• Title/Summary/Keyword: TE10

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Negative-refraction Effect for Both TE and TM Polarizations in Two-dimensional Annular Photonic Crystals

  • Wu, Hong;Li, Feng
    • Current Optics and Photonics
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    • v.2 no.1
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    • pp.47-52
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    • 2018
  • We systematically investigated the negative-refraction effect for both TE and TM polarizations in annular photonic crystals. Since two polarization waves are excited in different bands, they result in different refractive angles, and so polarization beam splitters can be made of annular photonic crystals. It was found that, in comparison to normal square-lattice air-hole photonic crystals, annular photonic crystals have a much wider common frequency band between TE-1 and TM-2, which is quite beneficial to finding the overlap between the negative-refraction regions belonging to TE-1 and TM-2 respectively. Further analyses of equifrequency surfaces and the electric-field distribution of annular photonic crystals with different parameters have not only demonstrated how the filling factor of annular cells affects the formation of the common negative-refraction region between TE-1 and TM-2, but also revealed some ways to improve the performance of a polarization beam splitter based on the negative-refraction effect in an annular photonic crystal.

A Study of Phase-change Properties of Sb-doped Ag/Ge-Se-Te thin films (Sb-doped Ag/Ge-Se-Te 박막의 상변화 특성 연구)

  • Nam, Ki-Hyun;Jeong, Won-Kook;Park, Ju-Hyun;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.347-347
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    • 2010
  • In other to progress better crystallization transition and long phase-transformation data of phase-change memory (PRAM), we investigated about the effect of Sb doping and Ag ions percolating into Ge-Se-Te phase-change material. Doped Sb concentrations was determined each of 10 wt%, 20 wt% and 30 wt%. As the Sb-doping concentration was increased, the resistivity decreased and the crystallization temperature increased. Ionization of Ag was progressed by DPSS laser (532 nm) for 1 hour. The resistivity was more decreased and the crystallization temperature was more increased in case of adding Ag layer under Sb-(Ge-Se-Te) thin film. At the every condition of thin films included Ag layer more stable states were indicated compare with just Sb-doped Ge-Se-Te thin films.

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The Hall Effect in Binary Compound Silver telluride Single Crystal (2원화화물 $Ag_2Te$ 단결정의 Hall 효과 특성)

  • Kim, N.O.;Kim, H.G.;Jang, S.N.;Lee, K.S.;Bang, T.W.;Hyun, S.C.
    • Proceedings of the KIEE Conference
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    • 2004.07e
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    • pp.134-136
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    • 2004
  • The results of investigations of $Ag_2Te$ crystal is presented. $Ag_2Te$ crystal was grown by the Bridgman method. The $Ag_2Te$ crystal was an monoclinic structure with lattice constance a = 8.1686 A, b = 9.0425 ${{\AA}}$, c = 8.0065 ${{\AA}}$. Hall effect shows a n-type conductivity in the $Ag_2Te$ crystal. The electrical resistivity values was $1.080e^{-3}{\Omega}cm$ and electron mobility was $-5.48{\times}10^3cm^2/V{\cdot}sec$ at room temperature(RT).

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Evaluation of UTE Signal Acquisition Efficacy in Molecular MRI (분자 MR영상에서 UTE 신호의 효용성 평가)

  • Lee, Sang-Bock;Choi, Gui-Rack
    • Journal of the Korean Society of Radiology
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    • v.6 no.4
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    • pp.305-311
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    • 2012
  • This study compares the TE and UTE is to evaluate. We was programming by DWT of Matlab Tool-box for evaluation. M-program used feature value extract between TE Images and UTE Images. Two images using the extracted feature values were compared. Comparison of similar features two images phase was found to have value.

Growth and characterization of CdTe single crystal by vertical Bridgman method (수직 Bridgman 법에 의한 CdTe 단결정 성장과 특성)

  • Hong, Myung-Seok;Hong, Kwang-Joon
    • Journal of Sensor Science and Technology
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    • v.14 no.6
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    • pp.369-373
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    • 2005
  • High quality CdTe single crystal for the solar cell fabrication was grown by vertical Bridgman method. The etch pits patterns of (111) surfaces of CdTe etched by Nakagawa solution was observed the (111)A compesed of Cd atoms with typical triangle etch pits of pyramid mode. From the photoluminescence measurement on (111)A, we observed free exciton ($E_{x}$) existing only high quality crystal and neutal acceptor bound exciton ($A^{0}$,X) having very strong peak intensity. Then, the full width at half maximum and binding energy of neutral acceptor bound exciton were 7 meV and 5.9 meV, respectively. By Haynes rule, an activation enery of impurity was 59 meV. Therefore, the origins on impurity level acting as a neutral acceptor were associated Ag or Cu elements.

