• 제목/요약/키워드: band gap

검색결과 1,556건 처리시간 0.045초

위성 DMB용 중계기(Gap Filler)의 TDM-CDM변환부 클럭 생성 방안 연구 (A Clock Generation Scheme for TDM-CDM Converter in Gap Filler for the Satellite DMB Systems)

  • 김종훈
    • 대한전자공학회논문지TC
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    • 제44권1호
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    • pp.93-97
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    • 2007
  • 본 논문에서는 위성 DMB용 Gap Filler의 TDM-CDM변환부를 위한 클럭 생성 방안을 제안하였다. 제안된 방식은 위성으로 부터 수신되는 Ku band(12.2GHz) 대역의 TDM신호에서 복조된 프레임 동기 신호를 기반으로 신호 변환 시스템의 클럭을 공급하는 VCXO(Voltage Controlled Crystal Oscillator)를 제어하여 신호 변환부의 클럭 및 데이터 동기를 제공한다. 기존의 일반적인 클럭 동기 방식과 같은 별도의 PLL을 구성할 필요 없이 Gap Filler의 디지털 신호 변환부에 사용되는 FPGA내부에 간단히 구현될 수 있으며, 주파수 오차범위를 측정 제어할 수 있는 기능을 포함하고 있어 안정도가 높은 OCXO(Oven Controlled Crystal Oscillator)를 사용할 경우 RF부에 필요한 LO( Local Oscillator)를 위한 기준 클럭으로 사용될 수 있다.

Variation of the Si-induced Gap State by the N defect at the Si/SiO2 Interface

  • 김규형;정석민
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.128.1-128.1
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    • 2016
  • Nitrided-metal gates on the high-${\kappa}$ dielectric material are widely studied because of their use for sub-20nm semiconductor devices and the academic interest for the evanescent states at the Si/insulator interface. Issues in these systems with the Si substrate are the electron mobility degradation and the reliability problems caused from N defects that permeates between the Si and the $SiO_2$ buffer layer interface from the nitrided-gate during the gate deposition process. Previous studies proposed the N defect structures with the gap states at the Si band gap region. However, recent experimental data shows the possibility of the most stable structure without any N defect state between the bulk Si valence band maximum (VBM) and conduction band minimum (CBM). In this talk, we present a new type of the N defect structure and the electronic structure of the proposed structure by using the first-principles calculation. We find that the pair structure of N atoms at the $Si/SiO_2$ interface has the lowest energy among the structures considered. In the electronic structure, the N pair changes the eigenvalue of the silicon-induced gap state (SIGS) that is spatially localized at the interface and energetically located just above the bulk VBM. With increase of the number of N defects, the SIGS gradually disappears in the bulk Si gap region, as a result, the system gap is increased by the N defect. We find that the SIGS shift with the N defect mainly originates from the change of the kinetic energy part of the eigenstate by the reduction of the SIGS modulation for the incorporated N defect.

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Ge1-xSnx/Ge1-ySny(001)의 band lineup 유형 (Band Lineup Types Based on Ge1-xSnx/Ge1-ySny(001))

  • 박일수;전상국
    • 한국전기전자재료학회논문지
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    • 제15권9호
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    • pp.770-775
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    • 2002
  • We present the band lineups of G $e_{1-}$x S $n_{x}$ G $e_{1-}$y S $n_{y(001)}$ heterostructures for the new devices. The energy gap of the bulk G $e_{1-}$x S $n_{x}$ alloy is calculated by taking into account the Vegard's law. The change of the energy gap due to the strain is understood in terms of the deformation Potential theory The valence band offset is obtained from the average bond energy model, where the changes of the band offset due to alloy compositions and strain are included. It is found that Ge/G $e_{1-}$y S $n_{y(001)}$ heterostructure has a staggered lineup type for 0$\leq$0.06 and a straddling one for 0.06$\leq$0.26. Meanwhile, Ge/G $e_{l-y}$ S $n_{y(001)}$ heterostructure has a staggered lineup type for 0$\leq$0.19 and a broken-gap one for 0.19$\leq$0.26. As a result, the various type of the G $e_{1-}$x S $n_{x}$ G $e_{1-}$y S $n_{y(001)}$ heterostructure can be applied for the useful device.evice.

