• 폴리머
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• 제38권2호
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• pp.205-212
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• 2014

본 연구에서는 폴리에테르설폰(polyethersulfone, PES)을 연소배가스에 포함된 수증기를 분리 및 회수하기 위한 고분자 분리막 소재로 사용하기 위해 다양한 물리 화학적 표면개질 방법을 사용하여 PES 평막 표면의 친수성을 향상시키고자 하였다. 균일한 PES 평막을 제조한 후 친수성 향상을 위한 개질 방법으로 산처리, 블렌딩 및 플라즈마 처리를 통해 표면개질을 하였고, 표면 특성을 비교하였다. PES 평막 표면의 특성 변화는 ATR-FTIR, XPS, SEM 및 접촉각 측정을 통해 관찰하였다. 황산을 이용한 산처리 방법과 양친매성 고분자를 이용한 블렌딩 방법에 의해 개질된 PES 평막에서는 접촉각의 변화가 크지 않았다. Ar 플라즈마 처리를 한 경우, 플라스마 처리 시간이 증가함에 따라 PES 표면의 친수성이 크게 증가하는 것을 확인할 수 있었다. 본 결과를 통해 다양한 표면개질 방법 중 플라즈마 방법을 적용하여 PES 표면을 처리하는 것이 PES 막 표면의 친수성 향상에 가장 효과적임을 확인하였다.

• 한국분말재료학회지
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• 제25권2호
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• pp.120-125
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• 2018

Boron nitride nanotubes (BNNTs) are receiving great attention because of their unusual material properties, such as high thermal conductivity, mechanical strength, and electrical resistance. However, high-throughput and high-efficiency synthesis of BNNTs has been hindered due to the high boiling point of boron (${\sim}4000^{\circ}C$) and weak interaction between boron and nitrogen. Although, hydrogen-catalyzed plasma synthesis has shown potential for scalable synthesis of BNNTs, the direct use of $H_2$ gas as a precursor material is not strongly recommended, as it is extremely flammable. In the present study, BNNTs have been synthesized using radio-frequency inductively coupled thermal plasma (RF-ITP) catalyzed by solid-state ammonium chloride ($NH_4Cl$), a safe catalyst materials for BNNT synthesis. Similar to BNNTs synthesized from h-BN (hexagonal boron nitride) + $H_2$, successful fabrication of BNNTs synthesized from $h-BN+NH_4Cl$ is confirmed by their sheet-like properties, FE-SEM images, and XRD analysis. In addition, improved dispersion properties in aqueous solution are found in BNNTs synthesized from $h-BN+NH_4Cl$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.299-299
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• 2013

Indium Tin Oxide (ITO) has widely been used as a transparent conductive oxide (TCE) for photovoltaic devices. Lately, flexibility of ITO becomes an issue as demand of flexible device increases. Several scientists have tried to substitute ITO to different materials such as conductive polymer, graphene, CNT, and metal nanowire because of ITO brittleness. Among the substitute materials, PEDOT:PSS has mostly paid attention because PEDOT:PSS has excellent flexibility and good conductivity. The conductivity of PEDOT:PSS increases up to 1000 S/cm with additives such as DMSO, EG, sorbitol, and so on. In our research group, we introduce a conductive polymer PEDOT:PSS as a buffer layer to improve not only flexibility but also conductivity. As PEDOT:PSS layer forms beneath ITO thin film (20 nm), sheet resistance decreases from $230{\Omega}$/${\Box}$ to $85{\Omega}$/${\Box}$ and crack initiation decreases from 4.5 mm to 3.5 mm as well. We have fabricated organic photovoltaic device and power conversion efficiencies using conventional ITO electrode and ITO/PEDOT:PSS hybrid electrode. The photovoltaic property such as power conversion efficiency for ITO/PEDOT:PSS hybrid electrode is comparable to the value obtained using conventional ITO electrode on glass substrate.

• 한국결정성장학회지
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• 제27권2호
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• pp.75-79
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• 2017

고밀도 플라즈마 식각 및 lift-off 두 가지 공정으로 honeycomb 형상의 Ag-grid 투명전극층을 제작하였고 제조 공법에 따른 광학적 및 전기적 특성을 비교하였다. 플라즈마 식각 조건 선정을 위하여 Ag 박막의 $10CF_4/5Ar$ 유도결합 플라즈마 식각특성을 조사하였다. 비교적 낮은 ICP source power 또는 rf chuck power 영역에서는 power 증가에 따라 Ag 식각속도가 증가하였고, 높은 power 조건에서는 $Ar^+$ 이온 에너지 감소 또는 $Ar^+$ 이온에 의한 F radical 제거로 인해 식각속도가 감소하였다. $10CF_4/5Ar$ 플라즈마 식각 공정에 의해 제작된 Ag-grid 전극층은 lift-off 공정으로 제작된 전극층에 비해 grid 패턴 형상의 왜곡이나 단절이 없는 더 우수한 grid 패턴 전사 효율과 가시광선 영역에서 더 높은 83.3 %(pixel 크기 $30{\mu}m$/선폭 $5{\mu}m$)와 71 %(pixel 크기 $26{\mu}m$/선폭 $8{\mu}m$)의 광투과율을 각각 나타내었다. 반면에 lift-off 공정으로 제작된 Ag-grid 전극층은 플라즈마 식각 공정 시편보다 더 우수한 $2.163{\Omega}/{\square}$(pixel 크기 $26{\mu}m$/선폭 $8{\mu}m$)과 $4.932{\Omega}/{\square}$(pixel 크기 $30{\mu}m$/선폭 $5{\mu}m$)의 면저항 특성을 나타내었다.

