• 한국전기전자재료학회논문지
• /
• 제26권3호
• /
• pp.209-215
• /
• 2013

DSSCs electrical characteristics and efficiency fabricated with different tape casting thickness Pt counter electrodes and different thickness between $TiO_2$ photo electrode and Pt counter electrode substrate were studied. 1 layer Pt counter electrode shows 3.979% efficiency. Efficiency increased as tape casting thickness decreased. The lowest open-circuit voltage was a 0.726 V and the highest short-circuit current was a 2.188 mA on 1 layer Pt counter electrode. On the different thickness between two substrates, the lowest open-circuit voltage 0.712 V and the highest short-circuit current 2.787 mA was measured at $60{\mu}m$ surlyn film thickness and it shows the highest value of 5.067% efficiency.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
• /
• pp.366-367
• /
• 2006

Different orientated SBN thin films were deposited by Ion Beam Sputtering, and electric properties were measured on each orientation. Ferroelectric $Sr_xBa_{1-x}Nb_2O_6$(SBN) has excellent electro-optic, photo-refractive, piezoelectric, pyroelectric properties. SBN thin film has been deposited by various method, of sol-gel, PLD, CVD, sputtering, etc.. To avoid lead pollution of Pb-system perovskite ferroelectric materials. SBN thin films were fabricated for pyroelectric IR sensor. Using the ceramic target of the same composition and Pt(100)/$TiO_2/SiO-2$/Si(100) substrate, crystallization and orientation behavior as well as electric properties of the films were examined. Seed layer and thin films thickness was controlled to observe the effect on preferred orientation. We measured I-V, C-V, P-E hysteresis to characterize electric-properties on each orientations.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2007년도 추계학술대회 논문집
• /
• pp.66-66
• /
• 2007

Lead zirconate titanate (PZT) is one of the most attractive perovskite-type materials for ferroelectric random access memory (FRAM) due to its higher remanant polarization and the ability to withstand higher coercive fields. We first applied the damascene process using chemical mechanical polishing (CMP) to fabricate the PZT thin film capacitor to solve the problems of plasma etching including low etching profile and ion charging. The $0.8{\times}0.8\;{\mu}m$ square patterns of silicon dioxide on Pt/Ti/$SiO_2$/Si substrate were coated by sol-gel method with the precursor solution of PZT. Damascene process by CMP was performed to pattern the PZT thin film with the vertical sidewall and no plasma damage. The polarization-voltage (P-V) characteristics of PZT capacitors and the current-voltage characteristics (I-V) were examined by change of process parameters. To examine the CMP induced damage to PZT capacitor, the domain structure of the polished PZT thin film was also investigated by piezoresponse force microscopy (PFM).

• 한국재료학회지
• /
• 제9권3호
• /
• pp.229-233
• /
• 1999

DC마그네트론 스퍼터링 방식으로 $Ti/SiO_2$/Si 구조 위에 Pt(200) 박막을 배향 성장시키기 위해 증착조건(스퍼터링 가스의 종류와 압력, 기판의 온도)과 후속열처리(RTA, Furnace annealing)에 따른 Pt 박막의 전기, 결정학적 특성을 조사하였다. 실험결과, 20mTorr의 Ar+O$_2$(20%)의 혼합가스 분위기에서 기판온도를 $500^{\circ}C$로 유지하여 Pt박막을 증착하고$ 600^{\circ}C$에서 30초간 급속 열처리를 실시한 경우, 90% 이상의 결정 배항도를 갖는 Pt(200) 박막을 제작할 수 있었다. 제작된 Pt(200) 박막은 $30~40\mu$Ω.cm의 낮은 전기저항율과 우수한 열적 안정성을 나타내었으며$ 600^{\circ}C$의 고온에서 장시간 열처리를 실시하여도 전기저항율이나 우선 배향성의 변화, 박막내 미세 결함 및 열적응집현상 등이 발생되지 않았다.

• 한국재료학회지
• /
• 제19권6호
• /
• pp.344-348
• /
• 2009

The electrolyte effects of the electroplating solution in Cu films grown by ElectroPlating Deposition(EPD) were investigated. The electroplated Cu films were deposited on the Cu(20 nm)/Ti (20 nm)/p-type Si(100) substrate. Potentiostatic electrodeposition was carried out using three terminal methods: 1) an Ag/AgCl reference electrode, 2) a platinum plate as a counter electrode, and 3) a seed layer as a working electrode. In this study, we changed the concentration of a plating electrolyte that was composed of $CuSO_4$, $H_2SO_4$ and HCl. The resistivity was measured with a four-point probe and the material properties were investigated by using XRD(X-ray Diffraction), an AFM(Atomic Force Microscope), a FE-SEM(Field Emission Scanning Electron Microscope) and an XPS(X-ray Photoelectron Spectroscopy). From the results, we concluded that the increase of the concentration of electrolytes led to the increase of the film density and the decrease of the electrical resistivity of the electroplated Cu film.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2010년도 제39회 하계학술대회 초록집
• /
• pp.85-85
• /
• 2010

