Browse > Article
http://dx.doi.org/10.46670/JSST.2021.30.2.114

Adjusting the Sensitivity of an Active Pixel Sensor Using a Gate/Body-Tied P-Channel Metal-Oxide Semiconductor Field-Effect Transistor-Type Photodetector With a Transfer Gate  

Jang, Juneyoung (School of Electronic and Electrical Engineering, Kyungpook National Unversity)
Lee, Jewon (System LSI Business Unit Sensor Design Team, Samsung Electronics)
Kwen, Hyeunwoo (School of Electronic and Electrical Engineering, Kyungpook National Unversity)
Seo, Sang-Ho (Korea Polytechnic)
Choi, Pyung (School of Electronic and Electrical Engineering, Kyungpook National Unversity)
Shin, Jang-Kyoo (School of Electronic and Electrical Engineering, Kyungpook National Unversity)
Publication Information
Journal of Sensor Science and Technology / v.30, no.2, 2021 , pp. 114-118 More about this Journal
Abstract
In this study, the sensitivity of an active pixel sensor (APS) was adjusted by employing a gate/body-tied (GBT) p-channel metal-oxide semiconductor field-effect transistor (PMOSFET)-type photodetector with a transfer gate. A GBT PMOSFET-type photodetector can amplify the photocurrent generated by light. Consequently, APSs that incorporate GBT PMOSFET-type photodetectors are more sensitive than those APSs that are based on p-n junctions. In this study, a transfer gate was added to the conventional GBT PMOSFET-type photodetector. Such a photodetector can adjust the sensitivity of the APS by controlling the amount of charge transmitted from the drain to the floating diffusion node according to the voltage of the transfer gate. The results obtained from conducted simulations and measurements corroborate that, the sensitivity of an APS, which incorporates a GBT PMOSFET-type photodetector with a built-in transfer gate, can be adjusted according to the voltage of the transfer gate. Furthermore, the chip was fabricated by employing the standard 0.35 ㎛ complementary metal-oxide semiconductor (CMOS) technology, and the variable sensitivity of the APS was thereby experimentally verified.
Keywords
Transfer gate-Active pixel sensor-Gate/body-tied-Photodetector-PMOSFET-Adjustable sensitivity;
Citations & Related Records
연도 인용수 순위
  • Reference
1 R. H. Nixon, S. E. Kemeny, B. Pain, C. O. Staller, and E. R. Fossum, "256 × 256 CMOS active pixel sensor camera-on-a-chip", IEEE J. Solid-State Circuits, Vol. 31, No. 12, pp. 2046-2050, 1996.   DOI
2 E. R. Fossum, "CMOS image sensors: electronic camera-on-a-chip", IEEE Trans. Electron Devices, Vol. 44, No. 10, pp. 1689-1698, 1997.   DOI
3 S. H. Kim, H. Kwen, J. Jang, Y. M. Kim, and J. K. Shin, "2500 fps High-Speed Binary CMOS Image Sensor Using Gate/Body-Tied Type High-Sensitivity Photodetector," J. Sens. Sci. Technol., Vol. 30, No. 1, pp. 61-65, 2021.   DOI
4 H. Alaibakhsh and M. A. Karami, "Analytical Modeling of Pinning Process in Pinned Photodiodes", IEEE Trans. Electron Devices, Vol. 65, No. 10, pp. 4262-4368, 2018.
5 J. H. Park, H. Kim, I. S. Wang, and J. K. Shin, "Quantum-wired MOSFET photodetector fabricated by conventional photolithography on SOI substrate", 2004 4th IEEE Conf. Nanotechnol., pp. 425-427, Munich, Germany, 2004.
6 E. R. Fossum and D. B. Hondongwa, "A review of the pinned photodiode for CCD and CMOS image sensors", IEEE J. Electron Devices Soc., Vol. 2, No. 3, pp. 33-43, 2014.   DOI
7 L. A. P. Santos, G. G. Araujo, F. L. Oliveira, E. F. Silva, and M. A. P. Santos, "An alternative method for using bipolar junction transistors as a radiation dosimetry detector in breast cancer treatment", Radiat. Meas., Vol. 71, pp. 407-411, 2014.   DOI
8 S. H. Seo, K. D. Kim, M. W. Seo, J. S. Kong, J. K. Shin, and P. Choi, "Optical characteristics of an N-Well/gate-tied PMOSFET-type photodetector with built-in transfer gate for CMOS image sensor", Sensors Mater., Vol. 19, No. 7, pp. 435-444, 2007.
9 W. Zhang and M. Chan, "A high gain N-Well/Gate tied PMOSFET image sensor fabricated from a standard CMOS process", IEEE Trans. Electron Devices, Vol. 48, No. 6, pp. 1097-1102, 2001.   DOI
10 M. Bigas, E. Cabruja, J. Forest, and J. Salvi, "Review of CMOS image sensors", Microelectronics J., Vol. 37, No. 5, pp. 433-451, 2006.   DOI
11 S. H. Seo, S. H. Lee, M. Y. Do, J. K. Shin, and P. Choi, "Highly and Variably Sensitive Complementary Metal Oxide Semiconductor Active Pixel Sensor Using P-Channel Metal Oxide Semiconductor Field Effect Transistor-Type Photodetector with Transfer Gate", Jpn. J. Appl. Phys., Vol. 45, No. 4B, 3470-3474, 2006.   DOI
12 F. Assaderaghil, D. Sinisky, S. Park, P. K. Ko, and C. Hu, "High Responsivity Photo-Sen", pp. 149-150, 1998.
13 B. S. Choi, S. H. Kim, J. Lee, C. W. Oh, S. H. Seo, and J. K. Shin, "Complementary metal oxide semiconductor image sensor using gate/body-tied P-channel metal oxide semiconductor field effect transistor-type photodetector for high-speed binary operation", Sensors Mater., Vol. 30, No. 1, pp. 129-134, 2018.   DOI