• Title/Summary/Keyword: Thin-film technology

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Thermodynamic Comparison of Silicon Carbide CVD Process between CH3SiCl3-H2 and C3H8-SiCl4-H2 Systems (탄화규소 CVD 공정에서 CH3SiCl3-H2과 C3H8-SiCl4-H2계의 열역학적 비교)

  • Choi, Kyoon;Kim, Jun-Woo
    • Korean Journal of Metals and Materials
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    • v.50 no.8
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    • pp.569-573
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    • 2012
  • In order to understand the difference in SiC deposition between the $CH_3SiCl_3-H_2$ and $C_3H_8-SiCl_4-H_2$ systems, we calculate the phase stability among ${\beta}$-SiC, graphite and silicon. We constructed the phase-diagram of ${\beta}$-SiC over graphite and silicon via computational thermodynamic calculation considering pressure (P), temperature (T) and gas composition (C) as variables. Both P-T-C diagrams showed a very steep phase boundary between the SiC+C and SiC region perpendicular to the H/Si axis, and also showed an SiC+Si region with a H/Si value of up to 6700 in the $C_3H_8-SiCl_4-H_2$, and 5000 in the $CH_3SiCl_3-H_2$ system. This difference in phase boundaries is explained by the ratio of Cl to Si, which is 4 for the $C_3H_8-SiCl_4-H_2$ system and 3 for the $C_3H_8-SiCl_4-H_2$ system. Because the C/Si ratio is fixed at 1 in the $CH_3SiCl_3-H_2$ system while it can be variable in the $C_3H_8-SiCl_4-H_2$ system, the functionally graded material is applicable for better mechanical bonding during SiC coating on graphite substrate in the $C_3H_8-SiCl_4-H_2$ system.

Role of a PVA layer During lithography of SnS2 thin Films Grown by Atomic layer Deposition

  • Ham, Giyul;Shin, Seokyoon;Lee, Juhyun;Lee, Namgue;Jeon, Hyeongtag
    • Journal of the Semiconductor & Display Technology
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    • v.17 no.3
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    • pp.41-45
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    • 2018
  • Two-dimensional (2D) materials have been studied extensively due to their excellent physical, chemical, and electrical properties. Among them, we report the material and device characteristics of tin disulfide ($SnS_2$). To apply $SnS_2$ as a channel layer in a transistor, $SnS_2$ channels were formed by a stripping method and a transfer method. The limitation of this method is that it is difficult to produce uniform device characteristics over a large area. Therefore, we directly deposited $SnS_2$ by atomic layer deposition (ALD) and then performed lithography. This method was able to produce devices with repeatable characteristics over a large area. However, the $SnS_2$ film was damaged by the acetone used as a photoresist (PR) developer during the lithography process, with the electrical properties of mobility of $2.6{\times}10^{-4}cm^2/Vs$, S.S. of 58.1 V/decade, and on/off current ratio of $1.8{\times}10^2$. These results are not suitable for advanced electronic devices. In this study, we analyzed the effect of acetone on $SnS_2$ and studied the device process to prevent such damage. Using polyvinyl alcohol (PVA) as a passivation layer during the lithography process, the electrical characteristics of the $SnS_2$ transistor had $2.11{\times}10^{-3}cm^2/Vs$ of mobility, 11.3 V/decade of S.S, and $2.5{\times}10^3$ of the on/off current ratio, which were 10x improvements to the $SnS_2$ transistor fabricated by the conventional method.