Global-Navigation Satellite Service를 위한 Electromagnetic Band Gap 구조체 설계 (Design of Electromagnetic Band Gap Structure for Global Navigation Satellite Service)

  • 정기현;장영진;여성대;정창원;김성권
    • 한국전자통신학회논문지
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    • 제10권1호
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    • pp.27-32
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    • 2015
  • 본 논문에서는 GNSS(Global-Navigation Satellite Service)에서 사용되는 단말기의 PCB(Printed Circuit Board) 전원안정화를 위해서 PCB 내층에 삽입될 EBG(Electromagnetic Band Gap) 구조체를 제안한다. 버섯모양의 제안된 EBG 구조체를 통한 PCB에서의 관심 금지대역폭/저지대역폭 주파수는 GNSS와 이동통신 관련 주파수를 포함하는 1.55GHz에서 1.81GHz이었으며, 시뮬레이션 결과, 이 구간에서 삽입손실(S21)이 약 -40dB 이하로 형성됨을 볼 수 있었다. 본 연구결과는 향후, PCB 회로 설계의 PDN(Power Delivery Network)구조의 안정화 향상 및 EMI(Electro Magnetic Interference) 대책에 효과적 대응이 유용할 것으로 기대된다.

저압 MOCVD 방법으로 성장된 InAlAs 에피층에서 상분리와 규칙 현상의 관찰 (Observation of phase separation and ordering in the InAlAs epilayer grown on InP by MOCVD)

  • 조형균;이번;백종협;한원석;이정용;권명석
    • 한국진공학회지
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    • 제8권3B호
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    • pp.290-296
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    • 1999
  • We have studied the phase separation and ordering phenomeon of InAlAs epilayers grown on InP substrate by LP-MOCVD with DCXRD, PL, and TEM. From the intensity and FWHM of DCXRD and PL, we observed that the structural and optical quality of InAlAs epilayers were improved as growth temperature increased. The band-gap reduction due to phase separation and ordering is 291, 246, and 28 meV in the InAlAs epilayers grown at $565^{\circ}C$, $615^{\circ}C$, and $700^{\circ}C$, respectively, and shows the same from the InAlAs epilayer town at 5$65^{\circ}C$ in which the HRTEM micrograph showed the lattice fringe between InAs-rich and AlAs-rich regions was tilted by $2^{\circ}$ due to composition difference. However the maximum degree of ordering by intensity of extra spots was obtained at medium growth temperature. The annealing experiment by RTA of sample grown at $565^{\circ}$ shows a maximum band-gap shift of 78eV at $880^{\circ}$ for 3 min, and TEM shows that the origin of the blue shift of band-gap is the complete disappearance of ordering. Through annealing we can conclude that short time annealing affects only ordering and that most of the total band-gap reduction (~3/4) occurs by phase separation.

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압전 밴드 갭 구조물의 면내·외 방향 체적 탄성파 전파 특성 해석을 위한 유한요소 모델링 (Finite Element Modeling for the Analysis of In- and Out-of-plane Bulk Elastic Wave Propagation in Piezoelectric Band Gap Structures)

  • 김재은;김윤영
    • 대한기계학회논문집A
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    • 제35권8호
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    • pp.957-964
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    • 2011
  • 본 연구에서는 압전 밴드 갭 구조물(포논 결정) 에 대한 체적 탄성파의 전파 특성을 주파수 및 모드 별로 파악하기 위한 유한 요소법의 적용 방안을 제안하였다. 이를 위해 체적 탄성 진행파의 면내 모드 뿐만 아니라 면외 모드를 포함하도록 3 차원 주기 경계 조건을 고려하였다. 특히, 체적 탄성파 모드 간의 비연성 특성을 전기 분극 방향에 따라 유도한 다음, 그 결과를 유한 요소 모델링에 반영하였다. 제안된 방법은 실제 시뮬레이션을 통해 다양한 형태의 압전 밴드 갭 구조물의 파동 특성 분석에 적용될 수 있는 일반적이고 효율적인 방법임을 확인하였다.

