검증을 위해 Synopsys사의 T-CAD 시뮬레이터를 사용하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.674-676
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• 2008

An electrostatic discharge (ESD) or a noise supplied from the outside has an effect on communication between the timing controller (TCON) and the memory element (EEPROM) through the interface between the timing controller and the memory element in liquid crystal displays (LCD). Therefore, we must apply ESD protection methods to LCD operating circuits for a normal operation. Our ESD protection circuit is to prevent from bi-directional communication errors between TCON and EEPROM due to an electrostatic discharge (ESD).

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2005년도 추계종합학술대회
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• pp.731-734
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• 2005

In this study, the design of advanced LVDS(Low Voltage Differential Signaling) I/O interface circuit with new structural low triggering ESD (Electro-Static Discharge) protection circuit was investigated. Due to the differential transmission technique and low power consumption at the same time. Maximum transmission data ratio of designed LVDS transmitter was simulated to 5Gbps. And Zener Triggered SCR devices to protect the ESD phenomenon were designed. This structure reduces the trigger voltage by making the zener junction between the lateral PNP and base of lateral NPN in SCR structure. The triggering voltage was simulated to 5.8V. Finally, we performed the layout high speed I/O interface circuit with the low triggered ESD protection device in one-chip.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.10-10
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• 2010

ESD (Electrostatic Discharge) phenomenon occurs in everywhere and especially it damages to semiconductor devices. For ESD protection, there are some devices such as diode, GGNMOS (Gate-Grounded NMOS), SCR (Silicon-Controlled Rectifier), etc. Among them, diode and GGNMOS are usually chosen because of their small size, even though SCR has greater current capability than GGNMOS. In this paper, a novel SCR is proposed on the SOI (Silicon-On-Insulator) structure which has $1{\mu}m$ film thickness. In order to design and confirm the proposed SCR, TSUPREM4 and MEDICI simulators are used, respectively. According to the simulation result, although the proposed SCR has more compact size, it's electrical performance is better than electrical characteristics of conventional GGNMOS.

• 한국전기전자재료학회논문지
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• 제21권10호
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• pp.875-880
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• 2008

In this paper, we deal with the TLP evaluation results for GGNMOS in ESD protection device of conventional CMOS process. An evaluation parameter for GGNMOS is that repeatability evaluation for reference device($W/L=50\;{\mu}m1.0\;{\mu}m$) and following factors for design as gate width, number of finger, present or not for N+ gurad -ring, space of N-field region to contact and present or not for NLDD layer. The result of repeatability was showed uniformity of lower than 1 %. The result for design factor evaluation was ; 1) gate width leading to increase It2, 2) An increase o( finger number was raised current capability(It2), and 3) present of N+ gurad-ring was more effective than not them for current sink. Finally we suggest the optimized design conditions for GGNMOS in evaluated factor as ESD protection device of conventional CMOS process.

• 전기전자학회논문지
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• 제9권2호
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• pp.161-169
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• 2005

본 연구에서는 보다 낮은 트리거 전압을 갖는 새로운 구조의 LVTSCR과 Triple-well SCR ESD 보호회로를 제안 및 설계하여 나노급 회로에 적용하고자 하였다. 제안된 LVTSCR은 약 9V, 약 7mA의 트리거 전압과 전류 및 약 7mA의 홀딩전압 특성을 가지며, 0.8KV(150mA/um) 정도의 ESD 감내 특성을 나타낸다. 한편 Triple-well SCR은 6V, 40mA의 트리거 전압을 가지며, substrate 및 gate 바이어스에 의해 트리거 전압이 4-5.5V 까지 감소하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1370-1371
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• 2006

An electrostatic discharge (ESD) protection device, so called, N-type extended drain silicon controlled rectifier (NEDSCR) device, was analyzed for high voltage I/O applications. A conventional NEDSCR device shows typical SCR-like characteristics with extremely low snapback holding voltage. This may cause latchup problem during normal operation. However, a modified NEDSCR device with proper junction / channel engineering demonstrates itself with both the excellent ESD protection performance and the high latchup immunity.

• ETRI Journal
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• 제31권6호
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• pp.725-731
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• 2009

In this paper, electrostatic discharge (ESD) protection circuits with an advanced substrate-triggered NMOS and a gate-substrate-triggered NMOS are proposed to provide low trigger voltage, low leakage current, and fast turn-on speed. The proposed ESD protection devices are designed using 0.13 ${\mu}m$ CMOS technology. The experimental results show that the proposed substrate-triggered NMOS using a bipolar transistor has a low trigger voltage of 5.98 V and a fast turn-on time of 37 ns. The proposed gate-substrate-triggered NMOS has a lower trigger voltage of 5.35 V and low leakage current of 80 pA.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.97-98
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• 2006

High current behaviors of the grounded gate extended drain N-type metal-oxide-semiconductor field effects transistor (GG_EDNMOS) electro-static discharge (ESD) protection devices are analyzed. Simulation based contour analyses reveal that combination of BJT operation and deep electron channeling induced by high electron injection gives rise to the 2-nd on-state. Thus, the deep electron channel formation needs to be prevented in order to realize stable and robust ESD protection performance. Based on our analyses, general methodology to avoid the double snapback and to realize stable ESD protection is to be discussed.