• Title/Summary/Keyword: Short-channel effects

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Analysis of Threshold Voltage for DGMOSFET according to Channel Thickness Using Series Charge Distribution (급수형 전하분포를 이용한 DGMOSFET의 채널두께에 대한 문턱전압 특성분석)

  • Cho, Kyoung-Hwan;Han, Ji-Hyung;Jung, Hak-Kee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2012.05a
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    • pp.726-728
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    • 2012
  • In this paper, the threshold voltage characteristics have been analyzed by varying the channel thicknesses of Double Gate MOSFET. The channel thickness, as well as determining the size of the device which hardly affects SCE(Short Channel Effects), therefore the channel thicknesses is a very important parameter in the IC(Integrated circuit) design. In this study, using series charge distribution to analyze the threshold voltage on the channel thickness. Consequently, the threshold voltage decreases with increasing a channel thickness.

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Dual-Gate Surface Channel 0.1${\mu}{\textrm}{m}$ CMOSFETs

  • Kwon, Hyouk-Man;Lee, Yeong-Taek;Lee, Jong-Duk;Park, Byung-Gook
    • Journal of Electrical Engineering and information Science
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    • v.3 no.2
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    • pp.261-266
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    • 1998
  • This paper describes the fabrication and characterization of dual-polysilicon gated surface channel 0.1$\mu\textrm{m}$ CMOSFETs using BF2 and arsenic as channel dopants. We have used and LDD structure and 40${\AA}$ gate oxide as an insulator. To suppress short channel effects down to 0.1$\mu\textrm{m}$ channel length, shallow source/drain extensions implemented by low energy implantation and SSR(Super Steep Retrograde) channel structure were used. The threshold voltages of fabricated CMOSFETs are 0.6V. The maximum transconductance of nMOSFET is 315${\mu}$S/$\mu\textrm{m}$, and that of pMOSFET is 156 ${\mu}$S/$\mu\textrm{m}$. The drain saturation current of 418 ${\mu}$A/$\mu\textrm{m}$, 187${\mu}$A/$\mu\textrm{m}$ are obtained. Subthreshold swing is 85mV/dec and 88mV/dec, respectively. DIBL(Drain Induced Barrier Lowering) is below 100mV. In the device with 2000${\AA}$ thick gate polysilicon, depletion in polysilicon near the gate oxide results in an increase of equivalent gate oxide thickness and degradation of device characteristics. The gate delay time is measured to be 336psec at operation voltage of 2V.

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Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET Using Gaussian Distribution (가우스분포를 이용한 이중게이트 MOSFET의 드레인유기장벽감소 분석)

  • Jung, Hak-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.16 no.2
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    • pp.325-330
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    • 2012
  • In this paper, drain induced barrier lowering(DIBL) has been analyzed as one of short channel effects occurred in double gate(DG) MOSFET to be next-generation devices. Since Gaussian function been used as carrier distribution for solving Poisson's equation to obtain analytical solution of potential distribution, we expect our results using this model agree with experimental results. DIBL has been investigated according to projected range and standard projected deviation as variables of Gaussian function, and channel structure and channel doping intensity as device parameter. Since the validity of this analytical potential distribution model derived from Poisson's equation has already been proved in previous papers, DIBL has been analyzed using this model. Resultly, DIBL has been greatly changed for channel structure and doping concentration.

Analysis of Relation between Conduction Path and Threshold Voltages of Double Gate MOSFET (이중게이트 MOSFET의 전도중심과 문턱전압의 관계 분석)

  • Jung, Hakkee;Han, Jihyung;Lee, Jongin
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2012.10a
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    • pp.818-821
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    • 2012
  • This paper have analyzed the change of threshold voltage for conduction path of double gate(DG) MOSFET. The threshold voltage roll-off among the short channel effects of DGMOSFET have become obstacles of precise device operation. The analytical solution of Poisson's equation have been used to analyze the threshold voltage, and Gaussian function been used as carrier distribution to analyze closely for experimental results. The threshold voltages for conduction path have been analyzed for device parameters such as channel length, channel thickness, gate oxide thickness and doping concentration. Since this potential model has been verified in the previous papers, we have used this model to analyze the threshold voltage. Resultly, we know the threshold voltage is greatly influenced on the change of conduction path for device parameters of DGMOSFET.

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Analysis of Relation between Conduction Path and Breakdown Voltages of Double Gate MOSFET (DGMOSFET의 전도중심과 항복전압의 관계 분석)

  • Jung, Hakkee;Han, Jihyung;Kwon, Ohshin
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2012.10a
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    • pp.825-828
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    • 2012
  • This paper have analyzed the change of breakdown voltage for conduction path of double gate(DG) MOSFET. The low breakdown voltage among the short channel effects of DGMOSFET have become obstacles of device operation. The analytical solution of Poisson's equation have been used to analyze the breakdown voltage, and Gaussian function been used as carrier distribution to analyze closely for experimental results. The change of breakdown voltages for conduction path have been analyzed for device parameters such as channel length, channel thickness, gate oxide thickness and doping concentration. Since this potential model has been verified in the previous papers, we have used this model to analyze the breakdown voltage. Resultly, we know the breakdown voltage is greatly influenced on the change of conduction path for device parameters of DGMOSFET.

