• Title/Summary/Keyword: Thickness uniformity

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Bi2212 Tube Characteristics for SCFCL (한류기용 Bi2212 튜브의 특성)

  • Lee, N.I.;Jang, G.E.;Oh, I.S.;Park, G.B.
    • Progress in Superconductivity
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    • v.7 no.2
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    • pp.174-178
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    • 2006
  • For the practical application on SCFCL, Bi2212 tubes were fabricated by Centrifugal Forming Process (CFP) in terms of many different processing parameters. Typical sizes of tubes were 60, 150 mm in length and 2.5, 3.5, 4.8 mm in thickness. Initially powder was melted by induction heating. The optimum range of melting temperatures and preheating temperature were $1100^{\circ}C$ and $500^{\circ}C$ for 30min respectively. The nominal mold rotating speed was around 1000 RPM. A tube was annealed at $840^{\circ}C$ for 80 hours in oxygen atmosphere. The tube of 50mm x 70mm x 2.5mm, rotated with 1000 RPM showed $I_c=890\;A\;and\;T_c=80$. It was found that the tube processed with faster rate of mold rotation speed, thinner tube thickness and shorter tube length shows better electric characteristics as compared with the tube normally processed. In order to study the uniformity heat and fluid flow analysis tool was adopted along tube.

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Study of Design & CFD Analysis for Partial DPF Utilizing Metal Foam (금속폼을 이용한 Partial DPF의 설계 및 전산유체해석 연구)

  • Yoon, Cheon-Seog;Cho, Gyu-Baek
    • Transactions of the Korean Society of Automotive Engineers
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    • v.17 no.1
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    • pp.24-34
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    • 2009
  • DPF(Diesel Particulate Filter)s have been used to reduce the most of PM(particulate matters) from the exhaust emissions of diesel engine vehicles. Metal foam is one of promising materials for the DPFs due to its cost effectiveness, good thermal conductivity and high mechanical strength. It can be fabricated with various pore sizes and struct thickness and coated with catalytic wash-coats with low cost. In order to design metal foam filter and analyze the flow phenomena, pressure drop and filtration experiment are carried out. Partial DPF which has PM reduction efficiency of more than 50 % is designed in this paper. Also, CFD analysis are performed for different configurations of clean filters in terms of pressure drop, uniformity index, and velocity magnitude at face of filter. Filter thickness and the gap between front and rear filters are optimized and recommended for manufacturing purpose.

Cu Electroplating on Patterned Substrate and Etching Properties of Cu-Cr Film for Manufacturing TAB Tape (TAB 테이프 제조를 위한 구리 도금 및 에칭에 관한 연구)

  • Kim, N. S.;Kang, T.;Yun, I. P.;Park, Y. S.
    • Journal of the Korean institute of surface engineering
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    • v.27 no.3
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    • pp.158-165
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    • 1994
  • Cu-Cr alloy thin film requires good quality of etching be used for TAB technology. The etched cross sec-tion was clean enough when the etching was performed in 0.1M $FeCl_3$ solution at $50^{\circ}C$. The etching rate was increased with the amount of $KMnO_4$. For enhanced profile of cross section and rate, the spray etchning was found to be superior compared to the immersion etching. A series of experiments were performed to improve the uniformity of the current distribution in electrodeposition onto the substrate with lithographic patterns. Copper was electrodeposited from quiescent-solution, paddle-agitated-solution, and air-bubbled-solution to in-vestigate the effect of the fluid flow. The thickness profile of the specimen measured by profilmetry has the non uniformity at feature scale in quiescent-solution, because of the longitudinal vortex roll caused by the natural convection. However, uniform thickness profile was achieved in paddle-agitated or air bubbled solu-tion.

