• 제목/요약/키워드: transistor design

검색결과 583건 처리시간 0.03초

High-Speed BiCMOS Comparator

  • Jirawath, Parnklang;Wanchana, Thongtungsai
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2000년도 제15차 학술회의논문집
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    • pp.510-510
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    • 2000
  • This paper introduces the design of BiCMOS latched comparator circuit for high-speed system application, which can be used in data conversion, instrumentation, communication system etc. By exploiting the advantage technology of the combination of both the bipolar transistor and the CMOS transistor devices. The comparator circuit includes an input stage that combines MOS sampling with a bipolar regenerative amplifier. The resistive load of conventional current-steering comparator is replaced by a load, which is made by a NMOS transistor. The advantage of design and PSPICE simulation of BiCMOS latched comparator are the circuit will obtain wide bandwidth with lowest power consumption at a single supply voltage. All the characteristics of the proposed BiCMOS latched comparator circuit is carried out by simulation program.

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나노미터 MOSFET 파워 게이팅 구조의 노화 현상 분석 (Analysis of Aging Phenomena in Nanomneter MOSFET Power Gating Structure)

  • 이진경;김경기
    • 센서학회지
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    • 제26권4호
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    • pp.292-296
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    • 2017
  • It has become ever harder to design reliable circuits with each nanometer technology node under normal operation conditions, a transistor device can be affected by various aging effects resulting in performance degradation and eventually design failure. The reliability (aging) effect has traditionally been the area of process engineers. However, in the future, even the smallest of variations can slow down a transistor's switching speed, and an aging device may not perform adequately at a very low voltage. Because of such dilemmas, the transistor aging is emerging as a circuit designer's problem. Therefore, in this paper, the impact of aging effects on the delay and power dissipation of digital circuits by using nanomneter MOSFET power gating structure has been analyzed.. Based on this analyzed aging models, a reliable digital circuits can be designed.

Analysis and Design of Transformer Windings Schemes in Multiple-Output Flyback Auxiliary Power Supplies with High-Input Voltage

  • Meng, Xianzeng;Li, Chunyan;Meng, Tao;An, Yanhua
    • Journal of Power Electronics
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    • 제19권5호
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    • pp.1122-1132
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    • 2019
  • In this paper, aiming at high-voltage applications, transformer windings schemes of multiple-output two-transistor flyback converters are investigated, which are mainly based on the stray capacitances effect. First, based on a transformer model including equivalent stray capacitors, the operational principle of the converter is presented, and the main influence of its stay capacitors is determined. Second, the windings structures of the transformer are analyzed and designed based on the stray capacitances effect. Third, the windings arrangements of the transformer are analyzed and designed through a coupling analysis of the secondary windings and a stray capacitance analysis between the primary and secondary windings. Finally, the analysis and design conclusions are verified by experimental results obtained from a 60W laboratory prototype of a multiple-output two-transistor flyback converter.

DC and RF Analysis of Geometrical Parameter Changes in the Current Aperture Vertical Electron Transistor

  • Kang, Hye Su;Seo, Jae Hwa;Yoon, Young Jun;Cho, Min Su;Kang, In Man
    • Journal of Electrical Engineering and Technology
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    • 제11권6호
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    • pp.1763-1768
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    • 2016
  • This paper presents the electrical characteristics of the gallium nitride (GaN) current aperture vertical electron transistor (CAVET) by using two-dimensional (2-D) technology computer-aided design (TCAD) simulations. The CAVETs are considered as the alternative device due to their high breakdown voltage and high integration density in the high-power applications. The optimized design for the CAVET focused on the electrical performances according to the different gate-source length ($L_{GS}$) and aperture length ($L_{AP}$). We analyze DC and RF parameters inducing on-state current ($I_{on}$), threshold voltage ($V_t$), breakdown voltage ($V_B$), transconductance ($g_m$), gate capacitance ($C_{gg}$), cut-off frequency ($f_T$), and maximum oscillation frequency ($f_{max}$).

Design of Multi-time Programmable Memory for PMICs

  • Kim, Yoon-Kyu;Kim, Min-Sung;Park, Heon;Ha, Man-Yeong;Lee, Jung-Hwan;Ha, Pan-Bong;Kim, Young-Hee
    • ETRI Journal
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    • 제37권6호
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    • pp.1188-1198
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    • 2015
  • In this paper, a multi-time programmable (MTP) cell based on a $0.18{\mu}m$ bipolar-CMOS-DMOS backbone process that can be written into by using dual pumping voltages - VPP (boosted voltage) and VNN (negative voltage) - is used to design MTP memories without high voltage devices. The used MTP cell consists of a control gate (CG) capacitor, a TG_SENSE transistor, and a select transistor. To reduce the MTP cell size, the tunnel gate (TG) oxide and sense transistor are merged into a single TG_SENSE transistor; only two p-wells are used - one for the TG_SENSE and sense transistors and the other for the CG capacitor; moreover, only one deep n-well is used for the 256-bit MTP cell array. In addition, a three-stage voltage level translator, a VNN charge pump, and a VNN precharge circuit are newly proposed to secure the reliability of 5 V devices. Also, a dual memory structure, which is separated into a designer memory area of $1row{\times}64columns$ and a user memory area of $3rows{\times}64columns$, is newly proposed in this paper.