Graphene, the building block of graphite, is one of the most promising materials due to their fascinating electronic transport properties. The pseudo-two-dimensional sp2 bonding in graphene layers yields one of the most effective solid lubricants. In this poster, we present the correlation between electrical and nanomechanical properties of graphene layer grown on Cu/Ni substrate with CVD (Chemical Vapor Deposition) method. The electrical (current and conductance) and nanomechanical (adhesion and friction) properties have been investigated by the combined apparatus of friction force microscopy/conductive probe atomic force microscopy (AFM). The experiment was carried out in a RHK AFM operating in ultrahigh vacuum using cantilevers with a conductive TiN coating. The current was measured as a function of the applied load between the AFM tip and the graphene layer. The contact area has been obtained with the continuum mechanical models. We will discuss the influence of mechanical deformation on the electrical transport mechanism on graphene layers.

• International Journal of Precision Engineering and Manufacturing-Green Technology
• /
• 제5권5호
• /
• pp.643-650
• /
• 2018

A self-powered electrochromic device was fabricated on an indium tin oxide-polyethylene naphthalate flexible substrate using a dye-sensitized solar cell (DSSC) as a self-harvesting source; the electrochromic device was naturally bleached and operated under outdoor light conditions. The color of the organic electrochromic polymer, poly(3,4-ethylenedioxythiophene) polystyrene sulfonate, was shifted from pale blue to deep blue with an antimony tin oxide film as a charge-balanced material. Electrochromic performance was enhanced by secondary doping using dimethyl sulfoxide. As a result, the device showed stable switching behavior with a high transmittance change difference of 40% at its specific wavelength of 630 nm for 6 hrs. To improve the efficiency of the solar cell, 1.0 wt.% of Ag NWs in the photoanode was applied to the $TiO_2$ photoanode. It resulted in an efficiency of 3.3%, leading to an operating voltage of 0.7 V under xenon lamp conditions. As a result, we built a standalone self-harvesting electrochromic system with the performance of transmittance switching of 29% at 630 nm, by connecting with two solar cells in a device. Thus, a self-harvesting and flexible device was fabricated to operate automatically under the irradiated/dark conditions.

• Journal of the Korean Physical Society
• /
• 제73권11호
• /
• pp.1712-1715
• /
• 2018

To study the applications for ferroelectric non-volatile memory and ferroelectric memristor, etc., deposition pressure dependent electric the properties of $(Hf,\;Zr)O_2$ thin films by RF sputtering deposition method were investigated. The bottom electrode was TiN thin film to produce stress effect on the formation of orthorhombic phase and top electrode was Pt thin film by DC sputtering deposition. Deposition pressure was varied along with the same other deposition conditions, for example, sputtering power, target to substrate distance, post-annealing temperature, annealing gas, annealing time, etc. The structural and electric properties of the above thin films were investigated. As a result, it is confirmed that the electric properties of the $(Hf,\;Zr)O_2$ thin films depend on the deposition pressure which affects structural properties of the thin films, such as, structural phase, ratio of the constituents, etc.

• 대한금속재료학회지
• /
• 제46권7호
• /
• pp.464-470
• /
• 2008

Metallic nanostructures have great potential for bio-chemical sensor applications due to the excitation of localized surface plasmon and its sensitive response to environmental change. Unlike the commonly explored absorption-based sensing, the optical scattering provides single particle detection scheme. For the localized surface plasmon resonance spectroscopy, the metallic nanostructures with controlled shape and size have been usually fabricated on adhesion-layer pre-coated transparent glass substrates. In this study, we calculated the optical scattering properties of plasmonic Au nanodisc using a discrete dipole approximation method and analyzed the effect of adhesion layer on them. Our result also indicates that there is a trade-off between the surface plasmon damping and the capability of supporting nanostructures in determining the optimal thickness of adhesion layer. Marginal thickness of Ti adhesion layer for supporting Au nanostructures fabricated on a silica glass substrate was experimentally analyzed by an adhesion strength test using a nano-indentation technique.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2001년도 춘계학술발표회 초록집
• /
• pp.73-73
• /
• 2001

Boron-containing materials have several excellent properties, such as superlnardness, insulation and non-Rinear optical property. Recently, oxynitride compounds, such as Si(ON), Ti(ON), became the promising materials applied in diffusion barrier layer and solar cell. With the expectation of obtaining the hybrid property, we have firstly grown the BON thin film by radio frequency (R.F.) plasma enhanced metalorganic chemical vapm deposition (PEMOCVD) with 100 kHz frequency and trimethyl borate precursor. The plasma source gases used in this study were Ar and $H_2$, and two kinds of nhmgen source gases, $N_2$ and <$NH_3$, were also employed. The as-grown films were characterized by XPS, IR, SEM and Knoop microlhardness tester. The relationship between the films hardness and the growth rate indicated that the hardness of the film was dependent on several factors such as nitrogen source gas, substrate temperature and film thickness due to the variation of the composition and the structure of the film. Both nitrogen and carbon content could raise the film hardness, on which nitrogen content did stronger effect than carbon. The smooth morphology and continuous structure was benefit of obtaining high hardness. The maximum hardness of BON film was about 10 GPa.