• Journal of the Korean Society for Precision Engineering
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• v.28 no.8
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• pp.966-974
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• 2011

The use of ion beams in the micro/nano scale is greatly increased by technology development. Especially, focused ion beams (FIBs) have a great potential to fabricate the device in sub micro scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the redeposition effect due to the sputtered atoms. In this research, we demonstrate a way which can be used to fabricate mold structures on a silicon substrate using FIBs. For the purpose of the demonstration, two essential subjects are necessary. One is that focused ion beam diameter as well as shape has to be measured and verified. The other one is that the accurate rotational symmetric model of ion-solid interaction has to be mathematically developed. We apply those two, measured beam diameter and mathematical model, to fabricate optical lenses mold on silicon. The characteristics of silicon mold fabrication will be discussed as well as simulation results.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.2
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• pp.70-77
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• 2007

The application of focused ion beam(FIB) technology has been broadened in the fabrication of nanoscale regime. The extended application of FIB is dependent on complicated reciprocal relation of operating parameters. It is necessary for successful and efficient modifications on the surface of silicon substrate. The primary effect by Gaussian beam intensity is significantly shown from various aperture size, accelerating voltage, and beam current. Also, the secondary effect of other process factors - dwell time, pixel interval, scan mode, and pattern size has affected to etching results. For the process analysis, influence of the secondary factors on FIB micromilling process is examined with respect to sputtering depth during the milling process in silicon material. The results are analyzed by the ratio of signal to noise obtained using design of experiment in each parameter.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1194-1197
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• 2005

Micro nozzle is employed as a dynamic passive valve in micro fluidic devices. Micro nozzle array is used in micro droplet generation in bio-medical applications and propulsion device for actuating satellite and aerospace ship in vacuum environments. Aperture angle and the channel length of the micro nozzle affect its retification efficiency, and thus it is needed to produce micro nozzle precisely. MEMS process has a limit on making a micro nozzle with high-aspect ratio. Reactive ion etching process can make high-aspect ratio structure, but it is difficult to make the complex shape. Focused ion beam deposition has advantage in machining of three-dimensional complex structures of sub-micron size. Moreover, it is possible to monitor machining process and to correct defected part at simultaneously. In this study, focused ion beam deposition was applied to micro nozzle production.

• Tribology and Lubricants
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• v.26 no.2
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• pp.122-128
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• 2010

Focused Ion Beam (FIB) has been used for site-specific TEM sample preparation and small scale fabrication. Moreover, analysis on the surface microstructure and phase distribution is possible by ion channeling contrast of FIB with high resolution. This paper describes FIB applications and deformed surface structure induced by sliding. The effect of FIB process on the surface damage was explored as well. The sliding experiments were conducted using high purity aluminum and OFHC(Oxygen-Free High Conductivity) copper. The counterpart material was steel. Pin-on-disk, Rotational Barrel Gas Gun and Explosively Driven Friction Tester were used for the sliding experiments in order to investigate the velocity effect on the microstructural change. From the FIB analysis, it is revealed that ion channeling contrast of FIB has better resolution than SEM and the tribolayer is composed of nanocrystalline structures. And the thickness of tribolayer was constant regardless of sliding velocities.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.326-329
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• 2005

As a flexible method to fabricate sub-micrometer patterns, Focused Ion Beam (FIB) instrument and Self-Assembled Monolayer (SAM) resist are introduced in this work. FIB instrument is known to be a very precise processing machine that is able to fabricate micro-scale structures or patterns, and SAM is known as a good etch resistance resist material. If SAM is applied as a resist in FIB processing fur fabricating nano-scale patterns, there will be much benefit. For instance, low energy ion beam is only needed for machining SAM material selectively, since ultra thin SAM is very sensitive to $Ga^+$ ion beam irradiation. Also, minimized beam spot radius (sub-tens nanometer) can be applied to FIB processing. With the ultimate goal of optimizing nano-scale pattern fabrication process, interaction between SAM coated specimen and $Ga^+$ ion dose during FIB processing was observed. From the experimental results, adequate ion dose for machining SAM material was identified.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.8
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• pp.84-90
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• 2010

In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to increase the machining resolution at high current. Slit mask is utilized to block the part of beam and transmit only high intensity portion. A nano manipulator is utilized to handle the silt mask. Geometrical analysis on fabricated profile through silt mask was conducted. By utilizing proposed method, improvement of machining resolution was achieved.

• Applied Microscopy
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• v.45 no.4
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• pp.208-213
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• 2015

Nanomanipulators installed in focused ion beam (FIB), which is used in the lift-out of lamella when preparing transmission electron microscopy specimens, have recently been employed for electrical resistance measurements, tensile and compression tests, and in situ reactions. During the pick-up process of a single nanowire (NW), there are crucial problems such as Pt, C and Ga contaminations, damage by ion beam, and adhesion force by electrostatic attraction and residual solvent. On the other hand, many empirical techniques should be considered for successful pick-up process, because NWs have the diverse size, shape, and angle on the growth substrate. The most important one in the in-situ precedence, therefore, is to select the optimum pick-up process of a single NW. Here we provide the advanced methodologies when manipulating NWs for in-situ mechanical and electrical measurements in FIB.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.12 s.189
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• pp.122-127
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• 2006

This paper reports on the development of carbon nanotube tip modified with focused ion beam(FIB). We used an electric field which causes dielectrophoresis, to align and deposit CNTs on a metal-coated canning Probe Microscope (SPM) tip. Using the CNT attached SPM tip, we have obtained an enhanced resolution and wear property compared to that from the bare silicon tip through the scanning of the surface of the bio materials. The carbon nanotube tip was aligned toward the source of the ion beam allowing their orientation to be changed at precise angles. By this technique, metal coated carbon nanotube tips that are several micrometer in length are prepared for SPM.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1993.11a
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• pp.134-136
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• 1993

Microelectronic fabrication technology .is based on the use of lithsgraphy to create small linewidths and patterns that make up ULSI. In previous papers, we discussed the theoretically calculated values such as ion range, ion concentration,ion transmission coefficient and the defocused ion beam-induced characteristics in a-Se$_{75}$Ge$_{25}$. In this paper, the typical Monte Carlo (MC) simulation results and p개cedures for the focused ion beam lithography were presented. The interaction and scattering of ions with the resist depend on the beam energy, impact parameter arid resist parameters. For ion exposure simulations, the quantity of interest is the spatial distribution of energy deposited by ions in the resist due to interaction phenomena with resist ions.s.s.

• Applied Science and Convergence Technology
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• v.25 no.5
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• pp.92-97
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• 2016

Surface erosion using focused ion beam irradiation is the most promising technology for the realization of micro/nanofabrication. However, accurate fabrication of predefined structures is still challenging. This article introduces a single step surface driving method to fabricated predefined curved structures. The previously reported multi step surface driving method (MSDM) has been modified so that a single ion dose profile can be used instead of multiple ion dose profiles. Experimental realization of the method is presented with the fabrication of predefined curved surfaces as well as reference to surface propagation theory. For the purpose of verification, simulations are performed on the basis of a sound mathematical model.