• 제목/요약/키워드: nanoelectronic

검색결과 29건 처리시간 0.025초

질화붕소 나노피포드에 기반한 나노분자 메모리 시스템에 관한 연구 (Molecular Shuttle Memory System Based on Boron-Nitride Nanopeapod)

  • 변기량;강정원;최원영;황호정
    • 한국진공학회지
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    • 제14권1호
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    • pp.40-48
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    • 2005
  • 분자 위치제어 메모리 시스템에 대하여 고전적인 분자동역학을 이용하여 결합에너지 및 다양한 외부전기장의 형태에 따른 셔틀 풀러렌 동작에 관하여 연구하였다. 단일 나노피포드 형(single-nanopeapod type)은 질화붕소 나노튜브(boron-nitride nanotube)속에 세 개의 엔도풀러렌(endo-fullerene)과 양쪽 끝에 구리 전극이 채워져 있는 구조를 갖고 있는 구조를 갖고 있다. 결론적으로, 분자동역학 시뮬레이션 결과로부터 이 나노메모리 시스템은 비휘발성임을 알 수 있었다. 안정적인 bit 변화를 위해서는 단일 나노피포드 형은 0.1 eV/Å 외부전기장이 필요로 함을 알 수 있었다.

탑 게이트 탄소나노튜브 트랜지스터 특성 연구 (Properties of CNT field effect transistors using top gate electrodes)

  • 박용욱;윤석진
    • 센서학회지
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    • 제16권4호
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    • pp.313-318
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    • 2007
  • Single-wall carbon nanotube field-effect transistors (SWCNT FETs) of top gate structure were fabricated in a conventional metal-oxide-semiconductor field effect transistor (MOSFET) with gate electrodes above the conduction channel separated from the channel by a thin $SiO_{2}$ layer. The carbon nanotubes (CNTs) directly grown using thin Fe film as catalyst by thermal chemical vapor deposition (CVD). These top gate devices exhibit good electrical characteristics, including steep subthreshold slope and high conductance at low gate voltages. Our experiments show that CNTFETs may be competitive with Si MOSFET for future nanoelectronic applications.

Challenges for Nanoscale MOSFETs and Emerging Nanoelectronics

  • Kim, Yong-Bin
    • Transactions on Electrical and Electronic Materials
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    • 제11권3호
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    • pp.93-105
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    • 2010
  • Complementary metal-oxide-semiconductor (CMOS) technology scaling has been a main key for continuous progress in silicon-based semiconductor industry over the past three decades. However, as the technology scaling enters nanometer regime, CMOS devices are facing many serious problems such as increased leakage currents, difficulty on increase of on-current, large parameter variations, low reliability and yield, increase in manufacturing cost, and etc. To sustain the historical improvements, various innovations in CMOS materials and device structures have been researched and introduced. In parallel with those researches, various new nanoelectronic devices, so called "Beyond CMOS Devices," are actively being investigated and researched to supplement or possibly replace ultimately scaled conventional CMOS devices. While those nanoelectronic devices offer ultra-high density system integration, they are still in a premature stage having many critical issues such as high variations and deteriorated reliability. The practical realization of those promising technologies requires extensive researches from device to system architecture level. In this paper, the current researches and challenges on nanoelectronics are reviewed and critical tasks are summarized from device level to circuit design/CAD domain to better prepare for the forthcoming technologies.

마이크로컨택 프린팅을 이용한 나노와이어 패터닝 기술 개발 (Development of Nanowire Patterning Process Using Microcontact Printing)

  • 조성진
    • 한국전기전자재료학회논문지
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    • 제29권9호
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    • pp.571-575
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    • 2016
  • Recently, there has been much focus on the controlled alignment and patterning process of nanowires for nanoelectronic devices. A simple and effective method for patterning of highly aligned nanowires using a microcontact printing technique is demonstrated. In this method, nanowires are first directionally aligned by contact printing, following which line and space micropatterns of nanowire arrays are accomplished by microcontact printing with a micro patterned NOA mold.

Thermal Chemical Vapor Deposition of Graphene Layers

  • Kwon, Kyoeng-Woo;Do, Woo-Ri;Hwang, Jinha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.644-644
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    • 2013
  • Graphene is a two-dimensional sp2 layer material. Despite the short history in the empirical synthesis of the graphene layers, the academic/industrial unique features have brought highly significant interest in research and development related to graphene-related materials. In particular, the electrical and optical performances have been targeted towards pre-existing microelectronicand emerging nanoelectronic applications. The graphene synthesis relies on a variety of processing factors, such as temperature, pressure, and gas ratios involving H2, CH4, and Ar, in addition to the inherent selection of copper substrates. The current work places its emphasis on the role of experimental factors in growing graphene thin films. The thermally-grown graphene layers are characterized using physical/chemical analyses, i.e., four point resistance measurements, Raman spectroscopy, and UV-Visible spectrophotometry. Ultimately, an optimization strategy is proposed in growing high-quality graphene layers well-controlled through empirical factors.

