A Study on the Electrical Properties of ![]() |
이형석
(고려대학교 전기공학과)
장진민 (고려대학교 전기공학과) 임장권 (고려대학교 전기공학과) 하만효 (고려대학교 전기공학과) 김양수 (고려대학교 전기공학과) 송정면 (고려대학교 전기공학과) 문병무 (고려대학교 전기공학과) |
1 | G.S. Oehrlein, F.M. d'Heurle, and A. Reisman, 'Some properties of crystallized tantalum pentoxide thin films on silicon', J. Appl. phys. Vol.55, pp.3715-3723, 1984 DOI ScienceOn |
2 |
H. Shinriki, Y.Nishioka, Y.Ohij, and K. Mukai, 'Oxidized |
3 | 유병곤, 유종선, '신재료 고유전율/강유전체 박막의 기술 개발 동향', Journal of the Korean Institute of Electrical and Electronic Material Engineers. Vol.14, No.12. pp.22-29, 2001 과학기술학회마을 |
4 |
Shin-ichiro Kimura, Yasushiro Nishioka, Akira Shintani and Kiichiro Mukai, 'Leakage-Current Increase in Amorphous |
5 | S.G. Byeon and Y. Tzeng, 'Charge trapping/generation and reliability for high-performance tantalum oxide capacitors', J. Appl. Phys. Vol.66, pp.4837-4842, 1989 DOI |
6 |
D. Spassov and E. Atanassova, 'Thermal |
7 |
Susumu Shibata, 'Dielectric constants of |
8 |
Y. Nishioka, N. Homma, H. Shinriki, K. Yamaguchi, A. Uchida, K. Higeta, and K. Ogiue, 'Ultra-Thin |
9 |
S.C Sun and T.F. Chen 'Reduction of Leakage current in Chemical-Vapor Deposited |
10 |
G.Q. Lo, D.L. Kwong, S. Lee, 'Metal-oxide-semiconductor characteristics of chemical vapor deposited |
11 |
김창덕, 이승환, 김종관, 이동희, 성영권 '레이저 CVD법에 의한 고품질 |
12 |
Young-kag Yoo, 'The Electrical conduction and Optical Properties of |
13 | Kwan C. Kao and Wei Hwang, 'Electrical Transport in Solids', Pergamon Press, 198113 |
14 |
Fu-Chien Chiu, Jenn-Jenn Wang, Joseph Ya-min Lee, and shich Chuan Wu, 'Leakage currents in amorphous |
15 | S.M. Sze, 'Physics of Semiconductor Devices', John&Wiley & Sons, 1981 |
16 | S.M. Sze, Physics of Semiconductor Devices', John&Wiley & Sons, 198115 |
17 |
김창덕, 이승환, 김종관, 이동희, 성영권 '레이저 CVD법에 의한 고품질 |
![]() |