Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2002.05c
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- Pages.41-46
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- 2002
The Electrical Properties of $Ta_2O_5$ Thin Films by Atomic Layer Deposition Method
원자층 증착 방법에 의한 $Ta_2O_5$ 박막의 전기적 특성
- Published : 2002.05.17
Abstract
In this work, we studied electrical characteristics and leakage current mechanism of Au/
Keywords
- Metal-Oxide-Semiconductor capacitor;
- Atomic Layer Deposition Method;
- Scanning Electron Microscopy;
- X-Ray Diffraction;
- Scottky emission