• Journal of the Korean Institute of Telematics and Electronics C
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• v.35C no.10
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• pp.30-37
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• 1998

An analog array with a 1.2 $\mu\textrm{m}$ double poly floating gate transistor has been developed with a standard CMOS fabrication process. The programming of each cell by means of an efficient control circuit eliminates the unnecessary erasing operation which has been widely used in conventional analog memories. It is seen that the path of the signal for both the programming and the reading is almost exactly the same since just one comparator supports both operations. It helps to eliminate the effects of the amplifier input-offset voltage problem on the output voltage for the read operation. In the array, there is no pass transistor isolating a cell of interest from the adjacent cells in the array. Instead of the extra transistors, one extra bias voltage, Vmid, is employed. The experimental results from the memory shows that the resolution of the memory is equivalent to the information content of at least six digital cells. Programming/erasing of each cell is achieved with no detectable disturbance of adjacent cells. Finally, the unique shape of the injector structure in a EEPROM is adopted as a cell of analog array. It reduces the programming voltage below the transistor breakdown voltage without any special fabrication process.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.41 no.9
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• pp.115-124
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• 2004

This paper proposes a high efficient and low power FIR filter chip for partial-response maximum likelihood (PRML) disk drive read channels; it is a 6-bit, 8-tap digital FIR filter. The proposed filter employs a parallel processing architecture and consists of 4 pipeline stages. It uses the modified Booth algorithm for multiplication and compressor logic for addition. CMOS pass-transistor logic is used for low power consumption and single-rail logic is used to reduce the chip area. The proposed filter is actually implemented and the chip dissipates 120mV at 100MHz, uses a 3.3V power supply and occupies 1.88 ${\times}$ 1.38 $\textrm{mm}^2$. The implemented filter requires approximately 11.7% less power compared with the existing architectures that use the similar technology.

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.2
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• pp.103-110
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• 2001

Gate oxide scaling for sub-l00nm CMOS devices has been studied. Issues on the gate oxide scaling are reviewed, which are boron penetration, reliability, and direct tunneling leakage currents. Reliability of Sub-2.0nm oxides and the device performance degradation due to boron penetration are investigated. Especially, the effect of gate leakage currents on the transistor characteristics is studied. As a result, it is proposed that thinner oxides than previous expectations may be usable as scaling proceeds. Based on the gate oxide thickness optimization process we have established, high performance CMOS transistors of $L_{gate}=70nm$ and $T_{ox}=1.4nm$ were fabricated, which showed excellent current drives of $860\mu\textrm{A}/\mu\textrm{m}$ (NMOS) and $350\mu\textrm{A}/\mu\textrm{m}$ (PMOS) at $I_{off}=10\mu\textrm{A}/\mu\textrm{m}$ and $V_dd=1.2V$, and CV/I of 1.60ps (NMOS) and 3.32ps(PMOS).

• Journal of Sensor Science and Technology
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• v.19 no.1
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• pp.25-30
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• 2010

This paper presents a low noise CMOS regulator for a low power capacitive sensor interface in a $0.5{\mu}m$ CMOS standard technology. Proposed LDO regulator circuit consist of a voltage reference block, an error amplifier and a new buffer between error amplifier and pass transistor for a good output stability. Conventional source follower buffer structure is simple, but has a narrow output swing and a low S/N ratio. In this paper, we use a 2-stage wide band OTA instead of source follower structure for a buffer. From SPICE simulation results, we got 0.8 % line regulation and 0.18 % load regulation.

• Journal of Sensor Science and Technology
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• v.15 no.5
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• pp.341-346
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• 2006

We have fabricated SOI CMOS active pixel image sensor with the pinned photodiode on handle wafer in order to reduce dark currents and improve spectral response. The structure of the active pixel image sensor is 4 transistors APS which consists of a reset and source follower transistor on seed wafer, and is comprised of the photodiode, transfer gate, and floating diffusion on handle wafer. The source of dark current caused by the interface traps located on the surface of a photodiode is able to be eliminated, as we apply the pinned photodiode. The source of dark currents between shallow trench isolation and the depletion region of a photodiode can be also eliminated by the planner process of the hybrid bulk/SOI structure. The photodiode could be optimized for better spectral response because the process of a photodiode on handle wafer is independent of that of transistors on seed wafer. The dark current was about 6 pA at 3.3 V of floating diffusion voltage in the case of transfer gate TX = 0 V and TX=3.3 V, respectively. The spectral response of the pinned photodiode was observed flat in the wavelength range from green to red.

