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The Characteristics of Focused Ion Beam Utilized Silicon Mold Fabrication on the Micro/Nano Scale  

Kim, Heung-Bae (Korea Institute of Industrial Technology, KITECH)
Noh, Sang-Lai (Division of Aerospace, Automobile and mechanical engineering, Dong Seoul University)
Publication Information
Journal of the Korean Society for Precision Engineering / v.28, no.8, 2011 , pp. 966-974 More about this Journal
Abstract
The use of ion beams in the micro/nano scale is greatly increased by technology development. Especially, focused ion beams (FIBs) have a great potential to fabricate the device in sub micro scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the redeposition effect due to the sputtered atoms. In this research, we demonstrate a way which can be used to fabricate mold structures on a silicon substrate using FIBs. For the purpose of the demonstration, two essential subjects are necessary. One is that focused ion beam diameter as well as shape has to be measured and verified. The other one is that the accurate rotational symmetric model of ion-solid interaction has to be mathematically developed. We apply those two, measured beam diameter and mathematical model, to fabricate optical lenses mold on silicon. The characteristics of silicon mold fabrication will be discussed as well as simulation results.
Keywords
Focused Ion Beam; Micro/Nano Fabrication; Micro Mold; Computer Simulation;
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Times Cited By KSCI : 1  (Citation Analysis)
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