• Title/Summary/Keyword: Drain engineering

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FinFET for Terabit Era

  • Choi, Yang-Kyu
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.4 no.1
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    • pp.1-11
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    • 2004
  • A FinFET, a novel double-gate device structure is capable of scaling well into the nanoelectronics regime. High-performance CMOS FinFETs , fully depleted silicon-on-insulator (FDSOI) devices have been demonstrated down to 15 nm gate length and are relatively simple to fabricate, which can be scaled to gate length below 10 nm. In this paper, some of the key elements of these technologies are described including sub-lithographic pattering technology, raised source/drain for low series resistance, gate work-function engineering for threshold voltage adjustment as well as metal gate technology, channel roughness on carrier mobility, crystal orientation effect, reliability issues, process variation effects, and device scaling limit.

Electrical Characteristics of LDMOS Power Device with LDD Structure (Gate-LDD구조를 가진 LDMOS 전력소자의 전기적 특성)

  • Oh Jung-Keun;Kim Nam-Su
    • Proceedings of the KIPE Conference
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    • 2002.07a
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    • pp.163-165
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    • 2002
  • LDD구조를 가진 LDMOS 전력소자의 LDD영역과 채널영역변화에 의한 전기적 특성을 비교 조사하였다. MEDICI 시뮬레이션 tool을 이용하여 hot-carrier전류의 특성, ON 저항의 변화, breakdown 전압의 특성과 switch transient 특성을 조사하였다. Gate-drain 사이의 불순물도핑 영역 및 농도에 따른 소자의 특성해석은 LDD구조를 가진 LDMOS가 hot-carrier resistance 및 전력소모 관점에서 우수한 특성을 나타낼 것으로 사료된다

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Dependency of Tunneling Field-Effect Transistor(TFET) Characteristics on Operation Regions

  • Lee, Min-Jin;Choi, Woo-Young
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.11 no.4
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    • pp.287-294
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    • 2011
  • In this paper, two competing mechanisms determining drain current of tunneling field-effect transistors (TFETs) have been investigated such as band-to-band tunneling and drift. Based on the results, the characteristics of TFETs have been discussed in the tunneling-dominant and drift-dominant region.

Formation and Role of Self Assembled Monolayer in Organic Thin Film Transistors

  • Hahn, Jung-Seok
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.3-4
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    • 2007
  • 고분자 반도체를 이용한 유기 박막트랜지스터(OTFT) 소자 제작시 특성 향상을 위해 Self-Assemble Monolayer (SAM)을 이용한 유기 Gate 절연막과 source/drain 전극의 표면처리에 대해 설명하였다. Gate insulator의 경우 소수성 SAM이 고분자 반도체와의 상호작용으로 배열도를 향상시켜 이동도를 증가시켰으며, 전극처리의 경우 접촉저항을 낮추어 injection을 증대시키는 효과를 나타내었다. 각각의 경우 적용되는 SAM 재료와 효과를 극대화시키기 위한 처리공정 전반에 대해 설명하였다.

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Correlation of Experimental and Analytical Responses in Nonlinear Behaviors of a Masonry-Infilled RC Frame (조적채움 RC골조의 비선켱 거동애 대한 실험과 해석의 상관성)

  • 이한선;우성우
    • Proceedings of the Earthquake Engineering Society of Korea Conference
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    • 2003.03a
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    • pp.313-320
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    • 2003
  • The responses of a 1:5 scale 3-story masonry-infilled RC frame which was designed only for gravity loads were simulated by using a nonlinear analysis program, DRAIN-2DX. The objective of this study is to verify the correlation between the experimental and analytical responses of a masonry-infilled RC frame. It is concluded from this comparison that the strength and stiffness of the whole structure can be predicted with quite high reliability using compressive strut (compression link element, Type 09).

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EEPROM Charge Sensors (EEPROM을 이용한 전하센서)

  • Lee, Dong-Kyu;Jin, Hai-Feng;Yang, Byung-Do;Kim, Young-Suk;Lee, Hyung-Gyoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.8
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    • pp.605-610
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    • 2010
  • The devices based on electrically erasable programmable read-only memory (EEPROM) structure are proposed for the detection of external electric charges. A large size charge contact window (CCW) extended from the floating gate is employed to immobilize external charges, and a control gate with stacked metal-insulator-metal (MIM) capacitor is adapted for a standard single polysilicon CMOS process. When positive voltage is applied to the capacitor of CCW of an n-channel EEPROM, the drain current increases due to the negative shift of its threshold voltage. Also when a pre-charged external capacitor is directly connected to the floating gate metal of CCW, the positive charges of the external capacitor make the drain current increase for n-channel, whereas the negative charges cause it to decrease. For an p-channel, however, the opposite behaviors are observed by the external voltage and charges. With the attachment of external charges to the CCW of EEPROM inverter, the characteristic inverter voltage behavior shifts from the reference curve dependent on external charge polarity. Therefore, we have demonstrated that the EEPROM inverter is capable of detecting external immobilized charges on the floating gate. and these devices are applicable to sensing the pH's or biomolecular reactions.