• JSTS:Journal of Semiconductor Technology and Science
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• v.7 no.1
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• pp.28-35
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• 2007

This paper presents a high-speed flash analog-to-digital converter (ADC) for ultra wide band (UWB) receivers. In this flash ADC, the interpolating technique is adopted to reduce the number of the amplifiers and a linear and wide-bandwidth interpolating amplifier is presented. For this ADC, the transistor size for the cascaded stages is inversely scaled to improve the trade-off in bandwidth and power consumption. The active inductor peaking technique is also employed in the pre-amplifiers of comparators and the track-and-hold circuit to enhance the bandwidth. Furthermore, a digital-to-analog converter (DAC) is embedded for the sake of measurements. This chip has been fabricated in $0.13{\mu}m$ 1P8M CMOS process and the total power consumption is 113mW with 1V supply voltage. The ADC achieves 4-bit effective number of bits (ENOB) for input signal of 200MHz at 5-GSample/sec.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.21 no.5
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• pp.1325-1331
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• 1996

In this paper, a new current-memory circuit is proposed that reduces the clock feedthrough(CFT) error voltage causing total harmonic distortion(THD) increment in switched-current(SI) systems. Using PMOS transistor in CMOS complementary, the proposed one reduces output distortion current due to the CFT errorvoltage. A proposed current-memory is designed using a 1.2.mu.m CMOS process anda 1MHz sinusoidal signal having a 68.mu.A amplitude current is applied as input (sampling frequency:20MHz). It hasbeen shown from the simulation that the output distortion current effected by the CFT error voltage is reduced by approximately 10 times the error voltage of conventional one, THD is -57dB in case ofappling 1kHz frequency input signalwith 0.5 peak signal-to-bias current ratio.

• Journal of IKEEE
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• v.7 no.1 s.12
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• pp.56-62
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• 2003

In this paper, we designed a adder and a multiplier using current mode T-gate on $GF(2^2)$. The T-gate is consisted of current mirror and pass transistor, the designed 4-valued T-gate used adder and multiplier on $GF(2^2)$. We designed its under 1.5um CMOS standard technology. The unit current of the circuits is 15㎂, and power supply is 3.3V VDD. The proposed current mode CMOS operator have a advantage of module by T-gate`s arrangement, and so we easily implement multi-valued operator.

• Transactions on Electrical and Electronic Materials
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• v.18 no.5
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• pp.257-260
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• 2017

In this paper, we present the design of a 4.5 V low dropout (LDO) voltage regulator implemented in the 130 nm CMOS process. The design uses a two-stage cascaded operational transconductance amplifier (OTA) as an error amplifier, with a body bias technique for reducing dropout voltages. PMOS is used as a pass transistor to ensure stable output voltages. The results show that the proposed LDO regulator has a dropout voltage of 32.06 mV when implemented in the130 nm CMOS process. The power dissipation is only 1.3593 mW and the proposed circuit operates under an input voltage of 5V with an active area of $703{\mu}m^2$, ensuring that the proposed circuit is suitable for low-power applications.

• Journal of Information Display
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• v.3 no.2
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• pp.1-5
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• 2002

A CMOS driving circuit for active matrix type polymer electroluminescent displays was designed to develop an on-chip microdisplay on the single crystal silicon wafer substrate. The driving circuit is a conventional structure that is composed of the row, column and pixel driving parts. 256 gray scales were implemented using pulse amplitude modulation method. The 2-transistor driving scheme was adopted for the pixel driving part. The layout was carried out considering the compatibility with the standard CMOS process. Judging from the layout of the driving circuit, it turns that it is possible to implement a high-resolution display about 400 ppi resolution. Through the HSPICE simulation, it was verified that this circuit is capable of driving a VGA signal mode display and implementing 256 gray levels.