• Title/Summary/Keyword: floating body effect

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CMOS Binary Image Sensor Using Double-Tail Comparator with High-Speed and Low-Power Consumption

  • Kwen, Hyeunwoo;Jang, Junyoung;Choi, Pyung;Shin, Jang-Kyoo
    • Journal of Sensor Science and Technology
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    • v.30 no.2
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    • pp.82-87
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    • 2021
  • In this paper, we propose a high-speed, low-power complementary metal-oxide semiconductor (CMOS) binary image sensor featuring a gate/body-tied (GBT) p-channel metal-oxide-semiconductor field-effect transistor (PMOSFET)-type photodetector based on a double-tail comparator. The GBT photodetector forms a structure in which the floating gate (n+ polysilicon) and body of the PMOSFET are tied, and amplifies the photocurrent generated by incident light. The double-tail comparator compares the output signal of a pixel against a reference voltage and returns a binary signal, and it exhibits improved power consumption and processing speed compared with those of a conventional two-stage comparator. The proposed sensor has the advantages of a high signal processing speed and low power consumption. The proposed CMOS binary image sensor was designed and fabricated using a standard 0.18 ㎛ CMOS process.

Effect Analysis for Inequality of Basic Grounding in Bimodal Tram (바이모달 트램의 기준접지 불균등전위에 따른 영향분석)

  • Lee, Kang-Won;Mok, Jai-Kyun;Jang, Se-Ky
    • Proceedings of the KSR Conference
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    • 2011.05a
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    • pp.78-81
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    • 2011
  • Generally, vehicle is insulated from the earth by rubber tire which is intrinsically the insulation material. The electrical ground of vehicle was floated in the sense of electric potential over the electric power sources. First of all, the floated electrical ground of vehicle should be equipotentially connected with the (-) line of electrical equipment. Bimodal tram has the different kinds of electric system. They must be kept insulated to each other electrically. When there is some unbalanced event or connection between them, it will invoke some errors or breakdown to electrical devices including sensors and actuators. This paper has investigated the floating ground effect of bimodal tram built with composite body and shown the effect according to the unbalanced ground of vehicle and the connection between different electric systems.

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A Study on the Current Kink Effect in NMOSFET SOI Device with the Varying Gate Oxide Thickness (NMOSFET SOI 소자에서 부분적 게이트 산화막 두께 변화에 의한 돌연 전류 효과 고찰)

  • 한명석;이충근홍신남
    • Proceedings of the IEEK Conference
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    • 1998.10a
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    • pp.545-548
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    • 1998
  • Thin film SOI(Silicon-On-Insulator) devices exhibit floating body effect. In this paper, SOI NMOSFET is proposed to solve this problem. Some part of gate oxide was considered to be 30nm~80nm thicker than the other normal gate oxide and simulated with TSUPREM-4. The I-V characteristics were simulated with 2D MEDICI mesh. Since part of gate oxide has different oxide thickness in proposed device, the gate electric field strength is not the same throught the gate and consequently the reduction of current kink effect is occurred.

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Transient Surge Motion of A Turret Moored Body in Random Waves (불규칙파 중에 Turret 계류된 부유체의 천이운동해석)

  • 김동준
    • Journal of Korean Society of Coastal and Ocean Engineers
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    • v.3 no.2
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    • pp.92-99
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    • 1991
  • A moored body in the sea is subjected to second-order wave forces as well as to linear oscillatory ones. The second-order farces contain slowly-varying components, of which the characteristic frequency can be as low as the natural frequency of horizontal motions of the moored body. As a consequence, the slowly-varying force can excite unexpectedly large horizontal excursion of the body, which may cause a serious damage on the mooring system. In design analysis of Turret-type mooring system which is one of the interesting mooring systems for a floating body. the slowly-varying drift forces and the transient motion of the system during weathervaning are very important. In this paper the slowly-varying drift forces were calculated by using the Quadratic Transfer Function with considering the second order free-wave contributions. Additionaly the transient surge motion of the moored body was simulated with including the roll of the time-memory effect. In this simulation the spring constant of the spread Turret mooring system is updated at every time step for considering the nonlinear effect.

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Adjusting the Sensitivity of an Active Pixel Sensor Using a Gate/Body-Tied P-Channel Metal-Oxide Semiconductor Field-Effect Transistor-Type Photodetector With a Transfer Gate (전송 게이트가 내장된 Gate/Body-Tied P-Channel Metal-Oxide Semiconductor Field-Effect Transistor 구조 광 검출기를 이용한 감도 가변형 능동 화소 센서)

  • Jang, Juneyoung;Lee, Jewon;Kwen, Hyeunwoo;Seo, Sang-Ho;Choi, Pyung;Shin, Jang-Kyoo
    • Journal of Sensor Science and Technology
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    • v.30 no.2
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    • pp.114-118
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    • 2021
  • In this study, the sensitivity of an active pixel sensor (APS) was adjusted by employing a gate/body-tied (GBT) p-channel metal-oxide semiconductor field-effect transistor (PMOSFET)-type photodetector with a transfer gate. A GBT PMOSFET-type photodetector can amplify the photocurrent generated by light. Consequently, APSs that incorporate GBT PMOSFET-type photodetectors are more sensitive than those APSs that are based on p-n junctions. In this study, a transfer gate was added to the conventional GBT PMOSFET-type photodetector. Such a photodetector can adjust the sensitivity of the APS by controlling the amount of charge transmitted from the drain to the floating diffusion node according to the voltage of the transfer gate. The results obtained from conducted simulations and measurements corroborate that, the sensitivity of an APS, which incorporates a GBT PMOSFET-type photodetector with a built-in transfer gate, can be adjusted according to the voltage of the transfer gate. Furthermore, the chip was fabricated by employing the standard 0.35 ㎛ complementary metal-oxide semiconductor (CMOS) technology, and the variable sensitivity of the APS was thereby experimentally verified.

