• 한국표면공학회지
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• 제55권6호
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• pp.460-468
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• 2022

Due to its high electrical conductivity, low contact resistance, good weldability and high corrosion resi-stance, gold is widely used in electronic components such as connectors and printed circuit boards (PCB). Gold ion salts currently used in gold plating are largely cyan-based salts and non-cyanic salts. The cya-nide bath can be used for both high and low hardness, but the non-cyanide bath can be used for low hardness plating. Potassium gold cyanide (KAu(CN)₂) as a cyanide type and sodium gold sulfite (Na₃[Au(SO)₃]₂) salt as a non-cyanide type are most widely used. Although the cyan bath has excellent performance in plating, potassium gold cyanide (KAu(CN)₂) used in the cyan bath is classified as a poison and a toxic substance and has strong toxicity, which tends to damage the positive photoresist film and make it difficult to form a straight side-wall. There is a need to supplement this. Therefore, it is intended to supplement this with an eco-friendly process using sodium sulfite sodium salt that does not contain cyan. Therefore, the main goal is to form a gold plating layer with a controllable hardness using a non-cyanide gold plating solution. In this study, the composition of a non-cyanide gold plating solution that maintains hardness even after annealing is generated through gold-palladium alloying by adding thallium, a crystal regulator among electrolysis factors affecting the structure and hardness, and changes in plating layer structure and crystallinity before and after annealing the correlation with the hardness.

• 한국표면공학회지
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• 제40권2호
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• pp.70-76
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• 2007

Ni-P-SiC composite coating layers were prepared by electroless plating method and their deposition rate, codeposition of SiC, morphology, surface roughness, hardness, wear and friction properties were investigated. The deposition rate was kept almost constant independent of the concentration of SiC in the plating solution and the codeposition of SiC in the composite coating layer increased with increased concentration of SiC in the plating solution except the early stage. Vickers microhardness increased with respect to the increased codeposition of SiC and the heat treatment at $300^{\circ}C$ in air for 1 hour. It was found that the wear volume decreased with increased up to 50 wt.% of SiC codeposition, and that friction coefficient increased gradually with increased codeposition of SiC. Considering the wear and the friction behaviors, the composite coating layer obtained by using 50 wt.% of SiC codeposition is desirable for the practical application for anti-wear and anti-friction coatings.

• Corrosion Science and Technology
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• 제21권2호
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• pp.89-99
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• 2022

A versatile method for performing non-cyanide electroless gold plating using thiomalic acid (TMA) as a complexing agent and 2-aminoethanethiol (AET) as a reducing agent was investigated. It was found that TMA was an excellent complexing agent for gold. It can be used in electroless gold plating baths at a neutral pH with a high solution stability, makes it a potential candidate to replace conventional toxic cyanide complex. It was found that one gold atomic ion could bind to two TMA molecules to form the [2TMA-Au⁺] complex in a solution. AET can be used as a reducing agent in electroless gold plating solutions. The highest current density was obtained at electrode rotation rate of 250 to 500 rpm based on anodic and cathodic polarization curves with the mixed potential theory. Increasing AET concentration, pH, and temperature significantly increased the anodic polarization current density and shifted the plating potential toward a more negative value. The optimal gold ion concentration to obtain the highest current density was 0.01 M. The cathodic current was higher at a lower pH and a higher temperature. The current density was inversely proportional to TMA concentration.

• 한국공작기계학회논문집
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• 제18권2호
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• pp.234-240
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• 2009

In this study, we found that it is important to have a specific management of standards which are the $12{\pm}3{\mu}m$ of plating thickness and $2{\pm}1%$ of tuning. To verify these standards, we checked the plating thickness and density of tuning through marginal valuation of each and checked size of a plating particle, adhesion of solder and condition of reflow after a section chief.

• 한국표면공학회지
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• 제26권5호
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• pp.263-270
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• 1993

The effects of surfactants on electorless copper plating bath for PCB was studied. Basic bath composition was cuplic sulfate 10g/l, EDTA.2Na 40 g/l, formalin$ 3m\ell$/l and sodium hydroxide solution for pH adjust. After addition of accelerators, stabilizers and surfactants, the polarization curves in plating bath were carried out for presumption of the plating rate. From the plating rate in bath with the various concentration of additives, the optimum condition for manufacturing the electroless copper plating bath was confirmed. It was found that the addition of $\alpha$.$\alpha$'-dipyridyl, pyridine and polyxyethylene octylphenylether was good as stabilizer, accelerator and surfactants, respectively. With this additives, the maximum plating rate of $12\mu\textrm{m}$/h at $65^{\circ}C$ and $2\mu\textrm{m}$/h at $25^{\circ}C$ was obtained.

