• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1677-1679
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• 2007

Thickness dependent morphology of ZnO films was studied, and ZnO can be intentionally grown into amorphous phase by reducing the thickness. The top-gate amorphous ZnO TTFTs with rather high field-effect mobilities and on/off current ratios were effectively fabricated.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1645-1648
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• 2006

We have developed a CMOS LTPS process, which requires only five photolithographic masks and only one ion doping step. Single TFTs, inverters, ring oscillators and shift registers were fabricated. N- and p-channel devices reached field effect mobilities of $173cm^2/Vs$ and $47cm^2/Vs$, respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.717-720
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• 2002

In this work, the electrical characteristics of organic thin film transistors with the surface-treated organic gate insulators have been studied. For the surface treatment, the simple rubbing technique was used. The field effect mobilities of the devices with PVP gate insulator was improved about four times as high as those of TFTs without the insulator surface treatment.

• Korean Journal of Microbiology
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• v.38 no.1
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• pp.54-56
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• 2002

Induction of laccase isozymes under acidic stresses were determined in Trametes versicolor, Pleurotus ostreatus and Ganoderma lucidum isolated in Korea, and in Lentinus squarrosulrs isolated in Thai. When cultures of these fungi were transferred to acidic liquid media (pH 3.0-4.0), the activities of secreted extralcellular laccases were increased 60% and 400% in T. versicolor and G. lucidum respectively. However, there was no such induction in L. squarrosulus or P. ostreatus. In L. squarrosulus, different laccase isozymes in the electrophoretic mobilities were induced under acidic conditions.

• Journal of Information Display
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• v.8 no.1
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• pp.1-5
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• 2007

We have developed a CMOS LTPS process which requires only five photolithographic masks and only one ion doping step. Drain/Source areas of NMOS TFTs were formed by PECVD deposition of a highly doped precursor layer while PMOS contact areas were defined by ion implantation. Single TFTs, inverters, ring oscillators and shift registers were fabricated. N and p-channel devices reached field effect mobilities of $173cm^2$/Vs and $47cm^2$/Vs, respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.310-311
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• 2009

New X-shaped crystalline molecules have been synthesized through various coupling reactions and their electronic properties were investigated. They exhibit good solubility in common organic solvents and good self-film forming properties. They are intrinsically crystalline as they exhibit well-defined X-ray diffraction patterns from uniform and preferred orientations of molecules. They also exhibited high field effect mobilities in thin film transistor (TFT) and good device performances.

• Journal of Magnetics
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• v.4 no.4
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• pp.111-114
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• 1999

Numerical calculation for temperature dependence of galvanomagnetic properties of thin bismuth films is pursued. The quasi-two dimensional system is treated in the perturbation formalism of previous study, where realistic screened potential due to impurity is assumed to be the only scattering channel. The potential is separated into pure two dimensional part and the remaining presumed perturbation part. Relaxation time and mobilities for both electron and hole are evaluated, then temperature dependence of the Hall coefficient and magnetoresistance is obtained. The broad minimum of magnetoresistnace is manifested, and the interpretation under the kinetic theory is made. Thickness dependence of the quantities are also shown, which are in good agreement with the expected quantum size effect.

• Transactions of the Korean Society for Noise and Vibration Engineering
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• v.23 no.6
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• pp.512-519
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• 2013

It is important to understand the vibrating behavior of plate structures for its many engineering applications. In this study, the vibration characteristics of strip plates that have finite width and infinite length are investigated theoretically and numerically. The waveguide finite element(WFE) approach, which is an effective tool for studying waveguide structures, is used in this study. The WFE method requires only a cross-sectional finite element model, and uses theoretical harmonic solutions to assess wave propagation along the longitudinal direction. First, WFE results for a simple strip plate are compared with the theoretical results(i.e., dispersion diagrams and point mobilities) to validate the numerical model. Then, in the numerical analysis, different numbers of longitudinal stiffeners are included in the plate model to investigate the effects of stiffeners in terms of the dispersion curves and mobilities. Finally, the dispersion curves of a stiffened double plate are obtained to examine the characteristics of its wave propagation.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.12
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• pp.989-995
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• 2000

G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$ is a very promising material for the high-speed device due to the fact that electron and hole mobilities for the strained G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$ are greatly enhanced. Because G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$ has a direct band gap for the proper combination of x and y, it can be applied to the optoelectronic device. Therefore, the study of the electrical property for G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$(001) with a direct energy gap is needed. G $e_{1-x}$ S $n_{x}$ layer can not be grown thickly due to the large difference of lattice constants. This fact prefers the structure of the device where electrons and holes move in the plane direction. The transverse mobilities of electron and hole for G $e_{0.8}$S $n_{0.2}$Ge(001) are 2~3 times larger than those for Ge/Ge/ sub0.8/S $n_{0.2}$(001). Therefore, G $e_{0.8}$S $n_{0.2}$Ge(001) is expected to be better than Ge/G $e_{0.8}$S $n_{0.2}$(001) for the development of the high-speed device.h-speed device.device.h-speed device. device.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.42 no.3 s.333
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• pp.9-16
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• 2005

The mobility in strained Si inversion layer on $Si_{1-x}Ge_x$ is calculated considering a quantum effect(subband energy and wavefunction) in inversion layer and relaxation time approximation. The quantum effect in inversion layer is obtained by using self-consistent calculation of $Schr\ddot{o}dinger$ and Poisson equations. For the relaxation time, intravalley and intervalley scatterings are considered. The result shows that the reason for the enhancement in mobility as Ge mole fraction increases is that the electron mobility in 2-폴드 valleys is about 3 times higher than that of 4-폴드 valleys and most electrons are located in 2-폴드 valleys as Ge mole fraction increases. Meanwhile, for the phonon-limited mobility the fitting to experimental data, Coulomb and surface roughness mobilities are included in total mobility, Deformation potentials are selected for the calculated effective field, temperature, and Ge mole fraction dependent mobilities to be fitted to experimental data, and then upgraded data can be obtained by considering nonparabolicity in Si band structure.