피드백 전계 효과 트랜지스터로 구성된 모놀리식 3차원 정적 랜덤 액세스 메모리 특성 조사 (Investigation of the electrical characteristics of monolithic 3-dimensional static random access memory consisting of feedback field-effect transistor)

  • 오종혁;유윤섭
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2022년도 추계학술대회
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    • pp.115-117
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    • 2022
  • 피드백 전계 효과 트랜지스터(feedback field-effect transistor; FBFET)로 구성된 모놀리식 3차원 정적 랜덤 액세스 메모리(monolithic 3-dimensional static random access memory; M3D-SRAM)에 대해 TCAD(technology computer-aided design) 프로그램을 사용하여 전기적 특성을 조사하였다. FBFET로 구성된 M3D-SRAM(M3D-SRAM-FBFET)는 FDSOI(fully depleted silicon on insulator) 구조의 N형 FBFET와 N형 MOSFET(metal oxide semiconductor field effect transistor)로 이루어져 있으며 각각 하부와 상부에 위치한다. M3D-SRAM-FBFET의 메모리 동작 시, 공급 전압이 1.9 V에서 감소함에 따라 읽기 전류가 낮아졌으며, 공급 전압이 1.6 V 일 때 읽기 전류가 약 10배 감소하였다.

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Design and Analysis of Gate-recessed AlGaN/GaN Fin-type Field-Effect Transistor

  • Jang, Young In;Seo, Jae Hwa;Yoon, Young Jun;Eun, Hye Rim;Kwon, Ra Hee;Lee, Jung-Hee;Kwon, Hyuck-In;Kang, In Man
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제15권5호
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    • pp.554-562
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    • 2015
  • This paper presents the design and analysis of gate-recessed AlGaN/GaN Fin-type Field-Effect Transistor (FinFET). The three-dimensional (3-D) technology computer-aided design (TCAD) simulations were performed to analyze the direct-current (DC) and radio-frequency (RF) characteristics for AlGaN/GaN FinFETs. The fin width ($W_{fin}$) and the height of GaN layer ($H_{GaN}$) are the design parameters used to improve the electrical performances of gate-recessed AlGaN/GaN FinFET.

속도 향상을 위한 병합트랜지스터를 이용한 ISL의 설계 (Design of ISL(Intergrated Schottky Logic) for improvement speed using merged transistor)

  • 장창덕;백도현;이정석;이용재
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.21-25
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    • 1999
  • In order to remove minority carries of the base region at changing signal in conventional bipolar logic circuit, we made transistor which is composed of NPN transistor shortened buried layer under the Base region, PNP transistor which is merged in base, epi layer and substrate. Also the Ring-Oscillator for measuring transmission time-delay per gate was designed as well. In the result, we get amplitude of logic voltage of 200mV, the minimum of transmission delay-time of 211nS, and the minimum of transmission delay-time per gate of 7.26ns in AC characteristic output of Ring-Oscillator connected Gate.

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자기정렬된 고속 바이폴라 트랜지스터의 전기적 특성 (The Electrical Properties of Self-Aligned High Speed Bipolar Transistor)

  • 구용서;최상훈;구진근;이진효
    • 대한전자공학회논문지
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    • 제24권5호
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    • pp.786-793
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    • 1987
  • This paper describes the design and fabrication of the polysilicon selfaligned bipolar transistor with 1.6\ulcorner epitaxy and SWAMI isolation technologies. This transistor has two levels of polysilicon. Also emitter and adjacent edge of polysilicon base contact of this PSA device are defined by the same mask, and emitter feature size is 2x4 \ulcorner. DC characteristic of the fabricated transistor was evaluated and analyzed for the SPICE input parameters. The minimum propagation delay time per gate of 330 ps at 1mW was obtained with 41 stage CML ring oscillator.

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SEG 공정 적용에 따른 Tr 특성 연구 (The study on the Transistor Performance with SEG Process)

  • 이성호;강성관;최재복;유용호;송보영;안주현;노용한
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.167-168
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    • 2007
  • Design Rule이 작아짐에 따라 Transistor performance 향상을 위한 여러 방안중 SEG 공정이 적용되고 있으며 이에 따른 Transistor 특성 연구 결과이다. SEG공정 적용시 SEG Profile에 따라 Transistor의 Short Channel Effect 열화가 발생하였고 그 원인은 Sidewall Facet발생으로 추정되며 이를 개선시 Tr 특성이 개선됨을 확인하였다.

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