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A Study on High Frequency-Plasma Enhanced Chemical Vapor Deposition Silicon Nitride Films for Crystalline Silicon Solar Cells

  • Li, Zhen-Hua;Roh, Si-Cheol;Ryu, Dong-Yeol;Choi, Jeong-Ho;Seo, Hwa-Il;Kim, Yeong-Cheol
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.4
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    • pp.156-159
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    • 2011
  • SiNx:H films have been widely used for anti-reflection coatings and passivation for crystalline silicon solar cells. In this study, SiNx:H films were deposited using high frequency (13.56 MHz) direct plasma enhanced chemical vapor deposition, and the optical and passivation properties were investigated. The radio frequency power, the spacing between the showerhead and wafer, the $NH_3/SiH_4$ ratio, the total gas flow, and the $N_2$ gas flow were changed over certain ranges for the film deposition. The thickness uniformity, the refractive index, and the minority carrier lifetime were then measured in order to study the properties of the film. The optimal deposition conditions for application to crystalline Si solar cells are determined from the results of this study.

Vapor Deposition Techniques for Synthesis of Two-Dimensional Transition Metal Dichalcogenides

  • Song, Jeong-Gyu;Park, Kyunam;Park, Jusang;Kim, Hyungjun
    • Applied Microscopy
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    • v.45 no.3
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    • pp.119-125
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    • 2015
  • Two-dimensional (2D) transition metal dichalcogenides (TMDCs) have attracted significant attention due to their unique and exotic properties attributed to their low dimensionality. In particular, semiconducting 2D TMDCs such as $MoS_2$, $WS_2$, $MoSe_2$, and $WSe_2$ have been demonstrated to be feasible for various advanced electronic and optical applications. In these regards, process to synthesize high quality 2D TMDCs layers with high reliability, wafer-scale uniformity, controllable layer number and excellent electronic properties is essential in order to use 2D TMDCs in practical applications. Vapor deposition techniques, such as physical vapor deposition, chemical vapor deposition and atomic layer deposition, could be promising processes to produce high quality 2D TMDCs due to high purity, thickness controllability and thickness uniformity. In this article, we briefly review recent research trend on vapor deposition techniques to synthesize 2D TMDCs.

Electrical Properties of Molybdenum Metal Deposited by Plasma Enhanced - Atomic Layer Deposition of Variation Condition (다양한 조건의 플라즈마 원자층 증착법으로 증착된 Mo 금속의 전기적 특성)

  • Lim, Taewaen;Chang, Hyo Sik
    • Korean Journal of Materials Research
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    • v.29 no.11
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    • pp.715-719
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    • 2019
  • Molybdenum is a low-resistivity transition metal that can be applied to silicon devices using Si-metal electrode structures and thin film solar cell electrodes. We investigate the deposition of metal Mo thin film by plasma-enhanced atomic layer deposition (PE-ALD). $Mo(CO)_6$ and $H_2$ plasma are used as precursor. $H_2$ plasma is induced between ALD cycles for reduction of $Mo(CO)_6$ and Mo film is deposited on Si substrate at $300^{\circ}C$. Through variation of PE-ALD conditions such as precursor pulse time, plasma pulse time and plasma power, we find that these conditions result in low resistivity. The resistivity is affected by Mo pulse time. We can find the reason through analyzing XPS data according to Mo pulse time. The thickness uniformity is affected by plasma power. The lowest resistivity is $176{\mu}{\Omega}{\cdot}cm$ at $Mo(CO)_6$ pulse time 3s. The thickness uniformity of metal Mo thin film deposited by PE-ALD shows a value of less than 3% below the plasma power of 200 W.