• 분석과학
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• 제5권3호
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• pp.319-325
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• 1992

플라즈마 아크 용해법으로 이론밀도비 99% 이상인 Mo-1.17 Ti-0.18 Zr-0.06 C 잉고트를 제조하였다. 이때 산소함량은 초기 830ppm에서 40ppm으로 감소하였다. 열간단조 후, 50% 냉간 압연하여 두께 2mm의 판재를 만들어 시편으로 사용하였다. Mo 합금판재의 재결정거동을 조사하기 위하여 $800{\sim}2100^{\circ}C$ 구간에서 1시간 동안 등시열처리하였고, $1400^{\circ}C$, $1500^{\circ}C$, $1600^{\circ}C$에서 0~10800sec 동안 등온열처리하였다. 완전한 재결정은 Mo의 경우 $1400^{\circ}C$에서 종료되었으나 Mo 합금의 경우 $1700^{\circ}C$에서 완료되었다. 또한 Mo 합금의 50%-1시간 재결정온도는 약 $1500^{\circ}C$로서 Mo에 비하여 $300^{\circ}C$ 이상 증가된 것을 알 수 있었다. Mo 합금의 재결정에 필요한 활성화에너지는 508kJ/mol이었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.456-456
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• 2009

Boron doping on an n-type Si wafer is requisite process for IBC (Interdigitated Back Contact) solar cells. Fiber laser annealing is one of boron doping methods. For the boron doping, uniformly coated or deposited film is highly required. Plasma enhanced chemical vapor deposition (PECVD) method provides a uniform dopant film or layer which can facilitate doping. Because amorphous silicon layer absorption range for the wavelength of fiber laser does not match well for the direct annealing. In this study, to enhance thermal affection on the existing p-a-Si:H layer, a ${\mu}c$-Si:H intrinsic layer was deposited on the p-a-Si:H layer additionally by PECVD. To improve heat transfer rate to the amorphous silicon layer, and as heating both sides and protecting boron eliminating from the amorphous silicon layer. For p-a-Si:H layer with the ratio of $SiH_4$ : $B_2H_6$ : $H_2$ = 30 : 30 : 120, at $200^{\circ}C$, 50 W, 0.2 Torr for 30 minutes, and for ${\mu}c$-Si:H intrinsic layer, $SiH_4$ : $H_2$ = 10 : 300, at $200^{\circ}C$, 30 W, 0.5 Torr for 60 minutes, 2 cm $\times$ 2 cm size wafers were used. In consequence of comparing the results of lifetime measurement and sheet resistance relation, the laser condition set of 20 ~ 27 % of power, 150 ~ 160 kHz, 20 ~ 50 mm/s of marking speed, and $10\;{\sim}\;50 {\mu}m$ spacing with continuous wave mode of scanner lens showed the correlation between lifetime and sheet resistance as $100\;{\Omega}/sq$ and $11.8\;{\mu}s$ vs. $17\;{\Omega}/sq$ and $8.2\;{\mu}s$. Comparing to the singly deposited p-a-Si:H layer case, the additional ${\mu}c$-Si:H layer for doping resulted in no trade-offs, but showed slight improvement of both lifetime and sheet resistance, however sheet resistance might be confined by the additional intrinsic layer. This might come from the ineffective crystallization of amorphous silicon layer. For the additional layer case, lifetime and sheet resistance were measured as $84.8\;{\Omega}/sq$ and $11.09\;{\mu}s$ vs. $79.8\;{\Omega}/sq$ and $11.93\;{\mu}s$. The co-existence of $n^+$layeronthesamesurfaceandeliminating the laser damage should be taken into account for an IBC solar cell structure. Heavily doped uniform boron layer by fiber laser brings not only basic and essential conditions for the beginning step of IBC solar cell fabrication processes, but also the controllable doping concentration and depth that can be established according to the deposition conditions of layers.