3D Simulation on Polarization Effect in AlGaN/GaN HEMT (AlGaN/GaN HEMT의 분극 현상에 대한 3D 시뮬레이션)

  • Jung, Kang-Min;Kim, Jae-Moo;Kim, Hee-Dong;Kim, Dong-Ho;Kim, Tae-Geun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.47 no.10
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    • pp.23-28
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    • 2010
  • In this paper, we investigated the polarization effects on the electrical and structural characteristics of AlGaN/GaN HEMT. Both the Al mole-fraction and the barrier thickness of AlGaN, which determine the profiles of a two-dimensional electron gas, were simulated to obtain the optimum HEMT structure affecting the polarization effect. As a results, we found that the amount of bound sheet charges was increased by 16% and the maximum drain current density ($I_D$,max) was increased by more than 37%, while AI mole fractions are changed from 0.3 to 0.4. We also observed a 37% improvement in maximum drain current density ($I_D$,max) by increasing AIGaN layer thickness from 17 to 38 nm. However when AlGaN layer thickness reached the critical thickness, DC characteristics were dramatically lowered due to 'bulk' relaxation in AlGaN layer.

Analysis of the Critical Path of Underground Gas Pipe According to Interference Behavior (간섭 거동에 따른 지하 가스 배관의 영향선 분석)

  • Kim, Mi-Seung;Won, Jong-Hwa;Kim, Moon-Kyum;Kim, Tae-Min;Choi, Sun-Young
    • Journal of the Korean Institute of Gas
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    • v.13 no.2
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    • pp.7-13
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    • 2009
  • In order to make the critical path analysis of gas pipeline located under rigid pipes for interference behavior, FE analysis is performed considering real buried conditions of a drain and a gas pipe according to intersection angle of two pipes. A drain pipe and gas pipe have cover depth respectively 1.0m and 3.39m and this study considers a interference angle in the range of $0{\sim}90^{\circ}$. In this paper, the critical path is analyzed from the result of Ring Deflection and bending stress according to intersection angle. In the event intersection angle of two pipes equal to the critical path of lower pipe. The analysis results show that the critical path of lower gas pipe according to interference behavior has relation to intersection angle of two pipes.

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Improvement of Rapid Sand Filtration to Two Stage Dual Media Filtration System in Water Treatment Plant (정수처리장내 급속모래 여과지의 이단복합여과시스템으로의 개량)

  • Woo, Dal-Sik;Hwang, Kyu-Won;Kim, Joon-Eon;Hwang, Byung-Gi;Jo, Kwan-Hyung
    • Journal of Environmental Health Sciences
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    • v.37 no.2
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    • pp.141-149
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    • 2011
  • This study aimed for developing a two stage dual media filtration system. It has a sand and activated carbon layer above the under-drain system, and a sand layer above the middle-drain system for pretreatment. When retrofitting an old sand filter bed or designing a new one, this technology can substitute the existing sand filter bed without requiring a new plant site. The removal rate of total particle is 93, and 3~7 ${\mu}m$ and 5~15 ${\mu}m$ particles are all 97%. These high removal efficiencies of each pollutant due to adsorption and biological oxidation in activated carbon filter layer. The best backwashing method of two stage dual media filtration system is ascertained by air injection, air + water injection and water injection sequence. In this study, a pilot plant of two stage and dual filtration system was operated for 4 months in water treatment plant. The stability of turbidity was maintained below 1 NTU. The TOC, THMFP and HAAFP were removed about 90% by two stage and dual media filtration system, which is almost 2 times higher than existing water treatment plant.

Characterization of gate oxide breakdown in junctionless amorphous InGaZnO thin film transistors (무접합 비정질 InGaZnO 박막 트랜지스터의 게이트 산화층 항복 특성)

  • Chang, Yoo Jin;Seo, Jin Hyung;Park, Jong Tae
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.22 no.1
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    • pp.117-124
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    • 2018
  • Junctionless amorphous InGaZnO thin film transistors with different film thickness have been fabricated. Their device performance parameters were extracted and gate oxide breakdown voltages were analyzed with different film thickness. The device performances were enhanced with increase of film thickness but the gate oxide breakdown voltages were decreased. The device performances were enhanced with increase of temperatures but the gate oxide breakdown voltages were decreased due to the increased drain current. The drain current under illumination was increased due to photo-excited electron-hole pair generation but the gate oxide breakdown voltages were decreased. The reason for decreased breakdown voltage with increase of film thickness, operation temperature and light intensity was due to the increased number of channel electrons and more injection into the gate oxide layer. One should decide the gate oxide thickness with considering the film thickness and operating temperature when one decides to replace the junctionless amorphous InGaZnO thin film transistors as BEOL transistors.