Atmospheric Pressure Plasma Etching Technology for Forming Circular Holes in Perovskite Semiconductor Materials (페로브스카이트 반도체 물질에 원형 패턴을 형성하기 위한 상압플라즈마 식각 기술)

  • Kim, Moojin
    • Journal of Convergence for Information Technology
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    • v.11 no.2
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    • pp.10-15
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    • 2021
  • In this paper, we formed perovskite (CH3NH3PbI3) thin films on glass with wet coating methods, and used various analytical techniques to discuss film thickness, surface roughness, crystallinity, composition, and optical property. The coated semiconductor material has no defects and is uniform, the surface roughness value is very small, and a high absorption rate has been observed in the visible light area. Next, in order to implement the hole shape in the organic-inorganic layer, Samples in the order of a metal mask with holes at regular intervals, a glass coated with a perovskite material, and a magnet were etched with atmospheric pressure plasma equipment. The shape of the hole formed in the perovskite material was analyzed by changing the time. It can be seen that more etching is performed as the time increases. The sample with the longest processing time was examined in more detail, and it was classified into 7 regions by the difference according to the location of the plasma.

Electrochemical Synthesis of Metal-organic Framework (전기화학적 방법을 통한 금속 유기 골격체 합성)

  • Moon, Sanghyeon;Kim, Jiyoung;Choi, Hyun-Kuk;Kim, Moon-Gab;Lee, Young-Sei;Lee, Kiyoung
    • Applied Chemistry for Engineering
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    • v.32 no.3
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    • pp.229-236
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    • 2021
  • During the last two decades, metal-organic frameworks (MOFs) have been drawn attention due to their high specific surface area, porosity, and catalytic activities that allow to use in many applications such as sensor, catalysis, energy storage, etc. To synthesize MOFs hydrothermal or solvothermal method were generally used. However, these methods require high-cost equipment and long time-spend for the synthesis with multi-step process. In contrast, electrochemical synthesis has been considered as a simple and easy process under the ambient conditions. In this review, we described the mechanism of electrochemical MOFs synthesis by the number of configured electrodes system, with the recent reports of various applications.

Influence of Oxygen Annealing on Temperature Dependent Electrical Characteristics of Ga2O3/4H-SiC Heterojunction Diodes (산소 후열처리가 Ga2O3/4H-SiC 이종접합 다이오드의 온도에 따른 전기적 특성에 미치는 영향 분석)

  • Chung, Seung Hwan;Lee, Hyung Jin;Lee, Hee Jae;Byun, Dong Wook;Koo, Sang Mo
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.4
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    • pp.138-143
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    • 2022
  • We analyzed the influence of post-annealing on Ga2O3/n-type 4H-SiC heterojunction diode. Gallium oxide (Ga2O3) thin films were deposited by radio frequency (RF) sputtering. Post-deposition annealing at 950℃ in an Oxygen atmosphere was performed. The material properties of Ga2O3 and the electrical properties of the diodes were investigated. Atomic Force Microscopy (AFM), X-Ray Diffraction and Scanning Electron Microscope (SEM) images show a significant increase in the roughness and crystallinity of the O2-annealed films. After Oxygen annealing X-ray Photoelectron Spectroscopy (XPS) shows that the atomic ratio of oxygen increases which is related to a decrease in oxygen vacancy within the Ga2O3 film. The O2-annealed diodes exhibited higher on-current and lower leakage current. Moreover, the ideality factor, barrier height, and thermal activation energy were derived from the current-voltage curve by increasing the temperature from 298 - 434K.

Effect of Ag Alloying on Device Performance of Flexible CIGSe Thin-film Solar Cells Using Stainless Steel Substrates

  • Awet Mana Amare;Inchan Hwang;Inyoung Jeong;Joo Hyung Park;Jin Gi An;Soomin Song;Young-Joo Eo;Ara Cho;Jun-Sik Cho;Seung Kyu Ahn;Jinsu Yoo;SeJin Ahn;Jihye Gwak;Hyun-wook Park;Jae Ho Yun;Kihwan Kim;Donghyeop Shin
    • Current Photovoltaic Research
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    • v.11 no.1
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    • pp.8-12
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    • 2023
  • In this work, we investigated the thickness of Ag precursor layer to improve the performance of flexible CIGSe solar cells grown on stainless steel (STS) substrates through three-stage co-evaporation with Ga grading followed by alkali treatments. The small amount of incorporated Ag in CIGSe films showed enhancement in the grain size and device efficiency. With an optimal 6 nm-thick Ag layer, the best cell on the STS substrate yielded more than 16%, which is comparable to the soda-lime glass (SLG) substrate. Thus, the addition of controlled Ag combined with alkali post-deposition treatment (PDT) led to increased open-circuit voltage (VOC), accompanied by the increased built-in potential as confirmed by capacitance-voltage (C-V) measurements. It is related to a reduction of charge recombination at the depletion region. The results suggest that Ag alloying and alkali PDT are essential for producing highly efficient flexible CIGSe solar cells.