Study on Fluid Distribution in Slot-die Head Using CFD (CFD를 이용한 슬롯 다이 헤드 내부의 유체 분포 분석)

  • Yoo, Suho;Kim, Gieun;Shin, Youngkyun;Park, Jongwoon
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.4
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    • pp.39-44
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    • 2022
  • Using a CFD (computational fluid dynamics) simulation tool, we have offered a design guideline of a slot-die head having a simple T-shaped cavity through an analysis of the fluid dynamics in terms of cavity pressure and outlet velocity, which affect the uniformity of coated thin films. We have visualized the fluid flow with a transparent slot-die head where poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) (PEDOT:PSS) is injected. We have shown that the fluid dynamics inside the slot-die head depends sensitively on the cavity depth, cavity length, land length, and channel gap (i.e., shim thickness). Of those, the channel gap is the most critical parameter that determines the uniformity of the pressure and velocity distributions. A pressure drop inside the cavity is shown to be reduced with decreasing shim thickness. To quantify it, we have also calculated the coefficient of variation (CV). In accordance with Hagen-Poiseuille's laws and electron-hydraulic analogy, the CV value is decreased with increasing cavity depth, cavity length, and land length.

The design and the analysis of a LED illumination lens using the overlapped model (중첩모델을 이용한 조명용 LED 렌즈설계 및 분석)

  • You, Ilhyun
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.21 no.1
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    • pp.157-164
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    • 2017
  • In this research, the overlapped illumination model was used for designing a freeform LED lens with a uniform illuminance distribution on its illuminating plane, and their performances and tolerances were compared. And, the illuminations on a illumination plane was measures for change with average illuminance and illuminance uniformity. As a result of the tolerance analysis about z-axis direction change, thickness change in lens and tilt change of light emission and characteristic change in LED source, overlapped model and divergent illumination model are similar to the performance about Z-axis direction change of light emission in LED source. but the uniformity illumination value in this overlapped model is more remarkably value than it in divergent illumination model about thickness change in LED lens. Also, even though the lens based on a divergent illumination model showed good performance compare to the lens based on an overlapped illumination model, the latter was less the deviation to variation of LED beam radiation ability.

Uniformity of Bi2212 Tubes Depending on Cooling Conditions (냉각 속도에 따른 Bi-2212 초전도 튜브의 균일성)

  • Lee, Nam-Il;Jnag, Gun-Eik;Park, Gwon-Bae;Oh, Il-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.259-260
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    • 2006
  • This study was progressed to value of Bi2212 tubes uniformity depend on cooling conditions. The tube from 150 mm in length, 30 mm in O.D., 20 mm in I.D., 5 mm in thickness was combined with electrodes by 3 sections. The tube from 60, 70 mm in length, 30, 50 mm in O.D., 20.4, 40.4 mm in I.D., 4.8 mm in thickness was in controled of cooling rate by a heat exchanger. Bi2212 tubes were fabricated by Centrifugal Forming Process (CFP) and they were annealed at $840^{\circ}C$ for 80 h in oxygen atmosphere. The tube from 150 mm in length was analyzed by EFDLab of NIKA to show cooling rate and temperature distributions. When the tube was cooled for 100s, the temperature distributions was $663^{\circ}C$ in the middle, $500{\sim}647^{\circ}C$ in inlet, $598{\sim}647^{\circ}C$ in the other side. Electric characteristics from $I_c$ was 450 A in the middle, 650 A in inlet, 600 A in the other side. Electric characteristics by a heat exchanger showed the more fast cooling rate, the more high $I_c$.

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The Study on the Non-Uniformity of PECVD SiO2 Deposition by the Plasma Diagnostics (플라즈마 진단에 의한 PECVD SiO2 증착의 불균일성 원인 연구)

  • Ham, Yong-Hyun;Kwon, Kwang-Ho;Lee, Hyun-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.2
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    • pp.89-94
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    • 2011
  • The cause of the thickness non-uniformity in the large area deposition of $SiO_2$ films by PECVD(Plasma Enhanced Chemical Vapor Deposition) was investigated by the plasma diagnostics. The spatial distribution of the plasma species in the chamber was obtained with DLP(Double Langmuir Probe) and the new-designed probe-type QMS(Quadrupole Mass Spectrometer). From the relationship between the spatial distribution of the plasma species and the depositing rate of the $SiO_2$ films, it was conformed that the non-uniform deposition of $SiO_2$ films was related with the spatial distribution of the oxygen radical density and electron temperature.