• 대한금속재료학회지
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• 제46권11호
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• pp.762-769
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• 2008

Hydrogenated amorphous silicon(a-Si : H) layers, 120 nm and 50 nm in thickness, were deposited on 200 $nm-SiO_2$/single-Si substrates by inductively coupled plasma chemical vapor deposition(ICP-CVD). Subsequently, 30 nm-Ni layers were deposited by E-beam evaporation. Finally, 30 nm-Ni/120 nm a-Si : H/200 $nm-SiO_2$/single-Si and 30 nm-Ni/50 nm a-Si:H/200 $nm-SiO_2$/single-Si were prepared. The prepared samples were annealed by rapid thermal annealing(RTA) from $200^{\circ}C$ to $500^{\circ}C$ in $50^{\circ}C$ increments for 30 minute. A four-point tester, high resolution X-ray diffraction(HRXRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), and scanning probe microscopy(SPM) were used to examine the sheet resistance, phase transformation, in-plane microstructure, cross-sectional microstructure, and surface roughness, respectively. The nickel silicide on the 120 nm a-Si:H substrate showed high sheet resistance($470{\Omega}/{\Box}$) at T(temperature) < $450^{\circ}C$ and low sheet resistance ($70{\Omega}/{\Box}$) at T > $450^{\circ}C$. The high and low resistive regions contained ${\zeta}-Ni_2Si$ and NiSi, respectively. In case of microstructure showed mixed phase of nickel silicide and a-Si:H on the residual a-Si:H layer at T < $450^{\circ}C$ but no mixed phase and a residual a-Si:H layer at T > $450^{\circ}C$. The surface roughness matched the phase transformation according to the silicidation temperature. The nickel silicide on the 50 nm a-Si:H substrate had high sheet resistance(${\sim}1k{\Omega}/{\Box}$) at T < $400^{\circ}C$ and low sheet resistance ($100{\Omega}/{\Box}$) at T > $400^{\circ}C$. This was attributed to the formation of ${\delta}-Ni_2Si$ at T > $400^{\circ}C$ regardless of the siliciation temperature. An examination of the microstructure showed a region of nickel silicide at T < $400^{\circ}C$ that consisted of a mixed phase of nickel silicide and a-Si:H without a residual a-Si:H layer. The region at T > $400^{\circ}C$ showed crystalline nickel silicide without a mixed phase. The surface roughness remained constant regardless of the silicidation temperature. Our results suggest that a 50 nm a-Si:H nickel silicide layer is advantageous of the active layer of a thin film transistor(TFT) when applying a nano-thick layer with a constant sheet resistance, surface roughness, and ${\delta}-Ni_2Si$ temperatures > $400^{\circ}C$.

• 전자공학회논문지A
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• 제31A권5호
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• pp.106-112
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• 1994

We have developed a large area ion shower doping system with an RF plasma ion source. The ion current density (i.e., doping concentration) increases with RF power and acceleration voltage. Using this technique, we investigated the optimum condition for ion doping of phosphorus in a-Si:H and poly-Si films. The optimum acceleration voltage and doping time are 6KV and 90sec, respectively, in a-Si:H films. Under this condition the electrical conductivity of ion-doped a-Si:H film is obtained ~10$^{-3}$/cm at room temperature. The sheet resistance decreases witnh acceleration voltage in ion-doped poly-Si, and a heavily-doped layer with a sheet resistance of 920$\Omega$/ㅁ is obtained by using ion doping and subsequent activation.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2003년도 추계학술발표대회 개요집
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• pp.18-20
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• 2003

Optimal processing and system to produce the laser welded tube for one body formed bumper beam are studied. The calculated size of tube is a thickness of 1.4mm, diameter of 105.4mm and length of 2000mm. The tube is shaped from cool rolled high strength steel sheet(tensile strength: 60kgf/$\textrm{mm}^2$ grade). Two roll bending method is the optimal tube shaping process compared to UO-bending, bending on press brake, multi-step continuous roll forming and 3 roll bending methods. Weld quality monitoring and seam tracking along the butt-joint lengthwise to the tube axis are also studied. The longitudinal butt-joint is welded by the $CO_2$ laser welding system equipped with a seam tracker and plasma sensor. The constructed $CO_2$ laser tube welding system can be used for the precision seam tracking and the real-time monitoring of weld quality. Finally, the obtained laser welded tube can be used for one-body formed automobile bumper beam.

• 한국전기전자재료학회논문지
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• 제17권10호
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• pp.1107-1113
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• 2004

Dry film method for large size of PDP(Plasma Display Panel) module has been actively investigated. This method for lead-free transparent dielectric formation depends on green sheet technology. By adjusting the composition of transparent dielectric powders and organics, uniformly dispersed slurry was fabricated, Viscosity of the slurry exhibited pseudoplastic behavior for tape casting, Cast green sheets were tested under tensile condition at room temperature. It was found that the increase in transparent dielectric powder and binder ratio leads to decrease in strain to failure of green sheets from 120 % to 34 % and from 255 % to 4 %, respectively. Tensile strength of green sheets decreased abruptly with increase of transparent dielectric powder ratio, with minimum at 0.13 MPa. On the other hand, tensile strength increased continuously from 0.1 MPa to 2.4 MPa with increase of binder ratio. The green sheets were attached on the glass substrate and heated by following firing schedule. As a result, the best result was obtained when fired at 580 $^{\circ}C$ for 15 min and had transmittance of 78 % in visible range 550 nm.