UV-cured Polymer Solid Electrolyte Reinforced using a Ceramic-Polymer Composite Layer for Stable Solid-State Li Metal Batteries

  • Hye Min Choi;Su Jin Jun;Jinhong Lee;Myung-Hyun Ryu;Hyeyoung Shin;Kyu-Nam Jung
    • Journal of Electrochemical Science and Technology
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    • v.14 no.1
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    • pp.85-95
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    • 2023
  • In recent years, solid-state Li metal batteries (SSLBs) have attracted significant attention as the next-generation batteries with high energy and power densities. However, uncontrolled dendrite growth and the resulting pulverization of Li during repeated plating/stripping processes must be addressed for practical applications. Herein, we report a plastic-crystal-based polymer/ceramic composite solid electrolyte (PCCE) to resolve these issues. To fabricate the one-side ceramic-incorporated PCCE (CI-PCCE) film, a mixed precursor solution comprising plastic-crystal-based polymer (succinonitrile, SN) with garnet-structured ceramic (Li7La3Zr2O12, LLZO) particles was infused into a thin cellulose membrane, which was used as a mechanical framework, and subsequently solidified by using UV-irradiation. The CI-PCCE exhibited good flexibility and a high room-temperature ionic conductivity of over 10-3 S cm-1. The Li symmetric cell assembled with CI-PCCE provided enhanced durability against Li dendrite penetration through the solid electrolyte (SE) layer than those with LLZO-free PCCEs and exhibited long-term cycling stability (over 200 h) for Li plating/stripping. The enhanced Li+ transference number and lower interfacial resistance of CI-PCCE indicate that the ceramic-polymer composite layer in contact with the Li anode enabled the uniform distribution of Li+ flux at the interface between the Li metal and CI-PCCE, thereby promoting uniform Li plating/stripping. Consequently, the Li//LiFePO4 (LFP) full cell constructed with CI-PCCE demonstrated superior rate capability (~120 mAh g-1 at 2 C) and stable cycle performance (80% after 100 cycles) than those with ceramic-free PCCE.

Effects of Blended TIPS-pentacene:ph-BTBT-10 Organic Semiconductors on the Photoresponse Characteristics of Organic Field-effect Transistors (TIPS-pentacene:ph-BTBT-10 혼합 유기반도체가 유기전계효과트랜지스터 광반응 특성에 미치는 영향)

  • Chae Min Park;Eun Kwang Lee
    • Clean Technology
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    • v.30 no.1
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    • pp.13-22
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    • 2024
  • In this study, blended 6,13-Bis(triisopropylsilylethynyl)pentacene (TP):2-Decyl-7-phenyl[1]benzothieno[3,2-b][1] benzothiophene (BT):Poly styrene (PS) TFT at different ratios were explored for their potential application as light absorption sensors. Due to the mixing of BT, both off current reduction and on/off ratio improvement were achieved at the same time. In particular, the TP:BT:PS (1:0.25:1 w/w) sample showed excellent light absorption characteristics, which proved that it is possible to manufacture a high-performance light absorption device. Through analysis of the crystal structure and electrical properties of the various mixing ratios, it was confirmed that the TP:BT:PS (1:0.25:1 w/w) sample was optimal. The results of this study outline the expected effects of this innovation not only for the development of light absorption devices but also for the development of mixed organic semiconductor (OSC) optoelectronic systems. Through this study, the potential to create a multipurpose platform that overcomes the limitations of using a single OSC and the potential to fabricate a high-performance OSC TFT with a fine-tuned optical response were confirmed.