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An approach to model the temperature effects on I-V characteristics of CNTFETs

  • Marani, Roberto;Perri, Anna G.
    • Advances in nano research
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    • 제5권1호
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    • pp.61-67
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    • 2017
  • A semi-empirical approach to model the temperature effects on I-V characteristics of Carbon Nanotube Field Effect Transistors (CNTFETs) is proposed. The model includes two thermal parameters describing CNTFET behaviour in terms of saturation drain current and threshold voltage, whose values are extracted from the simulated and trans-characteristics of the device in different temperature conditions. Our results are compared with those of a numerical model online available, obtaining I-V characteristics comparable but with a lower CPU calculation time.

Application of Diameter Controlled ZnO Nanowire Field Effect Transistors

  • 이상렬
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.19.2-19.2
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    • 2011
  • ZnO nanowires have been fabricated by vapor-liquid-solidification with hot-walled pulsed laser deposition method. The diameter of ZnO nanowire has been systematically controlled simply by changing the thickness of Au catalyst. Field effect transistors with different diameter have been fabricated by using photolithography and e-beam lithography. The threshold voltage of ZnO nanowire FET showed enhanced mode and depleted mode depending on the diameter of ZnO nanowires. This is mainly due to the change of the carrier concentration depending on the size of nanowires. We have fabricated ZnO nanowire inverters using nanowire FETs. This simple method to fabricate ZnO nano-inverter will be useful to open the possibility of ZnO nanoelectronic applications.

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나노전자소자기술 (Review of the Recent Research on Nanoelectronic Devices)

  • 장문규;김약연;최철종;전명심;박병철;이성재
    • 전자통신동향분석
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    • 제20권5호통권95호
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    • pp.28-45
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    • 2005
  • 무어의 법칙을 근간으로 하는 전계효과 트랜지스터는 매 18개월마다 0.7배씩의 성공적인 소형화를 거듭하여 최근에는 50nm 크기로 구성된 약 1억 개의 트랜지스터가 집적된 칩을 생산하고 있다. 그러나 트랜지스터의 크기가 50nm 이하로 줄어들면서는 단순한 소형화 과정은 근본적인 물리적인 한계에 접근하게 되었다. 특히 게이트 절연막의최소 두께는 트랜지스터의 소형화에 가장 직접적인 중요한 요소이나, 실리콘 산화막의 두께가 2nm 이하가 되면서 게이트 절연막을 집적 터널링하는 전자에 의한 누설전류의 급격한 증가로 인하여 그 사용이 어려워지고 있는 추세이다. 따라서 본 논문에서는 트랜지스터의 소형화에 악영향을 미치는 물리적인 한계요소에 대하여 살펴보고, 이러한 소형화의 한계를 뛰어넘기 위한 노력의 일환으로 연구되고 있는 이중게이트 구조의 트랜지스터, 쇼트키 트랜지스터, 나노선을 이용한 트랜지스터 및 분자소자 등의 새로운 소자구도에 대하여 살펴보고자 한다.

Growth and Structural Characterization of Single Layer Dichalcogenide $MoS_2$

  • Hwang, Jae-Seok;Kang, Dae-Joon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.575-575
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    • 2012
  • Synthesis of novel two dimensional materials has gained tremendous attention recently as they are considered as alternative materials for replacing graphene that suffers from a lack of bandgap, a property that is essential for many applications. Single layer molybdenum disulfide ($MoS_2$) has a direct bandgap (1.8eV) that is promising for use in next-generation optoelectronics and energy harvesting devices. We have successfully grown high quality single layer $MoS_2$ by a facile vapor-solid transport route. As-grown single layer $MoS_2$ was carefully characterized by using X-ray diffraction, Raman spectroscopy, field emission scanning electron microscopy and electrical transport measurement. The results indicate that a high quality single layer $MoS_2$ can be successfully grown on silicon substrate. This may open up great opportunities for the exploration of novel nanoelectronic devices.

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Low Work Function and Sharp Field Emitter Arrays by Transfer Mold Fabrication Method

  • Nakamoto, Masayuki;Sato, Genta;Shiratori, Kohji
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.1049-1052
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    • 2007
  • Extremely sharp and uniform Transfer Mold FEAs with thin film low work function TiN emitter material have been fabricated by controlling the thickness of the coated emitter materials to realize high efficient, high reliable and low-cost vacuum nanoelectronic devices..Their tip radii are 8.3-13.8 nm. Turn-on electric fields of the Ni FEAs and TiN-FEAs resulted in the low electric field values of $31.6\;V/{\mu}m$ and $44.2V/{\mu}m$,respectively, at the short emitter/anode distance: less than $30\;{\mu}m$, which are lower than those of conventional FE As such as Spindt type FEAs and carbon nan otube FEAs The Transfer Metal Mold fabrication method is one of the best methods of changing emit ter materials with sharp and uniform emit ter shapes.

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