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Deviation of Threshold Voltages for Conduction Path of Double Gate MOSFET (이중게이트 MOSFET의 전도중심에 따른 문턱전압의 변화)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.16 no.11
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    • pp.2511-2516
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    • 2012
  • This paper have analyzed the change of threshold voltage for conduction path of double gate(DG) MOSFET. The threshold voltage roll-off among the short channel effects of DGMOSFET have become obstacles of precise device operation. The analytical solution of Poisson's equation have been used to analyze the threshold voltage, and Gaussian function been used as carrier distribution to analyze closely for experimental results. The threshold voltages for conduction path have been analyzed for device parameters such as channel length, channel thickness, gate oxide thickness and doping concentration. Since this potential model has been verified in the previous papers, we have used this model to analyze the threshold voltage. Resultly, we know the threshold voltage is greatly influenced on the change of conduction path for device parameters of DGMOSFET.

Analysis of Threshold Voltage Characteristics for FinFET Using Three Dimension Poisson's Equation (3차원 포아송방정식을 이용한 FinFET의 문턱전압특성분석)

  • Jung, Hak-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.13 no.11
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    • pp.2373-2377
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    • 2009
  • In this paper, the threshold voltage characteristics have been analyzed using three dimensional Poisson's equation for FinFET. The FinFET is extensively been studing since it can reduce the short channel effects as the nano device. We have presented the short channel effects such as subthreshold swing and threshold voltage for PinFET, using the analytical three dimensional Poisson's equation. We have analyzed for channel length, thickness and width to consider the structural characteristics for FinFET. Using this model, the subthreshold swing and threshold voltage have been analyzed for FinFET since the potential and transport model of this analytical three dimensional Poisson's equation is verified as comparing with those of the numerical three dimensional Poisson's equation.

Analysis of Subthreshold Swing Mechanism by Device Parameter of Asymmetric Double Gate MOSFET (소자 파라미터에 따른 비대칭 DGMOSFET의 문턱전압이하 스윙 분석)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.19 no.1
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    • pp.156-162
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    • 2015
  • This paper has analyzed how conduction path and electron concentration for the device parameters such as oxide thickness, channel doping, and top and bottom gate voltage influence on subthreshold swing of asymmetric double gate MOSFET. Compared with symmetric and asymmetric double gate MOSFET, asymmetric double gate MOSFET has the advantage that the factors to be able to control the short channel effects increase since top and bottom gate oxide thickness and voltages can be set differently. Therefore the conduction path and electron concentration for top and bottom gate oxide thickness and voltages are investigated, and it is found the optimum conditions that the degradation of subthreshold swing, severe short channel effects, can reduce. To obtain the analytical subthreshold swing, the analytical potential distribution is derived from Possion's equation. As a result, conduction path and electron concentration are greatly changed for device parameters, and subthreshold swing is influenced by conduction path and electron concentration of top and bottom.

Analysis of Threshold Voltage Characteristics for FinFET Using Three Dimension Poisson's Equation (3차원 포아송방정식을 이용한 FinFET의 문턱전압특성분석)

  • Han, Jihyung;Jung, Hakkee;Lee, Jaehyung;Jeong, Dongsoo;Lee, Jongin;Kwon, Ohshin
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2009.10a
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    • pp.928-930
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    • 2009
  • In this paper, the threshold voltage characteristics have been alanyzed using three dimensional Poisson's equation for FinFET. The FinFET is extensively been studing since it can reduce the short channel effects as the nano device. We have presented the short channel effects such as subthreshold swing and threshold voltage for FinFET, using the analytical three dimensional Poisson's equation. We have analyzed for channel length, thickness and width to consider the structural characteristics for FinFET. Using this model, the subthreshold swing and threshold voltage have been analyzed for FinFET since the potential and transport model of this analytical three dimensional Poisson's equation is verified as comparing with those of the numerical three dimensional Poisson's equation.

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Short-term Effects of Turbid Water and Flow Rate on the Benthic Diatom Community in an Artificial Channel (단기간 탁수와 유속 변동이 부착돌말류 성장에 미치는 영향)

  • Kim, Baik-Ho;Park, Hye-Jin;Min, Han-Na;Kong, Dong-Su;Hwang, Soon-Jin
    • Journal of Korean Society on Water Environment
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    • v.27 no.6
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    • pp.855-861
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    • 2011
  • Short-term effects of current velocity and turbid water on the benthic diatom community and water quality were examined in artificial channel ($20{\times}200{\times}10cm$) with two different experiments. The first and second experiments were consisted of different current velocities such as 1 L/min., and 1, 3, and 6 L/min., respectively. The concentration of turbid water is prepared with loess and fixed at 10 and 20 times of the turbidity of control inflow (10 NTU, LTW), respectively. At experiment 1 (EXP-1), introduction of turbid water increased dissolved oxygen, electric conductivity, pH and turbidity, but there were no differences between low- (100 NTU, MTW) and high-turbid water (200 NTU, HTW). However, experiment 2 (EXP-2) did not change any environmental parameters except dissolved total and inorganic nitrogen like EXP-1. MTW in EXP-1 strongly stimulated the growth of benthic diatom, while both MTW (150 NTU) and HTW (300 NTU) in EXP-2 did not increase or decrease the diatom abundance. Over the study, the dominant species was four, Aulacoseira ambigua, Cyclotella stelligera, Aulacoseira granulata and Achnanthes minutissima. In EXP-1, two highest species in abundance, A. ambigua and A. granulata were highly grown in MTW, while Achnanthes minutissima high in HTW adversely. These results indicate that the introduction of turbid water can play an important role in the shift of water quality and benthic diatom community in stream ecosystem, especially inflow of soil water in low current velocity.