• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.4
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• pp.159-163
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• 2003

ln this work, we studied electrical characteristics and leakage current mechanism of $Ta_2O_{5}$ MOS(Metal-Oxide-Semiconductor) devices. $Ta_2O_{5}$ thin film (63 nm) was deposited by ALD(Atomic Layer Deposition) method at temperature of 235 $^{\circ}C$. The structures of the $Ta_2O_{5}$ thin films were examined by XRD(X-Ray Diffraction). From XRD, it is found that the structure of $Ta_2O_{5}$ is single phase and orthorhombic. From capacitance-voltage (C-V) anaysis, the dielectric constant was 19.4. The temperature dependence of current density-electric field (J-E) characteristics of $Ta_2O_{5}$ thin film was studied at temperature range of 300 - 423 K. In ohmic region (<0.5 MV/cm), the resistivity was 2.456${\times}10^{14}$ ($\omega{\cdot}cm$ at 348 K. The Schottky emission is dominant at lower temperature range from 300 to 323 K and Poole-Frenkel emission is dominant at higher temperature range from 348 to 423 K.

• Journal of Electrical Engineering and Technology
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• v.10 no.6
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• pp.2364-2367
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• 2015

In this study, we fabricated an electrolyte-insulator-metal (EIM) device incorporating a high-k Al₂O₃ sensing membrane using a porous anodic aluminum oxide (AAO) through a two-step anodizing process for pH detection. The structural properties were observed by field-emission scanning electron microscopy (FE-SEM) and X-ray diffraction patterns (XRD). Electrochemical measurements taken consisted of capacitance-voltage (C-V), hysteresis voltage and drift rates. The average pore diameter and depth of the AAO membrane with a pore-widening time of 20 min were 123nm and 273.5nm, respectively. At a pore-widening time of 20 min, the EIM device using anodic aluminum oxide exhibited a high sensitivity (56mV/pH), hysteresis voltage (6.2mV) and drift rate (0.25mV/pH).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.12
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• pp.1069-1074
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• 2005

In this work, nano-needle structures ate formed to solve problem, related to low density of quantum dots for nano floating gate memory. Such structures ate fabricated and electrical properties' of MIS devices fabricated on the nano-structures are studied. Nano floating gate memory based on quantum dot technologies Is a promising candidate for future non-volatile memory devices. Nano-structure is fabricated by reactive ion etching using $SF_6$ and $O_2$ gases in parallel RF plasma reactor. Surface morphology was investigated after etching using scanning electron microscopy Uniform and packed deep nano-needle structure is established under optimized condition. Photoluminescence and capacitance-voltage characteristics were measured in $Al/SiO_2/Si$ with nano-needle structure of silicon. we have demonstrated that the nano-needle structure can be applicable to non-volatile memory device with increased charge storage capacity over planar structures.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.452-455
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• 2003

[ $ZrO_2$ ] dielectric layers were grown on the p-type Si (100) substrate by metalorganic molecular beam epitaxy(MOMBE). Zrconium t-butoxide, $Zr(O{\cdot}t-C_4H_9)_4$ was used as a Zr precursor and Argon gas was used as a carrier gas. The thickness of the layers was measured by scanning electron microscopy (SEM) and the properties of the $ZrO_2$ layers were evaluated by X-ray diffraction, high frequency capacitance-voltage measurement. and HF C-V measurements have shown that $ZrO_2$ layer grown by MOMBE has a high dielectric constant (k=18-19). The growth rate is affected by various process variables such as substrate temperature, bubbler temperature, Ar, and $O_2$ gas flows.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05c
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• pp.41-46
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• 2002

In this work, we studied electrical characteristics and leakage current mechanism of Au/$Ta_2O_5$/Si metal-oxide-semiconductor (MOS) devices. $Ta_2O_5$ thin film (63nm) was deposited by atomic layer deposition (ALD) method at temperature of $235^{\circ}C$. The structures of the $Ta_2O_5$ thin films were examined by X-Ray Diffraction (XRD). From XRD, the structure of $Ta_2O_5$ was single phase and orthorhombic. From capacitance-voltage (C-V) analysis, the dielectric constant was 19.4. The temperature dependence of current-voltage (I-V) characteristics of $Ta_2O_5$ thin film was studied from 300 to 423 K. In ohmic region (<0.5 MVcm${-1}$), the resistivity was $2.4056{\times}10^{14}({\Omega}cm)$ at 348 K. The Schottky emission is dominant in lower temperature range from 300 to 323 K and Poole-Frenkel emission dominant in higher temperature range from 348 to 423 K.