Phase Transformation Effect on Mechanical Properties of Ge2Sb2Te5 Thin Film (Ge2Sb2Te5 박막의 상변화에 의한 기계적 물성 변화)

  • Hong, Sung-Duk;Jeong, Seong-Min;Kim, Sung-Soon;Lee, Hong-Lim
    • Journal of the Korean Ceramic Society
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    • v.42 no.5 s.276
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    • pp.326-332
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    • 2005
  • Phase transformation effects on mechanical properties of $Ge_2Sb_2Te_5$, which is a promising candidate material for Phase Change Random Access Memory (PRAM), were studied. $Ge_2Sb_2Te_5$ thin films, which was thermally annealed with different conditions, were analyzed using XRD, AFM, 4-point probe method and reflectance measurement. As the temperature and the dwelling time increased, crystallity and grain size increased, which enhanced elastic modulus and hardness. Furthermore, N2 doping, which was used for better electrical properties, was proved to decrease elastic modulus and hardness of $Ge_2Sb_2Te_5$.

Fabrication of 64x1 linear array infrared detector using Hg1-xCdxTe (Hg1-xCdxTe를 이용한 64x1 선형 적외선 감지 소자 제작)

  • Kim, Jin-Sang;Suh, Sang-Hee
    • Journal of Sensor Science and Technology
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    • v.18 no.2
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    • pp.135-138
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    • 2009
  • $64{\times}1$ forcal plane infrared detector has been fabricated by using HgCdTe epi layer. HgCdTe was grown on GaAs substrate by using metal organic chemical vapor deposition. This paper describes key developments in the epi layer growth and device fabrication process. The performance of IR imaging system is summarized.

Morphology Controlled Synthesis of Nanostructured Bi2Te3

  • Kim, Hee Jin;Han, Mi-Kyung;Kim, Ha-Young;Lee, Wooyoung;Kim, Sung-Jin
    • Bulletin of the Korean Chemical Society
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    • v.33 no.12
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    • pp.3977-3980
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    • 2012
  • Nanostructured thermoelectric bismuth telluride ($Bi_2Te_3$) powders with various morphologies, such as nanoplates, nanorods, and nanotubes, were prepared by a hydrothermal method based on the reaction between $BiCl_3$, Te, and sodium ethylenediaminetetraacetate ($Na_2$-EDTA) at 150, 180, and $210^{\circ}C$. The products were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), high-resolution transmission electron microscopy (HRTEM), and selected area electron diffraction (SAED). The effect of reaction temperature on the morphology of the $Bi_2Te_3$ particles was investigated, and the possible mechanism of morphology control was proposed.

Effect of Working Pressure Conditions during Sputtering on the Electrical Performance in Te Thin-Film Transistors (RF Sputtering 공정 법을 이용해 증착한 Te 기반 박막 및 박막 트랜지스터의 공정 변수에 따른 전기적 특성 평가)

  • Lee, Kyu Ri;Kim, Hyun-Suk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.2
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    • pp.190-193
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    • 2022
  • In this work, the effect of sputtering working pressure for the tellurium film and its thin-film transistor was investigated. The transfer characteristics of tellurium thin-film transistors were improved by increasing the working pressure during sputtering process. As increasing working pressure, physical and optical properties of Te films such as crystallinity, transmittance, and surface roughness were improved. Therefore, the improved transfer characteristics of Te thin-film transistors may originate from both improved interface properties between the silicon oxide gate dielectric layer and the tellurium active layer with an improved quality of Te film. In conclusion, the control of working pressure during sputtering would be important for obtaining high-performance tellurium-based thin film transistor

The study of growth and characterization of CuGaTe$_2$single crystal thin films by hot wall epitaxy (Hot wall epitaxy(HWE) 방법에 의한 CuGaTe$_2$단결정 박막 성장과 특성에 관한 연구)

  • 홍광준;이관교;이상열;유상하;정준우;정경아;백형원;방진주;신영진
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.6
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    • pp.425-433
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    • 2000
  • The stochiometric mix of evaporating materials for the $CuGaTe_2$single crystal thin films was prepared from horizontal furnance. Using extrapolation method of X-ray diffraction patterns for the $CuGaTe_2$polycrystal, it was found tetragonal structure whose lattice constant $a_0 and c_0$ were 6.025 $\AA$ and 11.931 $\AA$, respectively. To obtain the single crystal thin films, $CuGaTe_2$mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $670^{\circ}C$ and $410^{\circ}C$ respectively, and the thickness of the single crystal thin films is 2.1$\mu\textrm{m}$. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. The carrier density and mobility of $CuGaTe_2$single crystal thin films deduced from Hall data are $8.72{\times}10{23}$$\textrm m^3$, $3.42{\times}10^{-2}$ $\textrm m^2$/V.s at 293K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c-axis of the $CuGaTe_2$single crystal thin film, we have found that the values of spin orbit coupling $\Delta$s.o and the crystal field splitting $\Delta$cr were 0.0791 eV and 0.2463 eV at 10 K, respectively. From the PL spectra at 10 K, the peaks corresponding to free bound excitons and D-A pair and a broad emission band due to SA is identified. The binding energy of the free excitons are determined to be 0.0470 eV and the dissipation energy of the donor-bound exciton and acceptor-bound exciton to be 0.0490 eV, 0.0558 eV, respectively.

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