Splitting effect of photocurrent for $CdIn_2Te_4$ single crystal

  • You, Sang-Ha;Hong, Kwang-Joon
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.84-85
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    • 2009
  • The single crystals of p-$CdIn_2Te_4$ were grown by the Bridgman method without the seed crystal. From photocurrent measurements, it was found that three peaks, A, B, and C, correspond to the intrinsic transition from the valence band states of $\Gamma_7(A)$, $\Gamma_6(B)$, and $\Gamma_7(C)$ to the conduction band state of $\Gamma_6$, respectively. The crystal field splitting and the spin orbit splitting were found to be 0.2360 and 0.1119 eV, respectively, from the photocurrent spectroscopy. The temperature dependence of the $CdIn_2Te_4$ band gap energy was given by the equation of $E_g(T)=E_g(0)$ - $(9.43\times10^{-3})T^2$/(2676+T). $E_g(0)$ was estimated to be 1.4750, 1.7110, and 1.8229 eV at the valence band states of A, B, and C, respectively. The band gap energy of $p-CdIn_2Te_4$ at room temperature was determined to be 1.2023 eV.

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Ku-Band Sub-Harmonically Pumped Single Balanced Resistive Mixers with a Low Pass Filter Using Photonic Band Gap

  • Kim, Jae-Hyuk;Park, Hyun-Joo;Lee, Jong-Chul;Kim, Nam-Young
    • 한국전자파학회논문지
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    • 제11권4호
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    • pp.599-609
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    • 2000
  • In this paper, sub-harmonically pumped single balanced resistive mixers are presented . Frequency bandwidth is selected for a Ku-band, which is 11.75-12.25GHz for RF, 5.375∼5.625 GHz for LO, and 1 GHz for IF signals. A rat-race hybrid is designed for the accomplishment of single balanced type. A low pass filter (LPF) with photonic band gap(PBG) structure is used for good conversion loss and unwanted harmonics suppression. Two types of mixers are suggested, which are one with no gate bias for no DC power consumption and the other with the IF amplifier for conversion gain. When a LO signal with the power of 6 dBm at 5.5 GHz is injected, a conversion loss of 12.17dB and a conversion gain of 7.83 dB are obtained for each mixer. For the both mixers , LO to RF isolation of 20 dB and LO to IF isolation of 60dB are obtained. With the RF power of -30dBm to -3dBm, the mixer shows linear characteristics region of IF. this mixer can be applied for Ku-band and other microwave communication systems.

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Optical Properties of ZnHgGa4Se8 and ZnHgGa4Se8:Co2+ Single Crystals

  • Lee Choong-Il
    • 한국재료학회지
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    • 제15권10호
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    • pp.657-661
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    • 2005
  • [ $ZnHgGa_4Se_8\;and\;ZnHgGa_4Se_8::Co^{2+}$ ] single crystals were grown by the Bridgman-Stockbarger method. The single crystals crystallized into a defect chalcopyrite structure. The optical energy band gap of the single crystals was investigated in the temperature range 11-300K. The optical energy band gap of the $ZnHgGa_4Se_8:Co^{2+}$ single crystal was smaller than that of the $ZnHgGa_4Se_8$ single crystal. The temperature dependence of the optical energy band gap of the single crystals was well fitted by the Varshni equqtion. The impurity optical absorption spectrum of the $ZnHgGa_4Se_8:Co^{2+}$ single crystal was measured in the wavelength region 300-2300 m at 80 K. Impurity absorption peaks in the spectrum were analyzed within the framework of the crystal field theory and were attributed to the electron transitions between the energy levels of $Co^{2+}$ sited in the Td symmetry point.

New Graphene Electronic Device Structure for High Ion/Ioff Ratio

  • 정현종
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.112-112
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    • 2012
  • Graphene has been considered as one of the potential post Si-materials due to its high mobility. [1] However, since graphene is semi-conductor with zero band gap, it is difficult to achieve high Ion/Ioff ratio, one of the most important requirements for commercial devices. There have been many attempts to open its band gap for high Ion/Ioff ratio, but most of them end up lowering the mobility. [2-5] Thus, we proposed and demonstrated a new device structure for graphene transistor based on one of the unique properties of graphene for high Ion/Ioff: using this approach, we were able to achieve the ratio over $10^5$. [6] Our device has several major advantages over previously proposed graphene based electronic devices. Since our device does not alter the given properties of graphene, such as opening the band gap, it has no fundamental issues on mobility degradations. In addition, our device is fully compatible with current Si technology and we were able to fabricate the devices with 6 inch wafer scale with CVD (Chemical Vapor Deposition) grown graphene. In this presentation, we will discuss about the details of our graphene device including the device structure and the detailed understanding of working mechanism. We will present device characteristics including I-V curves with $10^5$ on/off ratio. We will also present the performance of an inverter based on our devices. Finally, we will discuss the current issues and their potential solutions.

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