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.4
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• pp.74-78
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• 2008

High-speed tool steels are extensively used in tooling industries for manufacturing cutting tools, forming tools, and rolls. Electrical discharge machining (EDM) has been found to be an effective process for machining these extremely hard and difficult-to-cut materials. Extensive research has been conducted to identify the optimum machining parameters for EDM with different tool steels. This paper presents a fundamental study of the surface characteristics of SKH-51 tool steel machined by micro-EDM, with particular focus on obtaining a better surface finish. An RC pulse generator was used to obtain a better surface finish as it produces fine discharge craters. The main operating parameters studied were the gap voltage and the capacitance while the resistance and other gap control parameters were kept constant. A negative tungsten electrode was used in this study. The micro-EDM performance was analyzed by atomic force microscopy to determine the average surface roughness and the distance between the highest peak and lowest valley. The topography of the machined surface was observed using a scanning electron microscope and a digital optical microscope.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.8
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• pp.620-623
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• 2013

The carbon nanotube / poly-vinylidene fluoride (CNT/PVDF) composite films for the nano-generator devices were fabricated by spray coating method using the CNT/PVDF solution, which was prepared by adding PVDF pellets into the CNT dispersed N-Methyl-2-pyrroli-done (NMP) solution. The flexible CNT/PVDF composite films were investigated by the scanning electron microscopy, which revealed that the CNTs were uniformly dispersed in the PVDF matrix and thickness of the films was approximately $20{\mu}m$. Fourier transform infra-red spectra were used to investigate crystal structure of the as-spray-coated CNT/PVDF films, and we found that they revealed extremely large portion of the ${\beta}$ phase PVDF. The capacitance of the CNT/PVDF films increased by adding CNTs into the PVDF matrix, and finally saturated. However, the resistance didn't show any saturation effect in the CNT concentration range of 0~4 wt%. Finally, the resulting nano-generator devices revealed reasonable current output after given mechanical stress.

• Bulletin of the Korean Chemical Society
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• v.18 no.1
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• pp.56-61
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• 1997

Lead zirconate titanate (PZT) thin fills were deposited onto the Pt/Ti/SiO2/Si substrate by the pulsed laser deposition with the second harmonic wavelength (532 nm) of Nd:YAG laser. In order to determine the optimum conditions for the film deposition, the phase of the films were investigated as functions of ambient oxygen pressure, substrate temperature, and laser fluence. Also the chemical composition analysis was conducted for the PZT films deposited under various ambient oxygen pressure. When the distance between substrate and bulk PZT target is set to 20 mm, the optimum conditions have been determined to be 3 torr of oxygen pressure, 1.5 J/cm2 of laser fluence, and 823-848(±10) K range of substrate temperature. At these conditions, perovskite phase PZT films were obtained on platinized silicon. The chemical composition of the films is very similar to that of PZT bulk target. The physical structure of the deposited films analyzed by scanning electron microscopy shows a columnar morphology perpendicular to the substrate surface. Capacitance-Voltage hysteresis loop measurements show also a typical characteristics of ferroelectric thin film. The dielectric constant is found to be 528 for the 0.48 μm thickness of PZT thin film.

• Journal of the Korean institute of surface engineering
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• v.52 no.3
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• pp.130-137
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• 2019

In this study, the cobalt sulfide (CoS) nanosheet on stainless steel as a supercapacitor electrode is synthesized by using a facile successive ionic layer adsorption reaction (SILAR) method. The number of cycles for dipping and rinsing can control the nanosheet thickness of CoS on stainless steel. Field emission-scanning electron microscopy (FE-SEM) showed a layer structure of CoS particles coupled as agglomeration. And x-ray diffraction (XRD) showed the crystallinity of the CoS nanosheet. To investigate the characteristics of the CoS nanosheet electrode as the supercapacitor, analysis of electrochemical measurement was conducted. Finally, the CoS nanosheet of 70cycles on stainless steel shows the specific capacitance ($44.25mF/cm^2$ at $0.25mA/cm^2$) with electrochemical stability of 78.5% over during 2000cycles.

• Journal of Hydrogen and New Energy
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• v.30 no.5
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• pp.418-427
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• 2019

Activated carbon was synthesized from bamboo charcoal by KOH activation at various temperatures for electrochemical double layer capacitor applications. The micro-structural and surface properties of all the samples were characterized by X-ray diffraction, scanning electron microscopy and N2 adsorption/desorption isotherm method. The electrochemical properties of the activated bamboo charcoal were examined by cyclic voltammetry in the potential window of -1.0 to 0.2 V in 6 M KOH electrolyte at different scan rates. An electrode made from the sample activated with 7.5 M KOH and heat treated at $750^{\circ}C$ for 3 h gave a maximum capacitance of 553 F/g at 1 mV/s and 450 F/g at 10mV/s.