• 한국표면공학회지
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• 제29권1호
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• pp.26-35
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• 1996

The Ni-SiC composite plating was performed in a Watt nickel solution and the wear resistance of the composite layer was studied on a pin-on-flat type wear tester. The volume losses and friction coefficients were measured. It was found that the quantity of SiC powder in the composite layers was affected by SiC concentration, pH, temperature, and agitation speed in the Watt nickel solution. The hardness and wear resistance of the coatings increased with SiC content. The quantity of SiC powder in the coating from a nickel sulfamate solution is larger than that of the Watt nickel solution, because the amount of nickel ions absorbed on the SiC powder in the nickel sulfamate solution is greater than that in the Watt's solution.

• 한국표면공학회지
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• 제25권4호
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• pp.189-206
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• 1992

The effect of activation and electroless nickel plating conditions on contact properties was investi-gated for selective electroless nickel plating of Si wafers in order to obtain an optimum condition of con-tact hole filling. According to RCA prosess, p-type silicon (100) surface was cleaned out and activated. The effects of temperature, DMAB concentration, time, and strirring were investigated for activation of p-type Si(100) surface. The optimal activation condition was 0.2M HF, 1mM PdCl2, 2mM EDTA,$ 70^{\circ}C$, and 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentra-tion, pH, and plating time were studied. The optimal plating condition found was 0.10M NiSO4.H2O, 0.11M Citrate, pH 6.8, $60^{\circ}C$, 30minutes. The contact resistance of films was comparatively low. It took 30minutes to obtain 1$\mu\textrm{m}$ thick film with 8mM DMAB concentration. The film surface roughness was improved with decreasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained at the condition of temperature $60^{\circ}C$ and pH 6.0. The micro-vickers hardness of film was about 800Hv. Plating rate of nickel on the hole pattern was slower than that of nickel on the line pattern.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.829-831
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• 2003

In the present study, the electroless plating method was applied instead of the sputtering as a formation method of metallic bus electrodes. No additional blackening step is needed in this method since this process provides a metallic seed layer with black color by a single step. The parameters which affects color and morphology of the metallic seed layer in the electroless plating solution were investigated

• 한국표면공학회지
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• 제25권5호
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• pp.263-269
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• 1992

To enhancing efficiency of hard chrome plating solution more highly, cathode current efficiency were surveyed connected with hardness of deposits, surface morphology, TEM analysis and corrosion test of anode materials. Efficiency war increased up to 26% values by adding catalyst and two kind of additives. With given bath composition and 6$0^{\circ}C$, 60A/d$\m^2$ electrolosis conditionss bright and micro cracked deposits were well obtained, which showed HV 1000 values. From corrosion tests, anode materials such as Pb-Te (0.02%) and Pb-Ag(1%) showed most anti-corrosive results. Through SEM micrograph observations, ef-fects of additives on levelling, brightness and micro crack properties of hard chrome deposits could be con-firmed. Also, through TEM analysis the fact that deposits from crack free solution or high speed solution were more fine than from sargent solution could be confirmed.

• 마이크로전자및패키징학회지
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• 제22권4호
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• pp.57-63
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• 2015

내산화 특성을 가지는 저가격 도전성 필러 소재로의 적용을 위해 Ag 코팅 Cu 플레이크의 제조를 수행하면서 Cu 플레이크 표면의 산화층 제거를 위한 암모니아수 기반 전처리 용액의 적용법에 따른 영향을 분석해 보았다. 1회 전처리법 적용 시 전처리 시간이 2분을 초과하면서 플레이크 표면에서 홀 형태의 결함들이 생성되었으며, 유지시간에 비례하면서 그 개수와 크기가 점차 증가하였다. 또한 2분간의 전처리 후 Ag 도금 용액을 투입한 결과 도금 반응 중에 결함 발생이 다시 진행되어 플레이크 입자의 손상을 막을 수 없었다. 이에 비해 2분간의 1차 전처리 후 전처리 용액을 제거하고 저농도의 전처리 용액을 투입하여 2차 전처리를 실시하면서 Ag 도금 용액을 투입한 공정법에서는 상기 결함의 발생 빈도를 크게 줄일 수 있었다. 그 결과 1회 전처리법으로 제조된 15 wt% Ag 코팅 Cu 시료의 경우 약 $166^{\circ}C$의 온도부터 산화가 시작되었지만, 2회 전처리법으로 제조된 시료는 약 $224^{\circ}C$에서 산화가 시작되어 월등히 향상된 내산화 특성을 나타내었다.