Memory Characteristics of 1T-DRAM Cell by Channel Structure (채널 구조에 따른 1T-DRAM Cell의 메모리 특성)

  • Jang, Ki-Hyun;Jung, Seung-Min;Park, Jin-Kwon;Cho, Won-Ju
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.2
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    • pp.96-99
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    • 2012
  • We fabricated fully depleted (FD) SOI-based 1T-DRAM cells with planar channel or recessed channel and the electrical characteristics were investigated. In particular, the dependence of memory operating mode on the channel structure of 1T-DRAM cells was evaluated. As a result, the gate induced drain leakage current (GIDL) mode showed a better memory property for planar type 1T-DRAM. On the other hand, the impact ionization (II) mode is more effective for recessed type.

Trend and issues of the bulk FinFET (벌크 FinFET의 기술 동향 및 이슈)

  • Lee, Jong-Ho;Choi, Kyu-Bong
    • Vacuum Magazine
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    • v.3 no.1
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    • pp.16-21
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    • 2016
  • FinFETs are able to be scaled down to 22 nm and beyond while suppressing effectively short channel effect, and have superior performance compared to 2-dimensional (2-D) MOSFETs. Bulk FinFETs are built on bulk Si wafers which have less defect density and lower cost than SOI(Silicon-On-Insulator) wafers. In contrast to SOI FinFETs, bulk FinFETs have no floating body effect and better heat transfer rate to the substrate while keeping nearly the same scalability. The bulk FinFET has been developed at 14 nm technology node, and applied in mass production of AP and CPU since 2015. In the development of the bulk FinFETs at 10 nm and beyond, self-heating effects (SHE) is becoming important. Accurate control of device geometry and threshold voltage between devices is also important. The random telegraph noise (RTN) would be problematic in scaled FinFET which has narrow fin width and small fin height.

High Quality Vertical Silicon Channel by Laser-Induced Epitaxial Growth for Nanoscale Memory Integration

  • Son, Yong-Hoon;Baik, Seung Jae;Kang, Myounggon;Hwang, Kihyun;Yoon, Euijoon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.2
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    • pp.169-174
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    • 2014
  • As a versatile processing method for nanoscale memory integration, laser-induced epitaxial growth is proposed for the fabrication of vertical Si channel (VSC) transistor. The fabricated VSC transistor with 80 nm gate length and 130 nm pillar diameter exhibited field effect mobility of $300cm^2/Vs$, which guarantees "device quality". In addition, we have shown that this VSC transistor provides memory operations with a memory window of 700 mV, and moreover, the memory window further increases by employing charge trap dielectrics in our VSC transistor. Our proposed processing method and device structure would provide a promising route for the further scaling of state-of-the-art memory technology.

A study of 1T-DRAM on thin film transistor (박막트랜지스터를 이용한 1T-DRAM에 관한 연구)

  • Kim, Min-Soo;Jung, Seung-Min;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.345-345
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    • 2010
  • 1T-DRAM cell with solid phase (SPC) crystallized poly-Si thin film transistor was fabricated and electrical characteristics were evaluated. The fabricated device showed kink effect by negative back bias. Kink current is due to the floating body effect and it can be used to memory operation. Current difference between "1" state and "0" state was defined and the memory properties can be improved by using gate induced drain leakage (GIDL) current.

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Simulation of High-Speed and Low-Power CMOS Binary Image Sensor Based on Gate/Body-Tied PMOSFET-Type Photodetector Using Double-Tail Comparator

  • Kwen, Hyeunwoo;Kim, Sang-Hwan;Lee, Jimin;Choi, Pyung;Shin, Jang-Kyoo
    • Journal of Sensor Science and Technology
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    • v.29 no.2
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    • pp.82-88
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    • 2020
  • In this paper, we propose a complementary metal-oxide semiconductor (CMOS) binary image sensor with a gate/body-tied (GBT) p-channel metal-oxide-semiconductor field-effect transistor (PMOSFET)-type photodetector using a double-tail comparator for high-speed and low-power operations. The GBT photodetector is based on a PMOSFET tied with a floating gate (n+ polysilicon) and a body that amplifies the photocurrent generated by incident light. A double-tail comparator compares an input signal with a reference voltage and returns the output signal as either 0 or 1. The signal processing speed and power consumption of a double-tail comparator are superior over those of conventional comparator. Further, the use of a double-sampling circuit reduces the standard deviation of the output voltages. Therefore, the proposed CMOS binary image sensor using a double-tail comparator might have advantages, such as low power consumption and high signal processing speed. The proposed CMOS binary image sensor is designed and simulated using the standard 0.18 ㎛ CMOS process.