• 제목/요약/키워드: Semiconductor sensor

검색결과 726건 처리시간 0.026초

직접 확산 방식을 이용한 반도체 장비 통신 프로토콜 구현 (The Implementation of Communication Protocol for Semiconductor Equipments using Directed Diffusion)

  • 김두용;조현찬
    • 반도체디스플레이기술학회지
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    • 제12권2호
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    • pp.39-43
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    • 2013
  • The semiconductor equipments generate necessary data through communication networks for the effective manufacturing processes and automation of semiconductor equipments. For transferring data between semiconductor equipments and sending data to monitor equipments, several standards for communication protocols have been proposed. Communication networks in semiconductor manufacturing systems will transmit a lot of data traffic, which can be vulnerable in data delay and network failure. Therefore, it is required that data traffic need to be distributed. To accomplish this objective, we recommend the use of a redundant and valuable communication path which is constructed by a wireless sensor network. In this paper, the directed diffusion method for wireless sensor networking is suggested for networking semiconductor equipments. It is shown that how the directed diffusion is employed to connect semiconductor equipments. Also, we show how to implement the SECS of semiconductor equipments communication protocols based on the directed diffusion.

A Low Power Dual CDS for a Column-Parallel CMOS Image Sensor

  • Cho, Kyuik;Kim, Daeyun;Song, Minkyu
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제12권4호
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    • pp.388-396
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    • 2012
  • In this paper, a $320{\times}240$ pixel, 80 frame/s CMOS image sensor with a low power dual correlated double sampling (CDS) scheme is presented. A novel 8-bit hold-and-go counter in each column is proposed to obtain 10-bit resolution. Furthermore, dual CDS and a configurable counter scheme are also discussed to realize efficient power reduction. With these techniques, the digital counter consumes at least 43% and at most 61% less power compared with the column-counters type, and the frame rate is approximately 40% faster than the double memory type due to a partial pipeline structure without additional memories. The prototype sensor was fabricated in a Samsung $0.13{\mu}m$ 1P4M CMOS process and used a 4T APS with a pixel pitch of $2.25{\mu}m$. The measured column fixed pattern noise (FPN) is 0.10 LSB.

무선 센서 네트워크 환경에서 적응형 임계값 설정 방법 (An Adaptive Threshold Method in Wireless Sensor Network Environments)

  • 김인태;김두용
    • 반도체디스플레이기술학회지
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    • 제7권1호
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    • pp.23-27
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    • 2008
  • Wireless sensor networks are emerging as a solution for a wide range of data gathering applications. The most difficult challenge for the design of sensor nodes is the need for significant reductions in energy consumption. The threshold methods which filter redundant and similar data can be used to save energy. In this paper, we propose the adaptive threshold method to effectively manage the energy in wireless sensor nodes. In the adaptive threshold method, wireless sensor nodes can change the thresholds dynamically as the sensing environments vary. The simulation results show that the adaptive threshold method works very effectively even when we experience the significant volatility in the data. This scheme can be used in order to monitor the malfunction in the equipment of semiconductor manufacturing line.

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CMOS binary image sensor with high-sensitivity metal-oxide semiconductor field-effect transistor-type photodetector for high-speed imaging

  • Jang, Juneyoung;Heo, Wonbin;Kong, Jaesung;Kim, Young-Mo;Shin, Jang-Kyoo
    • 센서학회지
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    • 제30권5호
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    • pp.295-299
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    • 2021
  • In this study, we present a complementary metal-oxide-semiconductor (CMOS) binary image sensor. It can shoot an object rotating at a high-speed by using a gate/body-tied (GBT) p-channel metal-oxide-semiconductor field-effect transistor (PMOSFET)-type photodetector. The GBT PMOSFET-type photodetector amplifies the photocurrent generated by light. Therefore, it is more sensitive than a standard N+/P-substrate photodetector. A binary operation is installed in a GBT PMOSFET-type photodetector with high-sensitivity characteristics, and the high-speed operation is verified by the output image. The binary operations circuit comprise a comparator and memory of 1- bit. Thus, the binary CMOS image sensor does not require an additional analog-to-digital converter. The binary CMOS image sensor is manufactured using a standard CMOS process, and its high- speed operation is verified experimentally.

NO2 Sensing Characteristics of Si MOSFET Gas Sensor Based on Thickness of WO3 Sensing Layer

  • Jeong, Yujeong;Hong, Seongbin;Jung, Gyuweon;Jang, Dongkyu;Shin, Wonjun;Park, Jinwoo;Han, Seung-Ik;Seo, Hyungtak;Lee, Jong-Ho
    • 센서학회지
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    • 제29권1호
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    • pp.14-18
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    • 2020
  • This study investigates the nitrogen dioxide (NO2) sensing characteristics of an Si MOSFET gas sensor with a tungsten trioxide (WO3) sensing layer deposited using the sputtering method. The Si MOSFET gas sensor consists of a horizontal floating gate (FG) interdigitated with a control gate (CG). The WO3 sensing layer is deposited on the interdigitated CG-FG of a field effect transistor(FET)-type gas sensor platform. The sensing layer is deposited with different thicknesses of the film ranging from 100 nm to 1 ㎛ by changing the deposition times during the sputtering process. The sensing characteristics of the fabricated gas sensor are measured at different NO2 concentrations and operating temperatures. The response of the gas sensor increases as the NO2 concentration and operating temperature increase. However, the gas sensor has an optimal performance at 180℃ considering both response and recovery speed. The response of the gas sensor increases significantly from 24% to 138% as the thickness of the sensing layer increases from 100 nm to 1 ㎛. The sputtered WO3 film consists of a dense part and a porous part. As reported in previous work, the area of the porous part of the film increases as the thickness of the film increases. This increased porous part promotes the reaction of the sensing layer with the NO2 gas. Consequently, the response of the gas sensor increases as the thickness of the sputtered WO3 film increases.