Actual Evapotranspiration of Sesame Crop Cultured With and Without Transparent Plastic Film Mulch (투명(透明) 프라스틱 필름 피복(被覆)에 따른 참깨의 실증발산량(實蒸發散量) 변화(變化))

  • Oh, Dong-Shin;Kwon, Yong-Woong;Im, Jung-Nam;Ryu, Kwan-Shig
    • Korean Journal of Soil Science and Fertilizer
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    • v.29 no.1
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    • pp.34-43
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    • 1996
  • Determining the actual evapotranspiration(ETa) of a crop, and appropriate water management of the crop based on the ETa are very important For increasing the yield. The present study aimed at determining ETa and crop coefficient of sesame growing under different climatic conditions with the transparent thin polyethylene film mulch(0.03 mm thick) and without this mulch. Bottomless cylindrical lysimeters(105cm in diameter, 120cm in height, protruded 20 cm above the soil surface) were installed on the field of sandy loam "Bonyang series" soil with a moderate drainage. The determination of ETa was performed by measuring each component of a model equation, $ETa=(R+I)-\{Ro+(D1+D2)\}+C{\pm}{\Delta}S$. Sesame, cv. "Ansan" was sown in two rows with the spacing of $50{\times}15cm$ on May 10 in 1991 and 1992. The mulching covers 80% of the soil surface. Sesame consumed the water of 139.0 mm(1.53 mm/day) and 171.2 mm(1.59 mm/day) in ETa without the film mulch, but that of 132.6 mm(1.46 mm/day) and 199.8 mm(1.85 mm/day) with its mulching through both years of 1991 and 1992, respectively. The ETa's accounted for 52 and 69% of the potential evapotranspiration(ETp) in the mulched crop, and 54 and 59% of ETp in the non-mulched crop 1991 through 1992, respectively. Its ETa's were much more and their gap between the mulching and non-mulching treatment was larger in 1992 than in 1991 as a result of the better climatic condition of 1992.

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A Study on Properties of N-type ZnS Deposited at Various RF Power for Solar Cell Applications (RF Power에 따른 태양전지용 N-type ZnS 특성연구)

  • Yang, Hyeon-Hun;Kim, Han-Wool;Jeong, Woon-Jo;Lee, Suk-Ho;So, Soon-Youl;Park, Gye-Choon;Lee, Jin;Chung, Hea-Duck
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.7
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    • pp.574-577
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    • 2011
  • In this study, we use the $2.5cm{\times}7.5cm$ soda lime glass as the substrate. We used the ultrasonicator. Glass was dipped in the acetone, methanol and DI water respectively for 10 minutes. Ar(99.99%)gas was used as the sputtering gas. We varied the RF power between 100~175 W with 25 W steps. Base pressure was kept by turbo molecular pump at $3.0{\times}10^{-6}$ torr. Working pressure was kept by injection of Ar gas. ZnS thin films were deposited with the radio frequency magnetron sputtering technique at various temperatures and sputtering powers. It is also clearly observed that, the intensity of the (111) XRD peak increases with increasing the RF power. Electrical properties were measured by hall effect methods at room temperature. The resistivity, carrier concentration, and hall mobility of ZnS deposited on glass substrate as a function of sputtering power. It can be seen that as the sputtering power increase from 100 to 175 W, the resistivity of the films on glass decreased significantly from $8.1{\times}10^{-2}$ to $1.2{\times}10^{-3}\;{\Omega}{\cdot}cm$. This behavior could be explained by the effect of the sputtering power on the mobility and carrier concentration. When the RF power increases, the carrier concentration increases slightly while the resistivity decreases significantly. These variation originate from improved crystallinity and enhanced substitutional doping as the sputtering power increases.