유속감지를 위한 반도체 유량센서 (Semiconductor Flow Sensor To Detect Air flow)

  • 이영주;전국진
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 정기총회 및 추계학술대회 논문집 학회본부
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    • pp.188-191
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    • 1993
  • Silicon flow sensor which can detect the magnitude and direction of two dimensional air flow was designed and fabricated by CMOS process and bulk micromachining technique. The flow sensor consists of three-layered dielectric diaphragm a heater at the center of the diaphragm and four thermopiles surrounding the heater at each side of diaphragm as sensing elements. This diaphragm structure contributes to improve the sensitivity due to excellent thermal isolation property of dielectric materials and its tiny thickness. The flow sensor has good axial symmetry to sense 2-D air flow with the optimized sensing position in the given structure. Measured sensitivity of our sensor is $18.7mV/(m/s)^{1/2}$.

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무급유식 공기압축기 구동을 위한 영구자석 동기 모터의 센서리스 속도제어 (Sensor-less Speed Control of PMSM for Driving Oil-free Air Compressor)

  • 김민호;양오;김윤현
    • 반도체디스플레이기술학회지
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    • 제14권3호
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    • pp.45-50
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    • 2015
  • This paper suggests the sensor-less speed control of PMSM (Permanent Magnet Synchronous Motor) without the position sensor of oil-free air compressor. It estimated d and q axis back electro motive force using Back-EMF (Electro motive Force) observer to control sensor-less speed of PMSM. Also it used the method that tracks the information of rotor position and speed using PLL (Phase Locked Loop) based on estimated d and q axis Back-EMF. The sensor-less speed control of PMSM for oil air compressor application is carried out with the introduced rotor position and speed tracking method. In this paper, the experimental characterization of the sensor-less drive is provided to verify the accuracy of the estimated position and the performance of sensor-less control is analyzed by results obtained from the experiment. Moreover, the potential of PMSM sensor-less drive in industrial application such as compressor drive is also examined.

반도체 공정용 차압식 질량 유량 제어 장치의 개발 및 성능 평가 (Development and Evaluation of Differential Pressure Type Mass Flow Controller for Semiconductor Fabrication Processing)

  • 안진홍;강기태;안강호
    • 반도체디스플레이기술학회지
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    • 제7권3호
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    • pp.29-34
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    • 2008
  • This paper describes the fabrication and characterization of a differential pressure type integrated mass-flow controller made of stainless steel for reactive and corrosive gases. The fabricated mass-flow controller is composed of a normally closed valve and differential pressure sensor. A stacked solenoid actuator mounted on a base-block is utilized for precise and rapid control of gas flow. The differential pressure flow sensor consisting of four diaphragms can detect a flow rate by deflection of diaphragm. By a feedback control from the flow sensor to the valve actuator, it is possible to keep the flow rate constant. This device shows a fast response less than 0.3 sec. Also, this device shows accuracy less than 0.1% of full scale. It is confirmed that this device is not attacked by toxic gas, so the integrated mass-flow controller can be applied to advanced semiconductor processes which need fine mass-flow control corrosive gases with fast response.

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기준저항 보상회로를 이용한 비냉각형 볼로미터 검출회로의 설계에 관한 연구 (A Study on the Design of a ROIC for Uncooled Bolometer Thermal Image Sensor Using Reference Resistor Compensation)

  • 유승우;곽상현;정은식;황상준;성만영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.148-149
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    • 2008
  • As infrared light is radiated, the CMOS Readout IC (ROIC) for the microbolometer type infrared sensor detects voltage or current when the resistance value in the bolometer sensor varies. One of the serious problems in designing the ROIC is that resistances in the bolometer and reference resistor have process variation. This means that each pixel does not have the same resistance, causing serious fixed pattern noise problems in sensor operations. In this paper, Reference resistor compensation technique was proposed. This technique is to compensate the reference resistance considering the process variation, and it has the same reference resistance value as a bolometer cell resistance by using a comparator and a cross coupled latch.

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Thick-film ammonia gas sensor with high sensitivity and excellent selectivity

  • Lee, Kyuchung;Ryu, Kwang-Ryul;Hur, Chang-Wu
    • Journal of information and communication convergence engineering
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    • 제2권1호
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    • pp.22-25
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    • 2004
  • A highly sensitive ammonia gas sensor using thick-film technology has been fabricated and examined. The sensing material of the gas sensor is FeOx-$WO_{3}-SnO_{2}$ oxide semiconductor. The sensor exhibits resistance increase upon exposure to low concentration of ammonia gas. The resistance of the sensor is decreased, on the other hand, for exposure to reducing gases such as ethyl alcohol, methane, propane and carbon monoxide. A novel method for detecting ammonia gas quite selectively utilizing a sensor array consisting of an ammonia gas sensor and a compensation element has been proposed and developed. The compensation element is a Pt-doped $WO_{3}-SnO_{2}$gas sensor which shows opposite direction of resistance change in comparison with the ammonia gas sensor upon exposure to ammonia gas. Excellent selectivity has been achieved using the sensor array having two sensing elements.